Inventor · disambiguated record
Joshua Jon Thornes
Also filed as: THORNES JOSHUA · THORNES JOSHUA J · THORNES JOSHUA JON
26 granted patents·4 pending applications·71 citations·filing 2007–2024
94Inventor score
Top patents by PatentIndex Score
30 records- 0193US9130337B1System and method for automatic gas optimization in a two-chamber gas discharge laser systemCymer LLC·Filed 2014·Granted Sep 8, 2015·16 cites·20 claims
- 0290US8411720B2System and method for automatic gas optimization in a two-chamber gas discharge laser systemO'BRIEN KEVIN MICHAEL·Filed 2011·Granted Apr 2, 2013·18 cites·21 claims
- 0389US10451890B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2017·Granted Oct 22, 2019·3 cites·42 claims
- 0487US11054665B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2019·Granted Jul 6, 2021·3 cites·21 claims
- 0586US9997888B2Control of a spectral feature of a pulsed light beamCymer LLC·Filed 2016·Granted Jun 12, 2018·5 cites·21 claims
- 0684US10095118B2Lithography optics adjustment and monitoringCymer LLC·Filed 2016·Granted Oct 9, 2018·4 cites·19 claims
- 0782US11526083B2Spectral feature selection and pulse timing control of a pulsed light beamCymer LLC·Filed 2019·Granted Dec 13, 2022·2 cites·33 claims
- 0882US9778108B2Metrology system and method having a plurality of sensors for estimating a spectral feature of a pulsed light beamCymer LLC·Filed 2015·Granted Oct 3, 2017·3 cites·29 claims
- 0982US2024310736A1Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2024·Application pending·0 cites
- 1081US9762023B2Online calibration for repetition rate dependent performance variablesCymer LLC·Filed 2015·Granted Sep 12, 2017·3 cites·31 claims
- 1179US12001144B2Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2022·Granted Jun 4, 2024·0 cites·21 claims
- 1277US11768438B2Spectral feature selection and pulse timing control of a pulsed light beamCymer LLC·Filed 2022·Granted Sep 26, 2023·0 cites·20 claims
- 1376US10627724B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Apr 21, 2020·2 cites·20 claims
- 1475US11686951B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2021·Granted Jun 27, 2023·0 cites·20 claims
- 1572US10234769B2Monitoring system for an optical lithography systemCymer LLC·Filed 2017·Granted Mar 19, 2019·1 cites·30 claims
- 1671US8873600B2System and method for high accuracy gas refill in a two chamber gas discharge laser systemJIANG RUI·Filed 2011·Granted Oct 28, 2014·3 cites·25 claims
- 1771US7589896B2Optical pulse-width modifier structureRAYTHEON CO·Filed 2007·Granted Sep 15, 2009·3 cites·17 claims
- 1870US8223298B2LCD based polarization, phase and amplitude spatial light modulatorTHORNES JOSHUA J·Filed 2009·Granted Jul 17, 2012·4 cites·20 claims
- 1968US11050213B2Online calibration for repetition rate dependent performance variablesCymer LLC·Filed 2020·Granted Jun 29, 2021·0 cites·20 claims
- 2068US9945730B2Adjusting an amount of coherence of a light beamCymer LLC·Filed 2016·Granted Apr 17, 2018·1 cites·28 claims
- 2163US11526082B2Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2018·Granted Dec 13, 2022·0 cites·27 claims
- 2263US2025217705A1Method for radiation spectrum aware source mask optimization for lithographyASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2361US11747739B2Method and apparatus for imaging using narrowed bandwidthASML NETHERLANDS BV·Filed 2020·Granted Sep 5, 2023·0 cites·20 claims
- 2459US10267687B2Adjusting an amount of coherence of a light beamCymer LLC·Filed 2018·Granted Apr 23, 2019·0 cites·20 claims
- 2558US12374853B2Control system for a plurality of deep ultraviolet optical oscillatorsCymer LLC·Filed 2020·Granted Jul 29, 2025·0 cites·19 claims
- 2657US2024045341A1Optimization of lithographic process based on bandwidth and speckleASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2756US10727642B2Online calibration for repetition rate dependent performance variablesCymer LLC·Filed 2017·Granted Jul 28, 2020·0 cites·31 claims
- 2853US11754541B2Fluorine detection in a gas discharge light sourceCymer LLC·Filed 2018·Granted Sep 12, 2023·0 cites·12 claims
- 2952US9831628B2System and method for automatic gas optimization in a two-chamber gas discharge laser systemCymer LLC·Filed 2015·Granted Nov 28, 2017·0 cites·22 claims
- 3046US2021349404A1Method to create the ideal source spectra with source and mask optimizationASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
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