Inventor · disambiguated record
Kazuya Uenishi
Also filed as: UENISHI KAZUYA
52 granted patents·3 pending applications·1,078 citations·filing 1987–2019
98Inventor score
Files withFUJI PHOTO FILM CO LTD38YOKOHAMA RUBBER CO LTD13DAINIPPON INK & CHEMICALS1HENKEL KGAA1SUDO ATSUSHI1
Top patents by PatentIndex Score
55 records- 0195US5360692APositive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agentFUJI PHOTO FILM CO LTD·Filed 1993·Granted Nov 1, 1994·116 cites·9 claims
- 0293US5529881APostive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1995·Granted Jun 25, 1996·108 cites·8 claims
- 0391US5955238AWaterless planographic printing plate and method of plate making using the sameFUJI PHOTO FILM CO LTD·Filed 1997·Granted Sep 21, 1999·87 cites·20 claims
- 0488US5837420APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Nov 17, 1998·69 cites·5 claims
- 0586US5731123APositive image forming compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Mar 24, 1998·88 cites·9 claims
- 0681US5891603APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Apr 6, 1999·27 cites·10 claims
- 0779US6673512B1Negative-working resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Jan 6, 2004·43 cites·41 claims
- 0879US5565300APositive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1991·Granted Oct 15, 1996·34 cites·10 claims
- 0978US6962766B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Nov 8, 2005·17 cites·16 claims
- 1076US11008445B2Aromatic vinyl-diene copolymer, method for producing aromatic vinyl-diene copolymer, and rubber compositionYOKOHAMA RUBBER CO LTD·Filed 2017·Granted May 18, 2021·1 cites·14 claims
- 1176US9228064B2Modified diene based polymerYOKOHAMA RUBBER CO LTD·Filed 2013·Granted Jan 5, 2016·1 cites·8 claims
- 1276US7179578B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Feb 20, 2007·14 cites·11 claims
- 1373US5683856APositive-working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Nov 4, 1997·33 cites·5 claims
- 1473US4871645APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1988·Granted Oct 3, 1989·22 cites·12 claims
- 1572US4863828APositive-working o-quinone diazide photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1988·Granted Sep 5, 1989·21 cites·7 claims
- 1671US5153096APositive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazideFUJI PHOTO FILM CO LTD·Filed 1991·Granted Oct 6, 1992·25 cites·6 claims
- 1770US6265135B1Positive-working electron beam or X-ray resist compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Jul 24, 2001·39 cites·10 claims
- 1870US5290658APositive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredientFUJI PHOTO FILM CO LTD·Filed 1992·Granted Mar 1, 1994·23 cites·3 claims
- 1970US5173389APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1990·Granted Dec 22, 1992·24 cites·13 claims
- 2070US4904706ASoft polyurethane foam from hydroxyl urethane prepolymer and polyester ether polyolDAINIPPON INK & CHEMICALS·Filed 1988·Granted Feb 27, 1990·23 cites·13 claims
- 2168US7179579B2Radiation-sensitive compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Feb 20, 2007·9 cites·11 claims
- 2268US6511783B1Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jan 28, 2003·24 cites·7 claims
- 2365US10590221B2Modified diene based polymerYOKOHAMA RUBBER CO LTD·Filed 2015·Granted Mar 17, 2020·0 cites·4 claims
- 2465US6013411APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Jan 11, 2000·32 cites·8 claims
- 2565US4894311APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1987·Granted Jan 16, 1990·16 cites·8 claims
- 2664US6897004B2Intermediate layer material composition for multilayer resist process and pattern formation process using the sameFUJI PHOTO FILM CO LTD·Filed 2003·Granted May 24, 2005·18 cites·31 claims
- 2764US5981140APositive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Nov 9, 1999·31 cites·7 claims
- 2863US7078687B2Thin film analyzing methodFUJI PHOTO FILM CO LTD·Filed 2004·Granted Jul 18, 2006·5 cites·26 claims
- 2962US11608425B2Rubber composition for tire, and pneumatic tireYOKOHAMA RUBBER CO LTD·Filed 2018·Granted Mar 21, 2023·0 cites·15 claims
- 3062US11505623B2Modified butadiene polymer and rubber compositionYOKOHAMA RUBBER CO LTD·Filed 2018·Granted Nov 22, 2022·0 cites·12 claims
- 3161US5340697ANegative type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·22 cites·4 claims
- 3260US9458274B2Method of manufacturing terminal-modified polymerYOKOHAMA RUBBER CO LTD·Filed 2014·Granted Oct 4, 2016·0 cites·6 claims
- 3360US9458265B2Method of manufacturing terminal-modified polymerYOKOHAMA RUBBER CO LTD·Filed 2014·Granted Oct 4, 2016·0 cites·6 claims
- 3459US11518835B2Conveyor belt rubber composition, method for producing conveyor belt rubber composition, conveyor belt, and belt conveyorYOKOHAMA RUBBER CO LTD·Filed 2018·Granted Dec 6, 2022·0 cites·20 claims
- 3559US6884571B2Intermediate layer composition for three-layer resist process and pattern formation method using the sameFUJI PHOTO FILM CO LTD·Filed 2003·Granted Apr 26, 2005·5 cites·9 claims
- 3659US6489080B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Dec 3, 2002·19 cites·12 claims
- 3758US5089373APositive photoresist composition utilizing O-quinonediazide and novolak resinFUJI PHOTO FILM CO LTD·Filed 1989·Granted Feb 18, 1992·13 cites·9 claims
- 3856US6010820APositive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Jan 4, 2000·14 cites·6 claims
- 3955US12110354B2Production method for aromatic vinyl-diene copolymer and production method for rubber compositionYOKOHAMA RUBBER CO LTD·Filed 2019·Granted Oct 8, 2024·0 cites·8 claims
- 4055US7432381B21,3-oxathiolane-2-thione compoundsHENKEL KGAA·Filed 2006·Granted Oct 7, 2008·0 cites·4 claims
- 4155US5248582APositive-type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1992·Granted Sep 28, 1993·12 cites·7 claims
- 4252US12060449B2Polymer, method of producing polymer, and rubber compositionYOKOHAMA RUBBER CO LTD·Filed 2018·Granted Aug 13, 2024·0 cites·2 claims
- 4350US6200729B1Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Mar 13, 2001·10 cites·6 claims
- 4449US11001654B2Diene polymer, method for producing diene polymer, and rubber compositionYOKOHAMA RUBBER CO LTD·Filed 2016·Granted May 11, 2021·0 cites·22 claims
- 4549US5380618AMicropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solventFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jan 10, 1995·10 cites·7 claims
- 4648US2008003369A1Low Shrinking Amine-Curing Epoxy CompositionsUENISHI KAZUYA·Filed 2007·Application pending·0 cites
- 4746US8158719B2Benzoxazine-formulations with reduced outgassing behaviourSUDO ATSUSHI·Filed 2009·Granted Apr 17, 2012·0 cites·19 claims
- 4845US11498993B2Conveyor belt rubber composition, method for producing conveyor belt rubber composition, conveyor belt, and belt conveyorYOKOHAMA RUBBER CO LTD·Filed 2018·Granted Nov 15, 2022·0 cites·20 claims
- 4945US5324619APositive quinone diazide photoresist composition containing select polyhydroxy additiveFUJI PHOTO FILM CO LTD·Filed 1992·Granted Jun 28, 1994·7 cites·6 claims
- 5044US6887645B2Negative resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted May 3, 2005·5 cites·20 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →