Inventor · disambiguated record
Hiroshi Komano
Also filed as: KOMANO HIROSHI
42 granted patents·3 pending applications·1,132 citations·filing 1987–2011
98Inventor score
Top patents by PatentIndex Score
45 records- 0197US5714625ACyanooxime sulfonate compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Feb 3, 1998·143 cites·6 claims
- 0295US6388101B1Chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 14, 2002·42 cites·4 claims
- 0394US6063953AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 16, 2000·90 cites·6 claims
- 0494US6010824APhotosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jan 4, 2000·109 cites·24 claims
- 0587US6376153B2Photopolymerizable composition for color filterTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Apr 23, 2002·32 cites·3 claims
- 0685US6261745B1Post-ashing treating liquid compositions and a process for treatment therewithTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 17, 2001·71 cites·11 claims
- 0785US5368991APhotosensitive resin composition for use as a light-shielding film which can be used as black matricesTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Nov 29, 1994·40 cites·10 claims
- 0883US6838229B2Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jan 4, 2005·22 cites·21 claims
- 0983US5714286APhotosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereofTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Feb 3, 1998·42 cites·14 claims
- 1081US6641972B2Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 4, 2003·21 cites·6 claims
- 1180US6683202B2Fluorine-containing monomeric ester compound for base resin in photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jan 27, 2004·8 cites·5 claims
- 1280US4847178APositive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl esterTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Jul 11, 1989·14 cites·8 claims
- 1379US7063934B2Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the sameTOYKO OHKA KOGYO CO LTD·Filed 2002·Granted Jun 20, 2006·15 cites·8 claims
- 1479US6268108B1Composition for forming antireflective coating film and method for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jul 31, 2001·40 cites·7 claims
- 1579US6087063APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jul 11, 2000·37 cites·14 claims
- 1678US7419769B2Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Sep 2, 2008·4 cites·6 claims
- 1777US5545281AMethod of bonding circuit boardsNEC CORP·Filed 1994·Granted Aug 13, 1996·50 cites·11 claims
- 1875US5318651AMethod of bonding circuit boardsNEC CORP·Filed 1992·Granted Jun 7, 1994·46 cites·1 claims
- 1974US5929271ACompounds for use in a positive-working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 27, 1999·26 cites·2 claims
- 2071US5902713AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted May 11, 1999·23 cites·10 claims
- 2169US6022666AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Feb 8, 2000·21 cites·10 claims
- 2269US5498498APhotosensitive resin composition used in a method for forming a light-shielding filmTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 12, 1996·19 cites·10 claims
- 2368US6787284B2Positive resist composition and base material carrying layer of the positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 7, 2004·7 cites·14 claims
- 2467US5543268ADeveloper solution for actinic ray-sensitive resistTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Aug 6, 1996·17 cites·9 claims
- 2565US6136505ALiquid coating composition for use in forming antireflective film and photoresist material using said antireflective filmTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Oct 24, 2000·21 cites·7 claims
- 2664US5885746APhotosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plateTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Mar 23, 1999·22 cites·19 claims
- 2761US5578420AProcess for producing a flexographic printing plateTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Nov 26, 1996·18 cites·5 claims
- 2858US6329126B1Developer solution for acitinic ray sensitive resistTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Dec 11, 2001·12 cites·1 claims
- 2956US5908720APhotosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereofTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jun 1, 1999·23 cites·10 claims
- 3056US5800964APhotoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 1, 1998·20 cites·11 claims
- 3154US5521054ADeveloping solution comprising an aromatic hydrocarbon, an alcohol, and an esterTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted May 28, 1996·10 cites·7 claims
- 3250US6846949B2Fluorine-containing monomeric ester compound for base resin in photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Jan 25, 2005·0 cites·3 claims
- 3349US5892095ACyano group-containing oxime sulfonate compoundsTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Apr 6, 1999·8 cites·9 claims
- 3449US2005123854A1Positive resist composition and base material carrying layer of the positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 3548US6225476B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 1, 2001·6 cites·2 claims
- 3648US5928837ANegative-working chemical-sensitization photoresist composition comprising oxime sulfonate compoundsTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 27, 1999·14 cites·10 claims
- 3747US7129018B2Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the sameTOYKO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 31, 2006·2 cites·6 claims
- 3847US6171749B1Negative-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jan 9, 2001·12 cites·14 claims
- 3946US2013227985A1Air conditionerKOMANO HIROSHI·Filed 2011·Application pending·0 cites
- 4045US6265116B1Process for producing color filterTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jul 24, 2001·9 cites·2 claims
- 4142US5908734AImage formation method with a post exposure heating stepTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jun 1, 1999·7 cites·7 claims
- 4241US6077644APositive-working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jun 20, 2000·7 cites·10 claims
- 4340US5990338ANegative-working chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Nov 23, 1999·1 cites·6 claims
- 4440US5973187APositive-working chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Oct 26, 1999·1 cites·6 claims
- 4532US2004152860A1Positive resist composition and base material carrying layer of the positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
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