Inventor · disambiguated record
Dirk Heinrich Ehm
Also filed as: EHM DIRK · EHM DIRK HEINRICH
40 granted patents·14 pending applications·110 citations·filing 2006–2024
97Inventor score
Files withZEISS CARL SMT GMBH29EHM DIRK HEINRICH9ZEISS CARL SMT AG5ASML NETHERLANDS BV2KRAUS DIETER2
Top patents by PatentIndex Score
54 records- 0190US8382301B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2009·Granted Feb 26, 2013·18 cites·34 claims
- 0287US8585224B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2013·Granted Nov 19, 2013·11 cites·34 claims
- 0386US8953145B2Detection of contaminating substances in an EUV lithography apparatusKRAUS DIETER·Filed 2011·Granted Feb 10, 2015·7 cites·29 claims
- 0485US11022893B2Optical assembly with a protective element and optical arrangement therewithZEISS CARL SMT GMBH·Filed 2018·Granted Jun 1, 2021·2 cites·24 claims
- 0585US10073361B2EUV lithography system and operating methodZEISS CARL SMT GMBH·Filed 2017·Granted Sep 11, 2018·5 cites·15 claims
- 0684US12140877B2Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Nov 12, 2024·1 cites·22 claims
- 0783US9041905B2Optical arrangement, in particular in a projection exposure apparatus for EUV lithographyEHM DIRK HEINRICH·Filed 2012·Granted May 26, 2015·4 cites·28 claims
- 0881US7671347B2Cleaning method, apparatus and cleaning systemASML NETHERLANDS BV·Filed 2006·Granted Mar 2, 2010·6 cites·25 claims
- 0979US8419862B2Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement thereforEHM DIRK HEINRICH·Filed 2010·Granted Apr 16, 2013·4 cites·8 claims
- 1078US11199363B2Method for removing a contamination layer by an atomic layer etching processZEISS CARL SMT GMBH·Filed 2020·Granted Dec 14, 2021·1 cites·23 claims
- 1178US8698999B2Protection module for EUV lithography apparatus, and EUV lithography apparatusEHM DIRK HEINRICH·Filed 2011·Granted Apr 15, 2014·3 cites·30 claims
- 1278US8054446B2EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surfaceZEISS CARL SMT GMBH·Filed 2008·Granted Nov 8, 2011·5 cites·15 claims
- 1377US8279397B2Method for removing contamination on optical surfaces and optical arrangementEHM DIRK HEINRICH·Filed 2009·Granted Oct 2, 2012·5 cites·22 claims
- 1475US9229331B2EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating methodZEISS CARL SMT GMBH·Filed 2014·Granted Jan 5, 2016·3 cites·14 claims
- 1575US9046794B2Cleaning module, EUV lithography device and method for the cleaning thereofHEMBACHER STEFAN·Filed 2010·Granted Jun 2, 2015·3 cites·40 claims
- 1674US9632436B2Optical assembly with suppression of degradationZEISS CARL SMT GMBH·Filed 2014·Granted Apr 25, 2017·2 cites·17 claims
- 1774US8553200B2Optical element with at least one electrically conductive region, and illumination system with the optical elementWOLSCHRIJN BASTIAAN THEODOOR·Filed 2010·Granted Oct 8, 2013·3 cites·40 claims
- 1874US7911598B2Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography deviceZEISS CARL SMT AG·Filed 2009·Granted Mar 22, 2011·3 cites·30 claims
- 1972US8885141B2EUV lithography device and method for processing an optical elementSINGER WOLFGANG·Filed 2011·Granted Nov 11, 2014·2 cites·20 claims
- 2072US8477285B2Particle cleaning of optical elements for microlithographyEHM DIRK HEINRICH·Filed 2010·Granted Jul 2, 2013·3 cites·25 claims
- 2170US12332576B2Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2022·Granted Jun 17, 2025·0 cites·22 claims
- 2270US9996005B2Reflective optical element and optical system for EUV lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Jun 12, 2018·3 cites·17 claims
- 2369US10649340B2Reflective optical element for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted May 12, 2020·1 cites·18 claims
- 2468US12306551B2Projection exposure apparatus having a device for determining the concentration of atomic hydrogenZEISS CARL SMT GMBH·Filed 2022·Granted May 20, 2025·0 cites·19 claims
- 2568US9354529B2Arrangement for use in a projection exposure tool for microlithography having a reflective optical elementEHM DIRK HEINRICH·Filed 2012·Granted May 31, 2016·1 cites·12 claims
- 2666US12287588B2Method for operating an EUV lithography apparatus, and EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Apr 29, 2025·0 cites·21 claims
- 2766US8928855B2Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensorMOORS JOHANNES HUBERTUS JOSEPHINA·Filed 2009·Granted Jan 6, 2015·4 cites·13 claims
- 2866US8546776B2Optical system for EUV lithography with a charged-particle sourceZEISS CARL SMT GMBH·Filed 2012·Granted Oct 1, 2013·1 cites·11 claims
- 2966US2024302756A1Method for depositing a cover layer, euv lithography system and optical elementZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 3065US10061205B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·1 cites·20 claims
- 3165US7959310B2Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical elementZEISS CARL SMT GMBH·Filed 2007·Granted Jun 14, 2011·3 cites·28 claims
- 3265US2024248408A1Multi-mirror arrayZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 3364US2025258436A1Euv collector for use in an euv projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 3463US10690812B2Optical element and optical system for EUV lithography, and method for treating such an optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Jun 23, 2020·1 cites·17 claims
- 3563US9249501B2Surface correction on coated mirrorsEHM DIRK HEINRICH·Filed 2012·Granted Feb 2, 2016·1 cites·16 claims
- 3663US7763870B2Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elementsZEISS CARL SMT AG·Filed 2007·Granted Jul 27, 2010·1 cites·18 claims
- 3763US2024111216A1Process for deposition of an outer layer, reflective optical element for the euv wavelength range and euv lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 3862US8339576B2Projection objective of a microlithographic projection exposure apparatusLOERING ULRICH·Filed 2012·Granted Dec 25, 2012·1 cites·20 claims
- 3960US8980009B2Method for removing a contamination layer from an optical surface and arrangement thereforZEISS CARL SMT GMBH·Filed 2013·Granted Mar 17, 2015·0 cites·12 claims
- 4059US9341756B2Method for correcting the surface form of a mirrorZEISS CARL SMT GMBH·Filed 2013·Granted May 17, 2016·0 cites·11 claims
- 4159US8717531B2Mirror for guiding a radiation bundleWALDIS SEVERIN·Filed 2010·Granted May 6, 2014·1 cites·20 claims
- 4255US2010071720A1Method and system for removing contaminants from a surfaceZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4354US10712677B2Projection exposure system for semiconductor lithography, comprising elements for plasma conditioningZEISS CARL SMT GMBH·Filed 2018·Granted Jul 14, 2020·0 cites·18 claims
- 4449US9880476B2Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jan 30, 2018·0 cites·9 claims
- 4548US2010112494A1Apparatus and method for measuring the outgassing and euv lithography apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4647US2016299268A1Method for correcting the surface form of a mirrorZEISS CARL SMT GMBH·Filed 2016·Application pending·0 cites
- 4746US9298109B2EUV lithography apparatus and method for detecting particles in an EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Mar 29, 2016·0 cites·22 claims
- 4845US2020218160A1Method for characterising at least one optical component of a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2020·Application pending·0 cites
- 4945US2011058147A1Cleaning module and euv lithography device with cleaning moduleZEISS CARL SMT AG·Filed 2010·Application pending·0 cites
- 5042US2008151201A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →