Inventor · disambiguated record
Hiroaki Shishido
Also filed as: SHISHIDO HIROAKI
90 granted patents·12 pending applications·941 citations·filing 1987–2024
99Inventor score
Top patents by PatentIndex Score
102 records- 0198US11762279B2Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Sep 19, 2023·3 cites·13 claims
- 0298US6621571B1Method and apparatus for inspecting defects in a patterned specimenHITACHI LTD·Filed 2000·Granted Sep 16, 2003·149 cites·30 claims
- 0397US11435662B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Sep 6, 2022·3 cites·13 claims
- 0496US11543744B2Mask blank, transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Jan 3, 2023·2 cites·18 claims
- 0596US6556290B2Defect inspection method and apparatus thereforHITACHI LTD·Filed 2001·Granted Apr 29, 2003·75 cites·38 claims
- 0695US5539514AForeign particle inspection apparatus and method with front and back illuminationHITACHI LTD·Filed 1994·Granted Jul 23, 1996·134 cites·28 claims
- 0794US11112690B2Mask blank, transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Sep 7, 2021·4 cites·8 claims
- 0892US10481486B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Nov 19, 2019·4 cites·25 claims
- 0991US4952058AMethod and apparatus for detecting abnormal patternsHITACHI LTD·Filed 1988·Granted Aug 28, 1990·61 cites·24 claims
- 1090US11281089B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Mar 22, 2022·4 cites·20 claims
- 1190US8524421B2Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor deviceNOZAWA OSAMU·Filed 2011·Granted Sep 3, 2013·5 cites·25 claims
- 1289US10539866B2Mask blank, phase-shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Jan 21, 2020·2 cites·13 claims
- 1389US6084664AMethod of and apparatus for inspecting reticle for defectsHITACHI LTD·Filed 1998·Granted Jul 4, 2000·76 cites·16 claims
- 1488US12468217B2Mask blank, method of manufacturing transfer mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Nov 11, 2025·1 cites·20 claims
- 1588US6064477AMethod of and apparatus for inspecting reticle for defectsHITACHI LTD·Filed 1996·Granted May 16, 2000·74 cites·22 claims
- 1687US10180622B2Mask blank, phase-shift mask, method of manufacturing mask blank, method of manufacturing phase-shift mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jan 15, 2019·2 cites·21 claims
- 1787US10114281B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Oct 30, 2018·4 cites·27 claims
- 1887US9625806B2Mask blank, phase-shift mask, and method for manufacturing the sameHOYA CORP·Filed 2014·Granted Apr 18, 2017·3 cites·16 claims
- 1987US7456963B2Method and equipment for detecting pattern defectHITACHI LTD·Filed 2006·Granted Nov 25, 2008·7 cites·6 claims
- 2087US6800859B1Method and equipment for detecting pattern defectHITACHI LTD·Filed 1999·Granted Oct 5, 2004·55 cites·27 claims
- 2187US5098191AMethod of inspecting reticles and apparatus thereforHITACHI LTD·Filed 1989·Granted Mar 24, 1992·57 cites·18 claims
- 2286US11119400B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Sep 14, 2021·2 cites·20 claims
- 2385US10088744B2Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Oct 2, 2018·4 cites·20 claims
- 2485US7791725B2Method and equipment for detecting pattern defectHITACHI LTD·Filed 2008·Granted Sep 7, 2010·5 cites·10 claims
- 2584US10915016B2Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Feb 9, 2021·3 cites·20 claims
- 2684US5410400AForeign particle inspection apparatusHITACHI LTD·Filed 1992·Granted Apr 25, 1995·61 cites·11 claims
- 2783US10146123B2Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Dec 4, 2018·3 cites·13 claims
- 2883US2025044677A1Mask blankHOYA CORP·Filed 2024·Application pending·0 cites
- 2982US12013631B2Mask blank, transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Jun 18, 2024·0 cites·18 claims
- 3081US12007684B2Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2023·Granted Jun 11, 2024·0 cites·34 claims
- 3181US10606164B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Mar 31, 2020·2 cites·25 claims
- 3281US10551734B2Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Feb 4, 2020·2 cites·20 claims
- 3381US10365556B2Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Jul 30, 2019·2 cites·18 claims
- 3480US10942441B2Mask blank, phase shift mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Mar 9, 2021·1 cites·25 claims
- 3580US9140980B2Method of manufacturing a transfer mask and method of manufacturing a semiconductor deviceHOYA CORP·Filed 2013·Granted Sep 22, 2015·2 cites·7 claims
- 3679US10101650B2Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Oct 16, 2018·2 cites·22 claims
- 3779US8329364B2Phase shift mask blank and phase shift maskIWASHITA HIROYUKI·Filed 2009·Granted Dec 11, 2012·5 cites·14 claims
- 3879US6819416B2Defect inspection method and apparatus thereforHITACHI LTD·Filed 2002·Granted Nov 16, 2004·12 cites·22 claims
- 3979US4922308AMethod of and apparatus for detecting foreign substanceHITACHI LTD·Filed 1987·Granted May 1, 1990·43 cites·12 claims
- 4078US10444620B2Mask blank, phase-shift mask and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Oct 15, 2019·1 cites·16 claims
- 4177US8999609B2Phase shift mask blank, method of manufacturing the same, and phase shift maskNOZAWA OSAMU·Filed 2011·Granted Apr 7, 2015·2 cites·19 claims
- 4277US7251024B2Defect inspection method and apparatus thereforHITACHI LTD·Filed 2004·Granted Jul 31, 2007·10 cites·17 claims
- 4376US6841825B2Semiconductor deviceSHINDENGEN ELECTRIC MFG·Filed 2003·Granted Jan 11, 2005·20 cites·10 claims
- 4472US11624979B2Mask blank, transfer mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Apr 11, 2023·0 cites·10 claims
- 4572US9933698B2Mask blank, phase-shift mask and method for manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Apr 3, 2018·1 cites·17 claims
- 4672US9436079B2Phase shift mask blank, method of manufacturing the same, and phase shift maskHOYA CORP·Filed 2015·Granted Sep 6, 2016·1 cites·17 claims
- 4772US8507155B2Photomask blank, photomask, and method for manufacturing photomask blankIWASHITA HIROYUKI·Filed 2009·Granted Aug 13, 2013·3 cites·12 claims
- 4872US6921905B2Method and equipment for detecting pattern defectHITACHI LTD·Filed 2004·Granted Jul 26, 2005·5 cites·20 claims
- 4970US10942442B2Mask blank, phase-shift mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Mar 9, 2021·0 cites·20 claims
- 5069US12153338B2Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2020·Granted Nov 26, 2024·0 cites·14 claims
Showing the top 50 of 102 patent records by PatentIndex Score.
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