Inventor · disambiguated record
Kafai Lai
Also filed as: LAI KAFAI
76 granted patents·1 pending application·580 citations·filing 2003–2022
99Inventor score
Top patents by PatentIndex Score
77 records- 0198US7512927B2Printability verification by progressive modeling accuracyIBM·Filed 2006·Granted Mar 31, 2009·77 cites·32 claims
- 0297US8656322B1Fin design level mask decomposition for directed self assemblyIBM·Filed 2013·Granted Feb 18, 2014·27 cites·20 claims
- 0397US8336003B2Method for designing optical lithography masks for directed self-assemblyCHENG JOY·Filed 2010·Granted Dec 18, 2012·37 cites·18 claims
- 0497US8114306B2Method of forming sub-lithographic features using directed self-assembly of polymersCHENG JOY·Filed 2009·Granted Feb 14, 2012·73 cites·22 claims
- 0596US6777147B1Method for evaluating the effects of multiple exposure processes in lithographyIBM·Filed 2003·Granted Aug 17, 2004·86 cites·20 claims
- 0695US7010776B2Extending the range of lithographic simulation integralsIBM·Filed 2003·Granted Mar 7, 2006·73 cites·30 claims
- 0794US8856693B2Method for designing optical lithography masks for directed self-assemblyCHENG JOY·Filed 2012·Granted Oct 7, 2014·14 cites·16 claims
- 0894US8372565B2Method for optimizing source and mask to control line width roughness and image log slopeIBM·Filed 2010·Granted Feb 12, 2013·12 cites·41 claims
- 0992US10312200B2Integrated circuit securityIBM·Filed 2017·Granted Jun 4, 2019·5 cites·20 claims
- 1091US9852260B2Method and recording medium of reducing chemoepitaxy directed self-assembled defectsIBM·Filed 2016·Granted Dec 26, 2017·6 cites·20 claims
- 1190US11302532B2Self-aligned double patterning with spacer-merge regionIBM·Filed 2020·Granted Apr 12, 2022·2 cites·6 claims
- 1289US8398868B2Directed self-assembly of block copolymers using segmented prepatternsCHENG JOY·Filed 2009·Granted Mar 19, 2013·14 cites·36 claims
- 1388US10706205B2Detecting hotspots in physical design layout patterns utilizing hotspot detection model with data augmentationIBM·Filed 2018·Granted Jul 7, 2020·3 cites·20 claims
- 1488US8682634B2Analyzing a patterning process using a model of yieldBAGHERI SAEED·Filed 2012·Granted Mar 25, 2014·5 cites·20 claims
- 1588US8495528B2Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic processBAGHERI SAEED·Filed 2010·Granted Jul 23, 2013·6 cites·20 claims
- 1688US7774737B2Performance in model-based OPC engine utilizing efficient polygon pinning methodIBM·Filed 2007·Granted Aug 10, 2010·7 cites·30 claims
- 1786US10755969B2Multi-patterning techniques for fabricating an array of metal lines with different widthsIBM·Filed 2018·Granted Aug 25, 2020·5 cites·16 claims
- 1886US10114921B2Method and recording medium of reducing chemoepitaxy directed self-assembled defectsIBM·Filed 2017·Granted Oct 30, 2018·3 cites·20 claims
- 1985US8351037B2Method to match exposure tools using a programmable illuminatorIBM·Filed 2010·Granted Jan 8, 2013·5 cites·24 claims
- 2083US10573606B2Integrated circuit securityIBM·Filed 2019·Granted Feb 25, 2020·2 cites·20 claims
- 2183US7736841B2Reflective film interface to restore transverse magnetic wave contrast in lithographic processingIBM·Filed 2008·Granted Jun 15, 2010·4 cites·10 claims
- 2283US7343582B2Optical proximity correction using progressively smoothed mask shapesIBM·Filed 2005·Granted Mar 11, 2008·13 cites·21 claims
- 2382US7446859B2Apparatus and method for reducing contamination in immersion lithographyIBM·Filed 2006·Granted Nov 4, 2008·6 cites·10 claims
- 2481US7470504B2Reflective film interface to restore transverse magnetic wave contrast in lithographic processingIBM·Filed 2005·Granted Dec 30, 2008·4 cites·1 claims
- 2579US8125618B2Reflective film interface to restore transverse magnetic wave contrast in lithographic processingLAI KAFAI·Filed 2008·Granted Feb 28, 2012·4 cites·1 claims
- 2678US10832971B2Fabricating tapered semiconductor devicesIBM·Filed 2018·Granted Nov 10, 2020·2 cites·20 claims
- 2778US8238644B2Fast method to model photoresist images using focus blur and resist blurBRUNNER TIMOTHY A·Filed 2006·Granted Aug 7, 2012·5 cites·22 claims
- 2878US7609121B2Multiple status e-fuse based non-volatile voltage control oscillator configured for process variation compensation, an associated method and an associated design structureIBM·Filed 2008·Granted Oct 27, 2009·7 cites·19 claims
- 2978US7131104B2Fast and accurate optical proximity correction engine for incorporating long range flare effectsIBM·Filed 2004·Granted Oct 31, 2006·16 cites·14 claims
- 3077US10606980B2Method and recording medium of reducing chemoepitaxy directed self-assembled defectsIBM·Filed 2018·Granted Mar 31, 2020·1 cites·20 claims
- 3177US7305334B2Methodology for image fidelity verificationIBM·Filed 2005·Granted Dec 4, 2007·7 cites·9 claims
- 3275US7840057B2Simultaneous computation of multiple points on one or multiple cut linesIBM·Filed 2007·Granted Nov 23, 2010·3 cites·16 claims
- 3374US8880382B2Analyzing a patterning process using a model of yieldBAGHERI SAEED·Filed 2012·Granted Nov 4, 2014·3 cites·18 claims
- 3474US7055126B2Renesting interaction map into design for efficient long range calculationsIBM·Filed 2003·Granted May 30, 2006·11 cites·8 claims
- 3573US7761839B2Performance in model-based OPC engine utilizing efficient polygon pinning methodIBM·Filed 2007·Granted Jul 20, 2010·2 cites·20 claims
- 3671US10586013B2Calibration of directed self-assembly models using programmed defects of varying topologyIBM·Filed 2018·Granted Mar 10, 2020·1 cites·22 claims
- 3770US11749529B2Self-aligned double patterning with spacer-merge regionIBM·Filed 2022·Granted Sep 5, 2023·0 cites·20 claims
- 3870US10896883B2Integrated circuit securityIBM·Filed 2020·Granted Jan 19, 2021·0 cites·20 claims
- 3970US9984920B2Design-aware pattern density control in directed self-assembly graphoepitaxy processIBM·Filed 2016·Granted May 29, 2018·1 cites·20 claims
- 4069US11804656B2Reconfigurable geometric metasurfaces with optically tunable materialsIBM·Filed 2021·Granted Oct 31, 2023·0 cites·20 claims
- 4168US10949601B2Reducing chemoepitaxy directed self-assembled defectsIBM·Filed 2019·Granted Mar 16, 2021·0 cites·7 claims
- 4268US10727123B2Interconnect structure with fully self-aligned via pattern formationIBM·Filed 2018·Granted Jul 28, 2020·1 cites·9 claims
- 4368US8059885B2Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edgeTIRAPU-AZPIROZ JAIONE·Filed 2008·Granted Nov 15, 2011·2 cites·25 claims
- 4468US7501212B2Method for generating design rules for a lithographic mask design that includes long range flare effectsIBM·Filed 2005·Granted Mar 10, 2009·4 cites·20 claims
- 4565US9558310B2Method and system for template pattern optimization for DSA patterning using graphoepitaxyIBM·Filed 2015·Granted Jan 31, 2017·1 cites·9 claims
- 4664US8227180B2Photolithography focus improvement by reduction of autofocus radiation transmission into substrateBRUNNER TIMOTHY ALLAN·Filed 2011·Granted Jul 24, 2012·1 cites·9 claims
- 4764US7343271B2Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flareIBM·Filed 2003·Granted Mar 11, 2008·7 cites·33 claims
- 4863US9581899B22-dimensional patterning employing tone inverted graphoepitaxyIBM·Filed 2012·Granted Feb 28, 2017·1 cites·23 claims
- 4962US8161422B2Fast and accurate method to simulate intermediate range flare effectsMUKHERJEE MAHARAJ·Filed 2009·Granted Apr 17, 2012·1 cites·18 claims
- 5061US11789334B2Configurable geometric metasurface antennaIBM·Filed 2021·Granted Oct 17, 2023·0 cites·19 claims
Showing the top 50 of 77 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →