Inventor · disambiguated record
Hiroaki Fujibayashi
Also filed as: FUJIBAYASHI HIROAKI
15 granted patents·10 pending applications·25 citations·filing 2012–2025
87Inventor score
Top patents by PatentIndex Score
25 records- 0195US9518322B2Film formation apparatus and film formation methodNUFLARE TECHNOLOGY INC·Filed 2014·Granted Dec 13, 2016·11 cites·12 claims
- 0294US9873941B2Film-forming manufacturing apparatus and methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Jan 23, 2018·5 cites·4 claims
- 0388US9598792B2Film-forming apparatus and film-forming methodSUZUKI KUNIHIKO·Filed 2012·Granted Mar 21, 2017·3 cites·15 claims
- 0476US10262863B2Method for manufacturing SiC epitaxial wafer by simultaneously utilizing an N-based gas and a CI-based gas, and SiC epitaxial growth apparatusSHOWA DENKO KK·Filed 2015·Granted Apr 16, 2019·2 cites·9 claims
- 0569US10896831B2Film forming apparatusNUFLARE TECHNOLOGY INC·Filed 2018·Granted Jan 19, 2021·1 cites·10 claims
- 0669US9879359B2Silicon carbide semiconductor film-forming apparatus and film-forming method using the sameDENSO CORP·Filed 2014·Granted Jan 30, 2018·2 cites·14 claims
- 0765US2024141550A1Silicon carbide wafer manufacturing apparatusDENSO CORP·Filed 2023·Application pending·0 cites
- 0863US9570337B2Film formation apparatus and film formation methodNUFLARE TECHNOLOGY INC·Filed 2014·Granted Feb 14, 2017·1 cites·7 claims
- 0959US12188151B2Silicon carbide wafer and method for manufacturing the sameDENSO CORP·Filed 2022·Granted Jan 7, 2025·0 cites·4 claims
- 1058US2024213019A1Silicon carbide wafer manufacturing apparatusDENSO CORP·Filed 2023·Application pending·0 cites
- 1157US11879171B2Semiconductor manufacturing deviceDENSO CORP·Filed 2021·Granted Jan 23, 2024·0 cites·7 claims
- 1254US2024018687A1Semiconductor wafer manufacturing apparatusDENSO CORP·Filed 2023·Application pending·0 cites
- 1354US2024021464A1Semiconductor wafer manufacturing apparatusDENSO CORP·Filed 2023·Application pending·0 cites
- 1453US10745824B2Film forming apparatusNUFLARE TECHNOLOGY INC·Filed 2017·Granted Aug 18, 2020·0 cites·16 claims
- 1553US2025283248A1Epitaxial growth apparatus for silicon carbide semiconductorDENSO CORP·Filed 2025·Application pending·0 cites
- 1652US2025324698A1Silicon carbide semiconductor wafer, manufacturing method of silicon carbide semiconductor wafer, and silicon carbide semiconductor deviceDENSO CORP·Filed 2025·Application pending·0 cites
- 1751US8704340B2Stacked single crystal compound semiconductor substratesDENSO CORP·Filed 2013·Granted Apr 22, 2014·0 cites·3 claims
- 1851US2013152853A1Film-forming apparatus and film-forming methodNUFLARE TECHNOLOGY INC·Filed 2012·Application pending·0 cites
- 1949US2018135175A1Film forming apparatusNUFLARE TECHNOLOGY INC·Filed 2017·Application pending·0 cites
- 2047US12252791B2Apparatus for manufacturing semiconductor deviceDENSO CORP·Filed 2022·Granted Mar 18, 2025·0 cites·22 claims
- 2147US11107892B2SiC epitaxial wafer and method for producing sameSHOWA DENKO KK·Filed 2018·Granted Aug 31, 2021·0 cites·7 claims
- 2243US10584417B2Film forming apparatus, susceptor, and film forming methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Mar 10, 2020·0 cites·18 claims
- 2342US8507921B2Single crystal compound semiconductor substrateFUJIBAYASHI HIROAKI·Filed 2012·Granted Aug 13, 2013·0 cites·3 claims
- 2440US2015299898A1Susceptor processing method and susceptor processing plateNUFLARE TECHNOLOGY INC·Filed 2015·Application pending·0 cites
- 2538US2019376206A1SiC EPITAXIAL WAFER AND METHOD FOR PRODUCING SAMESHOWA DENKO KK·Filed 2017·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →