Inventor · disambiguated record
Hiroki Nakatsu
Also filed as: NAKATSU HIROKI
6 granted patents·7 pending applications·13 citations·filing 2007–2025
70Inventor score
Top patents by PatentIndex Score
13 records- 0180US8547107B2Self-diagnostic apparatus for electrical storage systemABE TAKAYOSHI·Filed 2012·Granted Oct 1, 2013·12 cites·10 claims
- 0265US11243468B2Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production methodJSR CORP·Filed 2019·Granted Feb 8, 2022·1 cites·17 claims
- 0363US2025370340A1Method for manufacturing semiconductor substrate, composition, and polymerJSR CORP·Filed 2025·Application pending·0 cites
- 0459US2024153768A1Method for manufacturing semiconductor substrate and compositionJSR CORP·Filed 2023·Application pending·0 cites
- 0555US2023416422A1Composition, method for manufacturing semiconductor substrate, polymer, and method for manufacturing polymerJSR CORP·Filed 2023·Application pending·0 cites
- 0654US2023416451A1Composition, method for manufacturing semiconductor substrate, polymer, and method for manufacturing polymerJSR CORP·Filed 2023·Application pending·0 cites
- 0752US2008126166A1System-design support program and methodFUJITSU LTD·Filed 2007·Application pending·0 cites
- 0852US2008127096A1Program and method for supporting system designFUJITSU LTD·Filed 2007·Application pending·0 cites
- 0949US11880138B2Composition, pattern-forming method, and compound-producing methodJSR CORP·Filed 2021·Granted Jan 23, 2024·0 cites·7 claims
- 1049US11667620B2Composition, film, film-forming method and patterned substrate-producing methodJSR CORP·Filed 2020·Granted Jun 6, 2023·0 cites·18 claims
- 1148US2023341778A1Method for manufacturing semiconductor substrate and compositionJSR CORP·Filed 2023·Application pending·0 cites
- 1246US11454890B2Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compoundJSR CORP·Filed 2020·Granted Sep 27, 2022·0 cites·20 claims
- 1342US11215928B2Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrateJSR CORP·Filed 2019·Granted Jan 4, 2022·0 cites·8 claims
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