Inventor · disambiguated record
Craig W. Christian
Also filed as: CHRISTIAN CRAIG W · CHRISTIAN CRAIG WILLIAM
19 granted patents·1 pending application·674 citations·filing 1993–2002
96Inventor score
Files withADVANCED MICRO DEVICES INC19
Top patents by PatentIndex Score
20 records- 0187US7324865B1Run-to-run control method for automated control of metal deposition processesADVANCED MICRO DEVICES INC·Filed 2001·Granted Jan 29, 2008·28 cites·49 claims
- 0286US5393676AMethod of fabricating semiconductor gate electrode with fluorine migration barrierADVANCED MICRO DEVICES INC·Filed 1993·Granted Feb 28, 1995·68 cites·13 claims
- 0385US6454899B1Apparatus for filling trenchesADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 24, 2002·33 cites·11 claims
- 0485US5444024AMethod for low energy implantation of argon to control titanium silicide formationADVANCED MICRO DEVICES INC·Filed 1994·Granted Aug 22, 1995·61 cites·13 claims
- 0584US6684122B1Control mechanism for matching process parameters in a multi-chamber process toolADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 27, 2004·33 cites·59 claims
- 0684US6284622B1Method for filling trenchesADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 4, 2001·61 cites·11 claims
- 0782US6630360B2Advanced process control (APC) of copper thickness for chemical mechanical planarization (CMP) optimizationADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 7, 2003·36 cites·20 claims
- 0881US5470794AMethod for forming a silicide using ion beam mixingADVANCED MICRO DEVICES INC·Filed 1994·Granted Nov 28, 1995·73 cites·16 claims
- 0980US5401674AGermanium implant for use with ultra-shallow junctionsADVANCED MICRO DEVICES INC·Filed 1994·Granted Mar 28, 1995·47 cites·14 claims
- 1078US6469518B1Method and apparatus for determining measurement frequency based on hardware age and usageADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 22, 2002·22 cites·19 claims
- 1177US5914879ASystem and method for calculating cluster tool performance metrics using a weighted configuration matrixADVANCED MICRO DEVICES INC·Filed 1997·Granted Jun 22, 1999·74 cites·32 claims
- 1277US5550084AIntegrated circuit fabrication using a metal silicide having a sputterdeposited metal nitride layerADVANCED MICRO DEVICES INC·Filed 1995·Granted Aug 27, 1996·42 cites·18 claims
- 1374US6650957B1Method and apparatus for run-to-run control of deposition processADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 18, 2003·19 cites·57 claims
- 1466US6500681B1Run-to-run etch control by feeding forward measured metal thicknessADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 31, 2002·10 cites·23 claims
- 1565US5372951AMethod of making a semiconductor having selectively enhanced field oxide areasADVANCED MICRO DEVICES INC·Filed 1993·Granted Dec 13, 1994·32 cites·12 claims
- 1658US6512991B1Method and apparatus for reducing deposition variation by modeling post-clean chamber performanceADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 28, 2003·9 cites·15 claims
- 1758US6403151B1Method for controlling optical properties of antireflective coatingsADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 11, 2002·3 cites·21 claims
- 1846US6271112B1Interlayer between titanium nitride and high density plasma oxideADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 7, 2001·12 cites·27 claims
- 1946US5661335ASemicondutor having selectively enhanced field oxide areas and method for producing sameADVANCED MICRO DEVICES INC·Filed 1995·Granted Aug 26, 1997·11 cites·2 claims
- 2035US2002192944A1Method and apparatus for controlling a thickness of a copper filmFiled 2001·Application pending·0 cites
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