Inventor · disambiguated record
Rafael Egger
Also filed as: EGGER RAFAEL
9 granted patents·45 citations·filing 2004–2015
83Inventor score
Files withEGGER RAFAEL2LRE MEDICAL GMBH2ZEISS CARL LASER OPTICS GMBH2SINGER WOLFGANG1SOHMER ALEXANDER1
Top patents by PatentIndex Score
9 records- 0193US7538948B2Optical illumination system for creating a line beamZEISS CARL LASER OPTICS GMBH·Filed 2005·Granted May 26, 2009·21 cites·48 claims
- 0282US7864429B2Optical illumination system for creating a line beamZEISS CARL LASER OPTICS GMBH·Filed 2009·Granted Jan 4, 2011·10 cites·20 claims
- 0381US8334522B2Method for the quantitative determination of the concentration of fluorophores of a substance in a sample and apparatus for carrying out the sameEGGER RAFAEL·Filed 2009·Granted Dec 18, 2012·11 cites·18 claims
- 0466US8045172B2Method and apparatus for determining the concentration of a substance in a liquidLRE MEDICAL GMBH·Filed 2009·Granted Oct 25, 2011·2 cites·7 claims
- 0547US7542217B2Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted Jun 2, 2009·1 cites·24 claims
- 0645US9335268B2Device and method for determining the concentration of fluorophores in a sampleLRE MEDICAL GMBH·Filed 2015·Granted May 10, 2016·0 cites·12 claims
- 0744US9006685B2Device and method for determining the concentration of fluorophores in a sampleEGGER RAFAEL·Filed 2012·Granted Apr 14, 2015·0 cites·13 claims
- 0843US8134687B2Illumination system of a microlithographic exposure apparatusSINGER WOLFGANG·Filed 2005·Granted Mar 13, 2012·0 cites·20 claims
- 0934US8873151B2Illumination system for a microlithgraphic exposure apparatusSOHMER ALEXANDER·Filed 2006·Granted Oct 28, 2014·0 cites·25 claims
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