Inventor · disambiguated record
Miyako Matsui
Also filed as: MATSUI MIYAKO
9 granted patents·5 pending applications·239 citations·filing 1995–2022
87Inventor score
Top patents by PatentIndex Score
14 records- 0196US6700122B2Wafer inspection system and wafer inspection process using charged particle beamHITACHI LTD·Filed 2002·Granted Mar 2, 2004·88 cites·12 claims
- 0290US5981399AMethod and apparatus for fabricating semiconductor devicesHITACHI LTD·Filed 1995·Granted Nov 9, 1999·114 cites·53 claims
- 0385US6753524B2Inspection system and inspection process for wafer with circuit using charged-particle beamHITACHI LTD·Filed 2002·Granted Jun 22, 2004·23 cites·21 claims
- 0484US10665516B2Etching method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted May 26, 2020·3 cites·8 claims
- 0579US7368713B2Method and apparatus for inspecting semiconductor deviceHITACHI HIGH TECH CORP·Filed 2005·Granted May 6, 2008·6 cites·9 claims
- 0675US9702695B2Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereofKAWADA HIROKI·Filed 2011·Granted Jul 11, 2017·5 cites·7 claims
- 0751US2024321583A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 0849US11462416B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 4, 2022·0 cites·9 claims
- 0949US10971369B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Apr 6, 2021·0 cites·15 claims
- 1049US2025105020A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1147US11875978B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Jan 16, 2024·0 cites·15 claims
- 1247US2024047239A1Plasma processing device and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Application pending·0 cites
- 1342US2015293040A1Calculation system and calculation methodHITACHI LTD·Filed 2012·Application pending·0 cites
- 1434US2016079073A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
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