Inventor · disambiguated record
Atsushi Kominato
Also filed as: KOMINATO ATSUSHI
34 granted patents·1 pending application·46 citations·filing 2005–2019
95Inventor score
Top patents by PatentIndex Score
35 records- 0189US8637213B2Mask blank and transfer maskHASHIMOTO MASAHIRO·Filed 2010·Granted Jan 28, 2014·5 cites·22 claims
- 0287US8029948B2Photomask blank, photomask, and methods of manufacturing the sameHOYA CORP·Filed 2009·Granted Oct 4, 2011·7 cites·11 claims
- 0384US8940462B2Photomask blank, photomask, method of manufacturing the same, and method of manufacturing a semiconductor deviceHASHIMOTO MASAHIRO·Filed 2009·Granted Jan 27, 2015·7 cites·12 claims
- 0483US8043771B2Phase shift mask blank and method of manufacturing phase shift maskHOYA CORP·Filed 2009·Granted Oct 25, 2011·6 cites·16 claims
- 0579US8329364B2Phase shift mask blank and phase shift maskIWASHITA HIROYUKI·Filed 2009·Granted Dec 11, 2012·5 cites·14 claims
- 0676US8822103B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceKOMINATO ATSUSHI·Filed 2011·Granted Sep 2, 2014·2 cites·18 claims
- 0776US7655364B2Methods of manufacturing mask blank and transfer maskHOYA CORP·Filed 2008·Granted Feb 2, 2010·3 cites·7 claims
- 0873US9195133B2Mask blank, transfer mask and method of manufacturing transfer maskHOYA CORP·Filed 2013·Granted Nov 24, 2015·1 cites·29 claims
- 0972US8507155B2Photomask blank, photomask, and method for manufacturing photomask blankIWASHITA HIROYUKI·Filed 2009·Granted Aug 13, 2013·3 cites·12 claims
- 1071US9372393B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2014·Granted Jun 21, 2016·1 cites·21 claims
- 1167US9005851B2Phase shift mask blank and phase shift maskHOYA CORP·Filed 2012·Granted Apr 14, 2015·1 cites·15 claims
- 1266US8574793B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceKOMINATO ATSUSHI·Filed 2011·Granted Nov 5, 2013·2 cites·25 claims
- 1365US8501372B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceKOMINATO ATSUSHI·Filed 2011·Granted Aug 6, 2013·1 cites·22 claims
- 1463US8304147B2Photomask blank, photomask, and method for manufacturing photomask blankIWASHITA HIROYUKI·Filed 2009·Granted Nov 6, 2012·1 cites·15 claims
- 1562US8114556B2Photomask blank and production method thereof, and photomask production method, and semiconductor device production methodYAMADA TAKEYUKI·Filed 2006·Granted Feb 14, 2012·1 cites·32 claims
- 1660US11016382B2Mask blanks, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted May 25, 2021·0 cites·19 claims
- 1760US7794901B2Method of manufacturing mask blank and transfer maskHOYA CORP·Filed 2009·Granted Sep 14, 2010·0 cites·24 claims
- 1858US9651859B2Mask blank, transfer mask and method of manufacturing transfer maskHOYA CORP·Filed 2015·Granted May 16, 2017·0 cites·21 claims
- 1958US8512916B2Photomask blank, photomask, and method for manufacturing photomask blankIWASHITA HIROYUKI·Filed 2009·Granted Aug 20, 2013·0 cites·8 claims
- 2058US8431290B2Photomask blank, photomask, and methods of manufacturing the sameIWASHITA HIROYUKI·Filed 2009·Granted Apr 30, 2013·0 cites·25 claims
- 2157US9075320B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Jul 7, 2015·0 cites·22 claims
- 2257US9075314B2Photomask blank, photomask, and method for manufacturing photomask blankHOYA CORP·Filed 2013·Granted Jul 7, 2015·0 cites·23 claims
- 2357US8865378B2Photomask blank, photomask, and methods of manufacturing the sameIWASHITA HIROYUKI·Filed 2013·Granted Oct 21, 2014·0 cites·16 claims
- 2456US9256122B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Feb 9, 2016·0 cites·20 claims
- 2555US8404406B2Photomask blank and method for manufacturing the sameIWASHITA HIROYUKI·Filed 2009·Granted Mar 26, 2013·0 cites·19 claims
- 2654US9612527B2Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2015·Granted Apr 4, 2017·0 cites·14 claims
- 2753US8697315B2Photomask blank and production method thereof, and photomask production method, and semiconductor device production methodYAMADA TAKEYUKI·Filed 2012·Granted Apr 15, 2014·0 cites·20 claims
- 2852US9625807B2Mask blank, transfer mask, method of manufacturing a mask blank, method of manufacturing a transfer mask and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Apr 18, 2017·0 cites·20 claims
- 2952US8323858B2Photomask blank, photomask, and methods of manufacturing the sameHASHIMOTO MASAHIRO·Filed 2011·Granted Dec 4, 2012·0 cites·32 claims
- 3051US10551733B2Mask blanks, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Feb 4, 2020·0 cites·17 claims
- 3150US9664997B2Method of manufacturing mask blank and method of manufacturing transfer maskHOYA CORP·Filed 2013·Granted May 30, 2017·0 cites·9 claims
- 3249US8846274B2Mask blank, transfer mask and process for manufacturing semiconductor devicesSHISHIDO HIROAKI·Filed 2012·Granted Sep 30, 2014·0 cites·18 claims
- 3343US9017902B2Mask blank, transfer mask, and method of manufacturing a transfer maskNOZAWA OSAMU·Filed 2010·Granted Apr 28, 2015·0 cites·14 claims
- 3440US2008305406A1Photomask Blank, Photomask Manufacturing Method and Semiconductor Device Manufacturing MethodHOYA CORP·Filed 2005·Application pending·0 cites
- 3539US11327396B2Mask blankHOYA CORP·Filed 2017·Granted May 10, 2022·0 cites·5 claims
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