Inventor · disambiguated record
William R. Brunsvold
Also filed as: BRUNSVOLD WILLIAM R · BRUNSVOLD WILLIAM ROSS
21 granted patents·704 citations·filing 1987–2004
96Inventor score
Top patents by PatentIndex Score
21 records- 0194US6057080ATop antireflective coating filmIBM·Filed 1997·Granted May 2, 2000·86 cites·17 claims
- 0292US6344305B1Radiation sensitive silicon-containing resistsIBM·Filed 2000·Granted Feb 5, 2002·42 cites·11 claims
- 0390US5744537AAntireflective coating filmsIBM·Filed 1997·Granted Apr 28, 1998·72 cites·5 claims
- 0488US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 0588US4939070AThermally stable photoresists with high sensitivityBRUNSVOLD WILLIAM R·Filed 1988·Granted Jul 3, 1990·86 cites·15 claims
- 0685US5609989AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1995·Granted Mar 11, 1997·47 cites·11 claims
- 0785US5272042APositive photoresist system for near-UV to visible imagingIBM·Filed 1991·Granted Dec 21, 1993·68 cites·3 claims
- 0884US6187505B1Radiation sensitive silicon-containing resistsIBM·Filed 1999·Granted Feb 13, 2001·46 cites·17 claims
- 0983US5338818ASilicon containing positive resist for DUV lithographyIBM·Filed 1992·Granted Aug 16, 1994·44 cites·4 claims
- 1083US5164278ASpeed enhancers for acid sensitized resistsIBM·Filed 1990·Granted Nov 17, 1992·41 cites·23 claims
- 1179US4931379AHigh sensitivity resists having autodecomposition temperatures greater than about 160° C.IBM·Filed 1988·Granted Jun 5, 1990·30 cites·11 claims
- 1277US6927015B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2004·Granted Aug 9, 2005·10 cites·5 claims
- 1376US5023164AHighly sensitive dry developable deep UV photoresistIBM·Filed 1989·Granted Jun 11, 1991·26 cites·14 claims
- 1470US6372406B1Deactivated aromatic amines as additives in acid-catalyzed resistsIBM·Filed 2000·Granted Apr 16, 2002·10 cites·6 claims
- 1570US5919597AMethods for preparing photoresist compositionsIBM CORP OF ARMONK·Filed 1997·Granted Jul 6, 1999·34 cites·28 claims
- 1662US5667938AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1996·Granted Sep 16, 1997·15 cites·6 claims
- 1756US5733705AAcid Scavengers for use in chemically amplified photoresistsIBM·Filed 1996·Granted Mar 31, 1998·13 cites·7 claims
- 1841US4828964APolyimide formulation for forming a patterned film on a substrateIBM·Filed 1987·Granted May 9, 1989·7 cites·24 claims
- 1936US5567569AProcess for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ringIBM·Filed 1996·Granted Oct 22, 1996·4 cites·19 claims
- 2032US5552256APositive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ringIBM·Filed 1994·Granted Sep 3, 1996·2 cites·8 claims
- 2130US5644038AQuinone diazo compound containing non-metallic atomIBM·Filed 1996·Granted Jul 1, 1997·0 cites·11 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →