Inventor · disambiguated record
Tsutomu Tsukada
Also filed as: TSUKADA TSUTOMU
21 granted patents·4 pending applications·1,049 citations·filing 1980–2018
96Inventor score
Top patents by PatentIndex Score
25 records- 0197US4399016APlasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attractionANELVA CORP·Filed 1982·Granted Aug 16, 1983·121 cites·14 claims
- 0296US4816638AVacuum processing apparatusANELVA CORP·Filed 1987·Granted Mar 28, 1989·335 cites·6 claims
- 0393US4950956APlasma processing apparatusANELVA CORP·Filed 1987·Granted Aug 21, 1990·71 cites·11 claims
- 0490US6043608APlasma processing apparatusNEC CORP·Filed 1997·Granted Mar 28, 2000·73 cites·9 claims
- 0589US4352725ADry etching device comprising an electrode for controlling etch rateANELVA CORP·Filed 1980·Granted Oct 5, 1982·33 cites·6 claims
- 0687US4968374APlasma etching apparatus with dielectrically isolated electrodesANELVA CORP·Filed 1989·Granted Nov 6, 1990·54 cites·5 claims
- 0786US10617997B1Apparatus for exhaust gas abatement under reduced pressureKANKEN TECHNO CO LTD·Filed 2018·Granted Apr 14, 2020·3 cites·5 claims
- 0886US4482419ADry etching apparatus comprising etching chambers of different etching rate distributionsANELVA CORP·Filed 1984·Granted Nov 13, 1984·71 cites·8 claims
- 0984US5565738APlasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamberNEC CORP·Filed 1995·Granted Oct 15, 1996·53 cites·13 claims
- 1081US6199505B1Plasma processing apparatusANELVA CORP·Filed 1999·Granted Mar 13, 2001·38 cites·8 claims
- 1177US4405989ASpectral monitoring device for both plasma etching and sputteringANELVA CORP·Filed 1981·Granted Sep 20, 1983·20 cites·7 claims
- 1276US5900699APlasma generator with a shield interposing the antennaNEC CORP·Filed 1997·Granted May 4, 1999·49 cites·10 claims
- 1373US4430151AMethod of monitoring status of a silicon layer by detecting, emission spectra variable during etchingANELVA CORP·Filed 1983·Granted Feb 7, 1984·35 cites·13 claims
- 1468US5936352APlasma processing apparatus for producing plasma at low electron temperaturesNEC CORP·Filed 1996·Granted Aug 10, 1999·20 cites·28 claims
- 1558US4376692ADry etching device comprising a member for bringing a specimen into electrical contact with a grounded electrodeANELVA CORP·Filed 1980·Granted Mar 15, 1983·14 cites·4 claims
- 1657US9120072B2Ammonia detoxification deviceTSUKADA TSUTOMU·Filed 2012·Granted Sep 1, 2015·2 cites·3 claims
- 1754US2009260974A1Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory systemNUMASAWA YOICHIRO·Filed 2009·Application pending·0 cites
- 1853US11504669B2Method for exhaust gas abatement under reduced pressure and apparatus thereforKANKEN TECHNO CO LTD·Filed 2018·Granted Nov 22, 2022·0 cites·4 claims
- 1950US5961776ASurface processing apparatusANELVA CORP·Filed 1997·Granted Oct 5, 1999·15 cites·5 claims
- 2049US4655800AWaste gas exhaust system for vacuum process apparatusANELVA CORP·Filed 1985·Granted Apr 7, 1987·17 cites·8 claims
- 2149US2007086939A1Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory systemNUMASAWA YOICHIRO·Filed 2006·Application pending·0 cites
- 2248US2004035691A1Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory systemFiled 2003·Application pending·0 cites
- 2347US6016765APlasma processing apparatusANELVA CORP·Filed 1997·Granted Jan 25, 2000·7 cites·21 claims
- 2445US2020033000A1Method and apparatus for exhaust gas abatement under reduced pressureKANKEN TECHNO CO LTD·Filed 2018·Application pending·0 cites
- 2543US5087341ADry etching apparatus and methodANELVA CORP·Filed 1990·Granted Feb 11, 1992·18 cites·12 claims
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