Inventor · disambiguated record
Fu-Jye Liang
Also filed as: LIANG FU-JYE
21 granted patents·1 pending application·77 citations·filing 2003–2021
92Inventor score
Files withTAIWAN SEMICONDUCTOR MFG10TAIWAN SEMICONDUCTOR MFG CO LTD9CHEN LI-JUI1HSIEH CHANG-TSUN1HUANG GUO-TSAI1
Top patents by PatentIndex Score
22 records- 0193US6982135B2Pattern compensation for stitchingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jan 3, 2006·54 cites·18 claims
- 0287US10366973B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 30, 2019·2 cites·20 claims
- 0386US10642158B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 5, 2020·2 cites·20 claims
- 0483US10871713B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 22, 2020·1 cites·20 claims
- 0582US9158209B2Method of overlay predictionTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Oct 13, 2015·5 cites·20 claims
- 0680US11150561B2Method and apparatus for collecting information used in image-error compensationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 19, 2021·1 cites·20 claims
- 0777US8329360B2Method and apparatus of providing overlayHUANG GUO-TSAI·Filed 2009·Granted Dec 11, 2012·4 cites·18 claims
- 0876US10146141B2Lithography process and system with enhanced overlay qualityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 4, 2018·2 cites·20 claims
- 0972US11594528B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 28, 2023·0 cites·20 claims
- 1071US10712651B2Method and apparatus for collecting information used in image-error compensationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 14, 2020·1 cites·20 claims
- 1171US7939222B2Method and system for improving printing accuracy of a contact layoutTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 10, 2011·3 cites·10 claims
- 1270US11024623B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 1, 2021·0 cites·20 claims
- 1366US9360778B2System and method for lithography patterningCHEN LI-JUI·Filed 2012·Granted Jun 7, 2016·2 cites·20 claims
- 1464US10720419B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 21, 2020·0 cites·20 claims
- 1555US9025130B2Method and apparatus for maintaining depth of focusTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted May 5, 2015·0 cites·20 claims
- 1655US8592107B2Method and apparatus of providing overlayTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Nov 26, 2013·0 cites·20 claims
- 1754US9360767B2Method and apparatus for maintaining depth of focusTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jun 7, 2016·0 cites·20 claims
- 1844US7723014B2System and method for photolithography in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted May 25, 2010·0 cites·6 claims
- 1944US7675604B2Hood for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Mar 9, 2010·0 cites·20 claims
- 2044US7666576B2Exposure scan and step direction optimizationTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Feb 23, 2010·0 cites·19 claims
- 2141US8520189B2Method and apparatus for maintaining depth of focusHSIEH CHANG-TSUN·Filed 2010·Granted Aug 27, 2013·0 cites·19 claims
- 2239US2008020324A1Immersion lithography defect reduction with top coater removalTAIWAN SEMICONDUCTOR MFG·Filed 2006·Application pending·0 cites
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