Inventor · disambiguated record
Yim-Bun Patrick Kwan
Also filed as: KWAN YIM BUN P · KWAN YIM-BUN PATRICK
83 granted patents·17 pending applications·1,768 citations·filing 1998–2021
99Inventor score
Files withZEISS CARL SMT GMBH34ASML NETHERLANDS BV22ZEISS CARL SMT AG16KWAN YIM BUN PATRICK10BIEG HERMANN3
Top patents by PatentIndex Score
100 records- 0198US7289212B2Lithographic apparatus, device manufacturing method and device manufacturing therebyASML NETHERLANDS BV·Filed 2004·Granted Oct 30, 2007·155 cites·27 claims
- 0298US6262796B1Positioning device having two object holdersASM LITHOGRAPHY BV·Filed 1998·Granted Jul 17, 2001·634 cites·11 claims
- 0397US6819425B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLAND BV·Filed 2001·Granted Nov 16, 2004·186 cites·35 claims
- 0497US6449030B1Balanced positioning system for use lithographic apparatusASML NETHERLANDS BV·Filed 2000·Granted Sep 10, 2002·114 cites·21 claims
- 0596US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0695US6710849B2Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a methodASML NETHERLANDS BV·Filed 2001·Granted Mar 23, 2004·74 cites·10 claims
- 0794US6542220B1Purge gas systems for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Apr 1, 2003·92 cites·15 claims
- 0893US7817248B2Optical imaging arrangementZEISS CARL SMT AG·Filed 2007·Granted Oct 19, 2010·14 cites·18 claims
- 0992US9766549B2Optical apparatus with adjustable action of force on an optical moduleZEISS CARL SMT GMBH·Filed 2015·Granted Sep 19, 2017·4 cites·27 claims
- 1092US7561270B2Lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted Jul 14, 2009·13 cites·17 claims
- 1191US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 1290US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 1389USRE40043EPositioning device having two object holdersASML NETHERLANDS BV·Filed 1998·Granted Feb 5, 2008·96 cites·15 claims
- 1488US6635887B2Positioning system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2000·Granted Oct 21, 2003·44 cites·16 claims
- 1588US6525803B2Balanced positioning system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2000·Granted Feb 25, 2003·46 cites·30 claims
- 1685US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 1785US7633619B2Calibrating a lithographic apparatusASML NETHERLANDS BV·Filed 2008·Granted Dec 15, 2009·8 cites·4 claims
- 1884US8767176B2Microlithographic projection exposure apparatusBLEIDISTEL SASCHA·Filed 2011·Granted Jul 1, 2014·6 cites·30 claims
- 1984US7760327B2Reflecting optical element with eccentric optical passagewayZEISS CARL SMT AG·Filed 2006·Granted Jul 20, 2010·8 cites·55 claims
- 2083US8964165B2Optical apparatus with adjustable action of force on an optical moduleKWAN YIM-BUN PATRICK·Filed 2010·Granted Feb 24, 2015·3 cites·38 claims
- 2182US7603010B2Device consisting of at least one optical elementZEISS CARL SMT AG·Filed 2006·Granted Oct 13, 2009·10 cites·22 claims
- 2282US6498350B2Crash prevention in positioning apparatus for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Dec 24, 2002·32 cites·16 claims
- 2381US10732402B2Optical imaging arrangement with a piezoelectric deviceZEISS CARL SMT GMBH·Filed 2018·Granted Aug 4, 2020·3 cites·20 claims
- 2481US9696630B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jul 4, 2017·2 cites·20 claims
- 2581US6671036B2Balanced positioning system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2002·Granted Dec 30, 2003·19 cites·31 claims
- 2680US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 2780US8065103B2Calibration of a position measuring device of an optical deviceKWAN YIM-BUN PATRICK·Filed 2010·Granted Nov 22, 2011·3 cites·20 claims
- 2880US7929227B2Optical assemblyZEISS CARL SMT GMBH·Filed 2010·Granted Apr 19, 2011·4 cites·29 claims
- 2980US6509951B2Lithographic projection apparatus having a temperature controlled heat shieldASML NETHERLANDS BV·Filed 2001·Granted Jan 21, 2003·31 cites·20 claims
- 3078US9134632B2Lithographic apparatus and device manufacturing methodVAN DER WIJST MARC WILHELMUS MARIA·Filed 2011·Granted Sep 15, 2015·3 cites·19 claims
- 3178US6657204B2Cooling of voice coil motors in lithographic projection apparatusASML NETHERLANDS BV·Filed 2001·Granted Dec 2, 2003·19 cites·19 claims
- 3277US6852989B2Positioning system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2003·Granted Feb 8, 2005·18 cites·25 claims
- 3376US10197925B2Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant mannerZEISS CARL SMT GMBH·Filed 2014·Granted Feb 5, 2019·2 cites·37 claims
- 3476US7791826B2Optical assemblyZEISS CARL SMT AG·Filed 2006·Granted Sep 7, 2010·6 cites·63 claims
- 3574US9829808B2Method for controlling a motion of optical elements in lithography systemsZEISS CARL SMT GMBH·Filed 2014·Granted Nov 28, 2017·2 cites·23 claims
- 3673US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 3772US9891534B2Optical imaging arrangement with multiple metrology support unitsZEISS CARL SMT GMBH·Filed 2016·Granted Feb 13, 2018·1 cites·23 claims
- 3872US8885141B2EUV lithography device and method for processing an optical elementSINGER WOLFGANG·Filed 2011·Granted Nov 11, 2014·2 cites·20 claims
- 3971US7940392B2Lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2009·Granted May 10, 2011·2 cites·11 claims
- 4070US9097985B2Lens comprising a plurality of optical element disposed in a housingZEISS CARL SMT GMBH·Filed 2014·Granted Aug 4, 2015·1 cites·21 claims
- 4170US8089707B2Diaphragm changing deviceBIEG HERMANN·Filed 2010·Granted Jan 3, 2012·1 cites·23 claims
- 4270US7589921B2Actuator deviceZEISS CARL SMT AG·Filed 2007·Granted Sep 15, 2009·5 cites·38 claims
- 4369US7034920B2Balanced positioning system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2002·Granted Apr 25, 2006·11 cites·32 claims
- 4468US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 4568US9436101B2Optical arrangement and microlithographic projection exposure apparatus including sameSCHOEPPACH ARMIN·Filed 2012·Granted Sep 6, 2016·2 cites·27 claims
- 4667US9976931B2Optical imaging arrangement with multiple metrology support unitsZEISS CARL SMT GMBH·Filed 2014·Granted May 22, 2018·2 cites·25 claims
- 4767US7202937B2Balanced positioning system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Apr 10, 2007·2 cites·27 claims
- 4866US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 4966US7057313B2Cooling of voice coil motorsASML NETHERLANDS BV·Filed 2004·Granted Jun 6, 2006·10 cites·18 claims
- 5065US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
Showing the top 50 of 100 patent records by PatentIndex Score.
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