Inventor · disambiguated record
Gousuke Shiraishi
Also filed as: SHIRAISHI GOUSUKE
9 granted patents·6 pending applications·10 citations·filing 2009–2022
80Inventor score
Top patents by PatentIndex Score
15 records- 0171US8101507B2Semiconductor device manufacturing method and semiconductor device manufacturing apparatusASAKO RYUICHI·Filed 2009·Granted Jan 24, 2012·3 cites·5 claims
- 0269US10025190B2Substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Jul 17, 2018·2 cites·12 claims
- 0367US10459339B2Resist pattern forming method, coating and developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Oct 29, 2019·1 cites·9 claims
- 0467US8343714B2Resist applying and developing method, resist film processing unit, and resist applying and developing apparatus comprising the unitTOKYO ELECTRON LTD·Filed 2010·Granted Jan 1, 2013·2 cites·5 claims
- 0565US10274843B2Exposure apparatus, exposure method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Apr 30, 2019·1 cites·7 claims
- 0663US8614140B2Semiconductor device manufacturing apparatusASAKO RYUICHI·Filed 2011·Granted Dec 24, 2013·1 cites·4 claims
- 0753US2024416450A1Processing method and processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0852US2024404852A1Processing method and processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0949US2024071765A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1049US2024312804A1Substrate processing apparatus, substrate processing method, and substrate manufacturing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1149US2024082957A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1241US10101669B2Exposure apparatus, resist pattern forming method, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Oct 16, 2018·0 cites·22 claims
- 1340US2020201176A1Resist Composition and Resist Pattern Forming MethodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1438US10527948B2Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Jan 7, 2020·0 cites·18 claims
- 1537US9899243B2Light irradiation apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Feb 20, 2018·0 cites·8 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →