Inventor · disambiguated record
Tomoharu Fujiwara
Also filed as: FUJIWARA TOMOHARU
53 granted patents·16 pending applications·220 citations·filing 2000–2025
98Inventor score
Top patents by PatentIndex Score
69 records- 0191US9651871B2Spatial light modulator, exposure apparatus, and method for manufacturing deviceNIKON CORP·Filed 2016·Granted May 16, 2017·3 cites·24 claims
- 0290US9291814B2Spatial light modulator, exposure apparatus, and method for manufacturing deviceOWA SOICHI·Filed 2011·Granted Mar 22, 2016·9 cites·34 claims
- 0389US11284791B2Image processing method, program, and image processing deviceNIKON CORP·Filed 2020·Granted Mar 29, 2022·2 cites·17 claims
- 0489US7705968B2Plate member, substrate holding device, exposure apparatus and method, and device manufacturing methodNIKON CORP·Filed 2006·Granted Apr 27, 2010·13 cites·39 claims
- 0587US9911701B2Mark forming method and device manufacturing methodNIKON CORP·Filed 2016·Granted Mar 6, 2018·3 cites·10 claims
- 0687US7804576B2Maintenance method, maintenance device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2005·Granted Sep 28, 2010·7 cites·38 claims
- 0786US6917048B2Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatusNIKON CORP·Filed 2002·Granted Jul 12, 2005·23 cites·67 claims
- 0885US7914972B2Exposure method and device manufacturing methodNIKON CORP·Filed 2005·Granted Mar 29, 2011·7 cites·22 claims
- 0985US6632722B2Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising sameNIKON CORP·Filed 2002·Granted Oct 14, 2003·29 cites·9 claims
- 1085US2025352057A1Image processing method, image processing program, image processing device, image display device, and image display methodNIKON CORP·Filed 2025·Application pending·0 cites
- 1184US8064039B2Exposure method, exposure apparatus, and device manufacturing methodSHIRAISHI KENICHI·Filed 2006·Granted Nov 22, 2011·6 cites·32 claims
- 1283US10761431B2Spatial light modulator, method of driving same, and exposure method and apparatusNIKON CORP·Filed 2019·Granted Sep 1, 2020·2 cites·12 claims
- 1383US6496350B2Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising sameNIKON CORP·Filed 2001·Granted Dec 17, 2002·30 cites·12 claims
- 1481US6447964B2Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrateNIKON CORP·Filed 2001·Granted Sep 10, 2002·17 cites·20 claims
- 1579US12226153B2Image signal output device and method, and image data conversion device, method, and programNIKON CORP·Filed 2023·Granted Feb 18, 2025·0 cites·7 claims
- 1679US10054858B2Spatial light modulator, method of driving same, and exposure method and apparatusWATANABE YOJI·Filed 2011·Granted Aug 21, 2018·2 cites·16 claims
- 1778US12458222B2Image processing method, image processing program, image processing device, image display device, and image display methodNIKON CORP·Filed 2023·Granted Nov 4, 2025·0 cites·9 claims
- 1878US11744455B2Image signal output device and method, and image data conversion device, method, and programNIKON CORP·Filed 2018·Granted Sep 5, 2023·2 cites·6 claims
- 1977US10461039B2Mark, method for forming same, and exposure apparatusNIKON CORP·Filed 2019·Granted Oct 29, 2019·1 cites·16 claims
- 2077US10236259B2Mark, method for forming same, and exposure apparatusNIKON CORP·Filed 2018·Granted Mar 19, 2019·1 cites·17 claims
- 2176US10338472B2Mark forming method and device manufacturing methodNIKON CORP·Filed 2017·Granted Jul 2, 2019·1 cites·17 claims
- 2276US8018571B2Exposure apparatus and exposure method, and device manufacturing methodNIKON CORP·Filed 2008·Granted Sep 13, 2011·3 cites·43 claims
- 2374US8040489B2Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquidNIKON CORP·Filed 2005·Granted Oct 18, 2011·3 cites·28 claims
- 2473US8922754B2Immersion exposure apparatus and device fabricating method with two substrate stages and metrology stationFUJIWARA TOMOHARU·Filed 2008·Granted Dec 30, 2014·2 cites·12 claims
- 2573US2025151998A1Image signal output device and method, and image data conversion device, method, and programNIKON CORP·Filed 2025·Application pending·0 cites
- 2671US10317346B2Method and device for inspecting spatial light modulator, and exposure method and deviceFUJIWARA TOMOHARU·Filed 2012·Granted Jun 11, 2019·2 cites·10 claims
- 2771US8236467B2Exposure method, exposure apparatus, and device manufacturing methodSHIRAISHI KENICHI·Filed 2006·Granted Aug 7, 2012·2 cites·34 claims
- 2870US9941217B2Mark, method for forming same, and exposure apparatusNIKON CORP·Filed 2015·Granted Apr 10, 2018·1 cites·59 claims
- 2970US8089608B2Exposure apparatus, exposure method, and device manufacturing methodNAGASAKA HIROYUKI·Filed 2006·Granted Jan 3, 2012·2 cites·31 claims
- 3070US6541779B2Charged-particle-beam microlithography apparatus including selectable systems for determining alignment-mark position, and device-fabrication methods utilizing sameNIKON CORP·Filed 2001·Granted Apr 1, 2003·8 cites·10 claims
- 3170US6287876B1Reticle-substrate alignment methods for charged-particle-beam microlithography, and associated semiconductor-device manufacturing methodsNIKON CORP·Filed 2000·Granted Sep 11, 2001·8 cites·18 claims
- 3269US9568826B2Mark formation method and device manufacturing methodNIKON CORP·Filed 2015·Granted Feb 14, 2017·1 cites·9 claims
- 3369US8941808B2Immersion lithographic apparatus rinsing outer contour of substrate with immersion spaceNAKANO KATSUSHI·Filed 2008·Granted Jan 27, 2015·2 cites·20 claims
- 3469US6570752B2Wafer chucks and the like including substrate-adhesion detection and adhesion correctionNIKON CORP·Filed 2000·Granted May 27, 2003·12 cites·29 claims
- 3566US6656663B2Microlithographic exposure methods using a segmented reticle defining pattern elements exhibiting reduced incidence of stitching anomalies when imaged on a substrateNIKON CORP·Filed 2002·Granted Dec 2, 2003·6 cites·58 claims
- 3665US10338479B2Spatial light modulator, method of driving same, and exposure method and apparatusNIKON CORP·Filed 2018·Granted Jul 2, 2019·0 cites·25 claims
- 3764US10495977B2Spatial light modulator, exposure apparatus, and method for manufacturing deviceNIKON CORP·Filed 2019·Granted Dec 3, 2019·0 cites·15 claims
- 3864US9709900B2Exposure apparatus and device fabricating methodNIKON CORP·Filed 2014·Granted Jul 18, 2017·0 cites·72 claims
- 3963US2017322496A1Exposure apparatus and device fabricating methodNIKON CORP·Filed 2017·Application pending·0 cites
- 4061US10598606B2Method and device for inspecting spatial light modulator, and exposure method and deviceNIKON CORP·Filed 2019·Granted Mar 24, 2020·0 cites·12 claims
- 4161US6429090B1Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising sameNIKON CORP·Filed 2000·Granted Aug 6, 2002·6 cites·16 claims
- 4261US2013321785A1Exposure apparatus and device fabricating methodNIKON CORP·Filed 2013·Application pending·0 cites
- 4360US8891055B2Maintenance method, maintenance device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Nov 18, 2014·0 cites·20 claims
- 4459US10222705B2Spatial light modulator, exposure apparatus, and method for manufacturing deviceNIKON CORP·Filed 2017·Granted Mar 5, 2019·0 cites·21 claims
- 4559US9618854B2Exposure method, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2016·Granted Apr 11, 2017·0 cites·20 claims
- 4658US11712160B2Image processing method, image processing program, image processing device, image display device, and image display methodNIKON CORP·Filed 2017·Granted Aug 1, 2023·0 cites·7 claims
- 4758US11419495B2Image processing method, image processing device, and storage mediumNIKON CORP·Filed 2019·Granted Aug 23, 2022·0 cites·11 claims
- 4856US8941812B2Exposure method, exposure apparatus, and device manufacturing methodSHIRAISHI KENICHI·Filed 2012·Granted Jan 27, 2015·0 cites·28 claims
- 4956US2024153078A1Image processing method, image processing program, image processing device, and ophthalmic deviceNIKON CORP·Filed 2024·Application pending·0 cites
- 5055US9335639B2Exposure method, exposure apparatus, and device manufacturing methodSHIRAISHI KENICHI·Filed 2011·Granted May 10, 2016·0 cites·18 claims
Showing the top 50 of 69 patent records by PatentIndex Score.
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