Inventor · disambiguated record
Stanislav Smirnov
Also filed as: SMIRNOV STANISLAV · SMIRNOV STANISLAV Y
30 granted patents·1 pending application·1,044 citations·filing 2002–2020
96Inventor score
Files withASML HOLDING NV19ASML NETHERLANDS BV6SMIRNOV STANISLAV Y5SHMAREV YEVGENIY KONSTANITINOVICH1
Top patents by PatentIndex Score
31 records- 0197US6778257B2Imaging apparatusASML NETHERLANDS BV·Filed 2002·Granted Aug 17, 2004·953 cites·28 claims
- 0291US10107761B2Method and device for focusing in an inspection systemASML NETHERLANDS BV·Filed 2016·Granted Oct 23, 2018·5 cites·22 claims
- 0384US7859647B2Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2008·Granted Dec 28, 2010·7 cites·10 claims
- 0481US7633689B2Catadioptric optical system for scatterometryASML HOLDING NV·Filed 2007·Granted Dec 15, 2009·11 cites·17 claims
- 0578US7965378B2Optical system and method for illumination of reflective spatial light modulators in maskless lithographyASML HOLDING NV·Filed 2007·Granted Jun 21, 2011·8 cites·1 claims
- 0678US7852459B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Dec 14, 2010·5 cites·20 claims
- 0776US7023525B2Imaging apparatusASML NETHERLANDS BV·Filed 2004·Granted Apr 4, 2006·13 cites·39 claims
- 0875US10852247B2Variable corrector of a wave frontASML HOLDING NV·Filed 2017·Granted Dec 1, 2020·2 cites·23 claims
- 0974US10724961B2Method and device for focusing in an inspection systemASML HOLDING NV·Filed 2017·Granted Jul 28, 2020·1 cites·26 claims
- 1073US9904173B2Method and apparatuses for optical pupil symmetrizationASML HOLDING NV·Filed 2015·Granted Feb 27, 2018·1 cites·30 claims
- 1173US9285687B2Inspection apparatus, lithographic apparatus, and device manufacturing methodSMIRNOV STANISLAV Y·Filed 2012·Granted Mar 15, 2016·2 cites·21 claims
- 1273US8982481B2Catadioptric objective for scatterometryASML HOLDING NV·Filed 2012·Granted Mar 17, 2015·2 cites·17 claims
- 1372US7110082B2Optical system for maskless lithographyASML HOLDING NV·Filed 2003·Granted Sep 19, 2006·11 cites·6 claims
- 1469US7317583B2High numerical aperture projection system and method for microlithographyASML HOLDING NV·Filed 2002·Granted Jan 8, 2008·10 cites·25 claims
- 1568US11126007B2Beam splitting prism systemsASML HOLDING NV·Filed 2020·Granted Sep 21, 2021·0 cites·20 claims
- 1668US8634064B2Optical system for increasing illumination efficiency of a patterning device by producing a plurality of beamsSMIRNOV STANISLAV Y·Filed 2010·Granted Jan 21, 2014·1 cites·8 claims
- 1765US7826142B2Method for improved optical design using deterministically defined surfacesASML HOLDING NV·Filed 2005·Granted Nov 2, 2010·4 cites·7 claims
- 1862US8064148B2High numerical aperture catadioptric objectives without obscuration and applications thereofSMIRNOV STANISLAV Y·Filed 2009·Granted Nov 22, 2011·1 cites·17 claims
- 1961US10747010B2Beam splitting prism systemsASML HOLDING NV·Filed 2018·Granted Aug 18, 2020·0 cites·16 claims
- 2059US10048591B2Catadioptric illumination system for metrologyASML HOLDING NV·Filed 2015·Granted Aug 14, 2018·0 cites·20 claims
- 2158US11537055B2Lithographic apparatus, metrology apparatus, optical system and methodASML HOLDING NV·Filed 2020·Granted Dec 27, 2022·0 cites·20 claims
- 2257US6741362B2Method, system, and computer program product for determining refractive index distributionASML HOLDING NV·Filed 2002·Granted May 25, 2004·2 cites·25 claims
- 2355US10495889B2Beam homogenizer, illumination system and metrology systemASML NETHERLANDS BV·Filed 2017·Granted Dec 3, 2019·0 cites·21 claims
- 2453US8259398B2High numerical aperture catadioptric objectives without obscuration and applications thereofSMIRNOV STANISLAV Y·Filed 2011·Granted Sep 4, 2012·0 cites·21 claims
- 2553US7839487B2Optical system for increasing illumination efficiency of a patterning deviceASML HOLDING NV·Filed 2006·Granted Nov 23, 2010·0 cites·23 claims
- 2652US9069260B2Catadioptric illumination system for metrologySMIRNOV STANISLAV Y·Filed 2011·Granted Jun 30, 2015·0 cites·20 claims
- 2752US7834979B2Off-axis catadioptric projection optical system for lithographyASML NETHERLANDS BV·Filed 2009·Granted Nov 16, 2010·0 cites·18 claims
- 2852US7511798B2Off-axis catadioptric projection optical system for lithographyASML HOLDING NV·Filed 2004·Granted Mar 31, 2009·2 cites·6 claims
- 2952US7289277B2Relay lens used in an illumination system of a lithography systemASML HOLDING NV·Filed 2003·Granted Oct 30, 2007·3 cites·12 claims
- 3041US2006138349A1Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2004·Application pending·0 cites
- 3138US8107173B2Catadioptric optical system for scatterometrySHMAREV YEVGENIY KONSTANITINOVICH·Filed 2009·Granted Jan 31, 2012·0 cites·12 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →