Inventor · disambiguated record
Tsuneo Terasawa
Also filed as: TERASAWA TSUNEO
69 granted patents·13 pending applications·1,881 citations·filing 1981–2023
99Inventor score
Top patents by PatentIndex Score
82 records- 0197US4894343AChamber plate for use in cell fusion and a process for production thereofHITACHI LTD·Filed 1987·Granted Jan 16, 1990·211 cites·5 claims
- 0295US11624712B2Substrate defect inspection method and substrate defect inspection apparatusSHINETSU CHEMICAL CO·Filed 2021·Granted Apr 11, 2023·2 cites·18 claims
- 0395US6709880B2Semiconductor device and a manufacturing method of the sameHITACHI LTD·Filed 2002·Granted Mar 23, 2004·130 cites·30 claims
- 0495US4750364AAngular velocity and acceleration sensorHITACHI LTD·Filed 1986·Granted Jun 14, 1988·121 cites·8 claims
- 0592US4983039ASpectrometerHITACHI LTD·Filed 1989·Granted Jan 8, 1991·66 cites·32 claims
- 0691US5235400AMethod of and apparatus for detecting defect on photomaskHITACHI LTD·Filed 1989·Granted Aug 10, 1993·77 cites·18 claims
- 0790US7630068B2Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the sameRENESAS TECH CORP·Filed 2007·Granted Dec 8, 2009·17 cites·2 claims
- 0890US7369703B2Method and apparatus for circuit pattern inspectionHITACHI LTD·Filed 2006·Granted May 6, 2008·10 cites·22 claims
- 0990US6329112B1Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lensHITACHI LTD·Filed 1999·Granted Dec 11, 2001·59 cites·13 claims
- 1090US5222112AX-ray pattern masking by a reflective reduction projection optical systemHITACHI LTD·Filed 1991·Granted Jun 22, 1993·134 cites·36 claims
- 1190US4441206APattern detecting apparatusHITACHI LTD·Filed 1981·Granted Apr 3, 1984·79 cites·3 claims
- 1289US10295477B2Methods for defect inspection, sorting, and manufacturing photomask blankSHINETSU CHEMICAL CO·Filed 2018·Granted May 21, 2019·4 cites·18 claims
- 1389US8488866B2Method of inspecting mask pattern and mask pattern inspection apparatusTERASAWA TSUNEO·Filed 2010·Granted Jul 16, 2013·12 cites·16 claims
- 1489US5348837AProjection exposure apparatus and pattern forming method for use therewithHITACHI LTD·Filed 1993·Granted Sep 20, 1994·73 cites·15 claims
- 1588US7911600B2Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuitsRENESAS ELECTRONICS CORP·Filed 2008·Granted Mar 22, 2011·16 cites·11 claims
- 1688US5895741APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1997·Granted Apr 20, 1999·59 cites·27 claims
- 1788US5302999AIllumination method, illumination apparatus and projection exposure apparatusHITACHI LTD·Filed 1993·Granted Apr 12, 1994·91 cites·32 claims
- 1887US5420436AMethods for measuring optical system, and method and apparatus for exposure using said measuring methodHITACHI LTD·Filed 1993·Granted May 30, 1995·61 cites·14 claims
- 1986US7095884B2Method and apparatus for circuit pattern inspectionHITACHI LTD·Filed 2002·Granted Aug 22, 2006·22 cites·6 claims
- 2085US10488347B2Defect classification method, method of sorting photomask blanks, and method of manufacturing mask blankSHINETSU CHEMICAL CO·Filed 2019·Granted Nov 26, 2019·2 cites·9 claims
- 2185US4798470APattern printing method and apparatusHITACHI LTD·Filed 1986·Granted Jan 17, 1989·37 cites·9 claims
- 2284US9829787B2Defect inspecting method, sorting method, and producing method for photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Nov 28, 2017·3 cites·15 claims
- 2382US4614432APattern detectorHITACHI LTD·Filed 1983·Granted Sep 30, 1986·32 cites·16 claims
- 2481US11061319B2Photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2018·Granted Jul 13, 2021·2 cites·18 claims
- 2581US5700601APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1995·Granted Dec 23, 1997·40 cites·22 claims
- 2681US5316896AMethod of forming a patternHITACHI LTD·Filed 1991·Granted May 31, 1994·59 cites·22 claims
- 2781US5305364AProjection type X-ray lithography apparatusHITACHI LTD·Filed 1992·Granted Apr 19, 1994·38 cites·19 claims
- 2880US9772551B2Evaluation method of defect size of photomask blank, selection method, and manufacturing methodSHINETSU CHEMICAL CO·Filed 2015·Granted Sep 26, 2017·2 cites·18 claims
- 2979US5408320AWorkpiece having alignment marks for positioning a pattern at a different pitch to be formed thereon, and method for fabricating the sameHITACHI LTD·Filed 1992·Granted Apr 18, 1995·29 cites·14 claims
- 3076US6677107B1Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used thereforHITACJI LTD·Filed 2000·Granted Jan 13, 2004·15 cites·3 claims
- 3176US5296995AMethod of magnetically recording and reading data, magnetic recording medium, its production method and magnetic recording apparatusHITACHI LTD·Filed 1993·Granted Mar 22, 1994·58 cites·23 claims
- 3274US8797524B2Mask inspection method and mask inspection apparatusYAMANE TAKESHI·Filed 2012·Granted Aug 5, 2014·2 cites·16 claims
- 3374US8384888B2Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2010·Granted Feb 26, 2013·2 cites·19 claims
- 3474US6686099B2Method of manufacturing a photomaskRENESAS TECH CORP·Filed 2001·Granted Feb 3, 2004·12 cites·20 claims
- 3574US6645856B2Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrateHITACHI LTD·Filed 2002·Granted Nov 11, 2003·16 cites·17 claims
- 3674US5595857AMethod of forming a pattern and projection exposure apparatusHITACHI LTD·Filed 1995·Granted Jan 21, 1997·33 cites·12 claims
- 3773US9829442B2Defect inspecting method, sorting method and producing method for photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Nov 28, 2017·1 cites·18 claims
- 3873US4504726APattern generatorHITACHI LTD·Filed 1981·Granted Mar 12, 1985·35 cites·5 claims
- 3973US2024248388A1Substrate with Film for Reflective Mask Blank, and Reflective Mask BlankSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 4072US5621497APattern forming method and projection exposure tool thereforHITACHI LTD·Filed 1995·Granted Apr 15, 1997·33 cites·25 claims
- 4171US9958399B2Imaging apparatus and imaging methodTOSHIBA KK·Filed 2014·Granted May 1, 2018·1 cites·10 claims
- 4271US9229314B2Method of inspecting mask, mask inspection device, and method of manufacturing maskRENESAS ELECTRONICS CORP·Filed 2015·Granted Jan 5, 2016·1 cites·4 claims
- 4371US6596656B2Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NMHITACHI LTD·Filed 2001·Granted Jul 22, 2003·11 cites·27 claims
- 4470US8435702B2Manufacturing method of semiconductor device and manufacturing method of maskTERASAWA TSUNEO·Filed 2009·Granted May 7, 2013·3 cites·14 claims
- 4570US6656645B2Method of manufacturing a photomaskRENESAS TECH CORP·Filed 2001·Granted Dec 2, 2003·9 cites·17 claims
- 4667US12181790B2Reflective mask blank and reflective maskSHINETSU CHEMICAL CO·Filed 2022·Granted Dec 31, 2024·0 cites·15 claims
- 4767US8912501B2Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2013·Granted Dec 16, 2014·1 cites·20 claims
- 4867US5691115AExposure method, aligner, and method of manufacturing semiconductor integrated circuit devicesHITACHI LTD·Filed 1995·Granted Nov 25, 1997·19 cites·15 claims
- 4966US5418598AProjection exposure apparatusHITACHI LTD·Filed 1994·Granted May 23, 1995·29 cites·11 claims
- 5064US11835851B2Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blankSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 5, 2023·0 cites·16 claims
Showing the top 50 of 82 patent records by PatentIndex Score.
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