Inventor · disambiguated record
Shinya Kikugawa
Also filed as: KIKUGAWA SHINYA
30 granted patents·10 pending applications·432 citations·filing 1990–2024
97Inventor score
Top patents by PatentIndex Score
40 records- 0195US10731233B2Composition for bondingAGC INC·Filed 2018·Granted Aug 4, 2020·7 cites·17 claims
- 0295US7419924B2Silica glass containing TiO2 and process for its productionASAHI GLASS CO LTD·Filed 2006·Granted Sep 2, 2008·21 cites·13 claims
- 0392US7989378B2TiO2-containing silica glassASAHI GLASS CO LTD·Filed 2010·Granted Aug 2, 2011·15 cites·11 claims
- 0491US6544914B1Synthetic quartz glass for optical member, process for producing the same, and method of using the sameASAHI GLASS CO LTD·Filed 2000·Granted Apr 8, 2003·29 cites·11 claims
- 0591US5326729ATransparent quartz glass and process for its productionASAHI GLASS CO LTD·Filed 1993·Granted Jul 5, 1994·81 cites·3 claims
- 0688US6475575B1Pellicle and method for manufacture thereofASAHI GLASS CO LTD·Filed 2000·Granted Nov 5, 2002·24 cites·15 claims
- 0786US6576578B1Synthetic quartz glass and method for preparing the sameASAHI GLASS CO LTD·Filed 2000·Granted Jun 10, 2003·32 cites·12 claims
- 0886US6499317B1Synthetic quartz glass and method for production thereofASAHI GLASS CO LTD·Filed 1999·Granted Dec 31, 2002·32 cites·20 claims
- 0984US8093165B2TiO2-containing silica glass and optical member for EUV lithography using the sameKOIKE AKIO·Filed 2010·Granted Jan 10, 2012·8 cites·20 claims
- 1084US6829084B2Ultraviolet and vacuum ultraviolet antireflection substrateASAHI GLASS CO LTD·Filed 2003·Granted Dec 7, 2004·22 cites·11 claims
- 1181US12415762B2Method of producing SiC—Si composite component and SiC—Si composite componentAGC INC·Filed 2024·Granted Sep 16, 2025·0 cites·13 claims
- 1281US8034731B2TIO2-containing silica glass and optical member for lithography using the sameASAHI GLASS CO LTD·Filed 2010·Granted Oct 11, 2011·5 cites·10 claims
- 1377US7585800B2Silica glass and optical materialASAHI GLASS CO LTD·Filed 2007·Granted Sep 8, 2009·5 cites·8 claims
- 1475US7998892B2TiO2-containing silica glass and optical member for lithography using the sameASAHI GLASS CO LTD·Filed 2010·Granted Aug 16, 2011·3 cites·19 claims
- 1575US5252140ASolar cell substrate and process for its productionKOBAYASHI SHIGEYOSHI·Filed 1990·Granted Oct 12, 1993·53 cites·11 claims
- 1673US7592063B2Quartz glass substrate and process for its productionASAHI GLASS CO LTD·Filed 2006·Granted Sep 22, 2009·3 cites·16 claims
- 1771US6611317B1Exposure apparatus, semiconductor device, and photomaskASAHI GLASS CO LTD·Filed 2000·Granted Aug 26, 2003·11 cites·4 claims
- 1870US6795170B2Structure for attaching a pellicle to a photo-maskASAHI GLASS CO LTD·Filed 2002·Granted Sep 21, 2004·16 cites·7 claims
- 1970US6628456B2Ultraviolet and vacuum ultraviolet antireflection substrateASAHI GLASS CO LTD·Filed 2002·Granted Sep 30, 2003·9 cites·13 claims
- 2065US7022633B2Synthetic quartz glass and process for producing itASAHI GLASS CO LTD·Filed 2002·Granted Apr 4, 2006·6 cites·10 claims
- 2165US5330941AQuartz glass substrate for polysilicon thin film transistor liquid crystal displayASAHI GLASS CO LTD·Filed 1992·Granted Jul 19, 1994·29 cites·5 claims
- 2265US2009242387A1Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2ASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 2364US6744562B2PellicleASAHI GLASS CO LTD·Filed 2002·Granted Jun 1, 2004·9 cites·9 claims
- 2463US2021009473A1METHOD OF PRODUCING SiC-Si COMPOSITE COMPONENT AND SiC-Si COMPOSITE COMPONENTAGC INC·Filed 2020·Application pending·0 cites
- 2560US8323856B2Mask blanksKIKUGAWA SHINYA·Filed 2010·Granted Dec 4, 2012·1 cites·24 claims
- 2660US6436361B1Silicon carbide and process for its productionASAHI GLASS CO LTD·Filed 2000·Granted Aug 20, 2002·9 cites·12 claims
- 2756US2007207911A1Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2ASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 2856US2008032213A1Mask blanksASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 2949US2008039310A1Quartz-type glass and process for its productionASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 3048US7784307B2Optical member made of synthetic quartz glass, and process for its productionASAHI GLASS CO LTD·Filed 2006·Granted Aug 31, 2010·0 cites·14 claims
- 3144US7491475B2Photomask substrate made of synthetic quartz glass and photomaskASAHI GLASS CO LTD·Filed 2006·Granted Feb 17, 2009·0 cites·10 claims
- 3244US2001035361A1Container for an optical articleASAHI GLASS CO LTD·Filed 2001·Application pending·0 cites
- 3343US8257675B2Artificial quartz member, process for producing the same, and optical element comprising the sameAGATA NORIYUKI·Filed 2008·Granted Sep 4, 2012·0 cites·8 claims
- 3443US6713200B2Pellicle and method of using the sameASAHI GLASS CO LTD·Filed 2001·Granted Mar 30, 2004·2 cites·18 claims
- 3541US8178450B2TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufactureKOIKE AKIO·Filed 2010·Granted May 15, 2012·0 cites·16 claims
- 3641US2013034688A1Glass substrate for forming through-substrate via of semiconductor deviceASAHI GLASS CO LTD·Filed 2012·Application pending·0 cites
- 3741US2013034687A1Glass substrate for forming through-substrate via of semiconductor deviceASAHI GLASS CO LTD·Filed 2012·Application pending·0 cites
- 3840US2012149543A1Tio2-containing silica glass, and optical member for euv lithographyKOIKE AKIO·Filed 2012·Application pending·0 cites
- 3938US8402786B2Synthetic silica glass optical component and process for its productionIKUTA YOSHIAKI·Filed 2002·Granted Mar 26, 2013·0 cites·7 claims
- 4038US2012292793A1Process for producing article having fine concave and convex structure on surfaceKOIKE AKIO·Filed 2012·Application pending·0 cites
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