Inventor · disambiguated record
Sungeun Hong
Also filed as: HONG SUNGEUN
8 granted patents·3 pending applications·90 citations·filing 2007–2014
87Inventor score
Files withWU HENGPENG5YIN JIAN2AZ ELECTRONIC MATERIALS LUXEMBOURG SARL1AZ ELECTRONIC MATERIALS USA1CAO YI1
Top patents by PatentIndex Score
11 records- 0196US8691925B2Compositions of neutral layer for directed self assembly block copolymers and processes thereofWU HENGPENG·Filed 2011·Granted Apr 8, 2014·30 cites·20 claims
- 0294US8835581B2Neutral layer polymer composition for directed self assembly and processes thereofWU HENGPENG·Filed 2012·Granted Sep 16, 2014·16 cites·15 claims
- 0394US8686109B2Methods and materials for removing metals in block copolymersYIN JIAN·Filed 2012·Granted Apr 1, 2014·11 cites·18 claims
- 0491US7923200B2Composition for coating over a photoresist pattern comprising a lactamAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Apr 12, 2011·17 cites·16 claims
- 0589US9052598B2Compositions of neutral layer for directed self assembly block copolymers and processes thereofWU HENGPENG·Filed 2014·Granted Jun 9, 2015·6 cites·9 claims
- 0680US9040659B2Methods and materials for removing metals in block copolymersYIN JIAN·Filed 2014·Granted May 26, 2015·4 cites·14 claims
- 0779US8852848B2Composition for coating over a photoresist patternWU HENGPENG·Filed 2010·Granted Oct 7, 2014·3 cites·19 claims
- 0872US9291909B2Composition comprising a polymeric thermal acid generator and processes thereofWU HENGPENG·Filed 2013·Granted Mar 22, 2016·3 cites·17 claims
- 0942US2016122580A1Defect reduction methods and composition for via formation in directed self-assembly patterningAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Application pending·0 cites
- 1040US2010183851A1Photoresist Image-forming Process Using Double PatterningCAO YI·Filed 2009·Application pending·0 cites
- 1135US2012219919A1Composition for Coating over a Photoresist Pattern Comprising a LactamTHIYAGARAJAN MUTHIAH·Filed 2011·Application pending·0 cites
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