Inventor · disambiguated record
Etsuo Wani
Also filed as: WANI ETSUO
5 granted patents·3 pending applications·102 citations·filing 1984–2004
80Inventor score
Files withANELVA CORP2BEPPU TATSURO1NAT INST OF ADVANCED IND SCIEN1RENESAS TECH CORP1RES INST OF INNOVATIVE TECH FO1
Top patents by PatentIndex Score
8 records- 0186US4482419ADry etching apparatus comprising etching chambers of different etching rate distributionsANELVA CORP·Filed 1984·Granted Nov 13, 1984·71 cites·8 claims
- 0259US8043438B2Device for cleaning CVD device and method of cleaning CVD deviceNAT INST OF ADVANCED IND SCIEN·Filed 2004·Granted Oct 25, 2011·4 cites·1 claims
- 0344US6935351B2Method of cleaning CVD device and cleaning device thereforRENESAS TECH CORP·Filed 2002·Granted Aug 30, 2005·7 cites·14 claims
- 0443US5087341ADry etching apparatus and methodANELVA CORP·Filed 1990·Granted Feb 11, 1992·18 cites·12 claims
- 0541US8277560B2CVD apparatus and method of cleaning the CVD apparatusSAKAI KATSUO·Filed 2003·Granted Oct 2, 2012·2 cites·6 claims
- 0640US2005252451A1Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gasBEPPU TATSURO·Filed 2003·Application pending·0 cites
- 0738US2006201533A1Cvd apparatus and method for cleaning cvd apparatusRES INST OF INNOVATIVE TECH FO·Filed 2004·Application pending·0 cites
- 0835US2004255854A1Cvd apparatus and method of cleaning the cvd apparatusFiled 2003·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →