Inventor · disambiguated record
Santiago Del Puerto
Also filed as: DEL PUERTO SANTIAGO · DEL PUERTO SANTIAGO E
31 granted patents·3 pending applications·834 citations·filing 1990–2022
97Inventor score
Top patents by PatentIndex Score
34 records- 0197US7025498B2System and method of measuring thermal expansionASML HOLDING NV·Filed 2003·Granted Apr 11, 2006·156 cites·14 claims
- 0295US6826451B2Lithography tool having a vacuum reticle library coupled to a vacuum chamberASML HOLDING NV·Filed 2002·Granted Nov 30, 2004·67 cites·48 claims
- 0394US6906783B2System for using a two part cover for protecting a reticleASML HOLDING NV·Filed 2003·Granted Jun 14, 2005·79 cites·22 claims
- 0492US5001423ADry interface thermal chuck temperature control system for semiconductor wafer testingIBM·Filed 1990·Granted Mar 19, 1991·210 cites·23 claims
- 0589US7249925B2System and method for reticle protection and transportASML HOLDING NV·Filed 2005·Granted Jul 31, 2007·14 cites·20 claims
- 0689US6778258B2Wafer handling system for use in lithography patterningASML HOLDING NV·Filed 2001·Granted Aug 17, 2004·35 cites·28 claims
- 0788US10001713B2Lithographic apparatus and methodASML HOLDING NV·Filed 2014·Granted Jun 19, 2018·7 cites·15 claims
- 0888US7163301B2Method and apparatus for managing actinic intensity transients in a lithography mirrorASML HOLDING NV·Filed 2005·Granted Jan 16, 2007·11 cites·11 claims
- 0987US7830497B2System and method for using a two part cover and a box for protecting a reticleASML HOLDING NV·Filed 2007·Granted Nov 9, 2010·10 cites·12 claims
- 1086US7304720B2System for using a two part cover for protecting a reticleASML HOLDING NV·Filed 2003·Granted Dec 4, 2007·28 cites·34 claims
- 1185US8446570B2System and method for using a two part cover and a box for protecting a reticleDEL PUERTO SANTIAGO·Filed 2010·Granted May 21, 2013·8 cites·7 claims
- 1283US7290931B2Vacuum pre-loaded pneumatic bearing with onboard vacuum generatorASML HOLDING NV·Filed 2005·Granted Nov 6, 2007·12 cites·19 claims
- 1383US6369874B1Photoresist outgassing mitigation system method and apparatus for in-vacuum lithographySILICON VALLEY GROUP·Filed 2000·Granted Apr 9, 2002·21 cites·25 claims
- 1482US6991416B2System and method for reticle protection and transportASML HOLDING NV·Filed 2002·Granted Jan 31, 2006·23 cites·22 claims
- 1581US6994444B2Method and apparatus for managing actinic intensity transients in a lithography mirrorASML HOLDING NV·Filed 2002·Granted Feb 7, 2006·21 cites·73 claims
- 1679US7697115B2Resonant scanning mirrorASML HOLDING NV·Filed 2006·Granted Apr 13, 2010·5 cites·21 claims
- 1771US5186238ALiquid film interface cooling chuck for semiconductor wafer processingIBM·Filed 1991·Granted Feb 16, 1993·48 cites·17 claims
- 1870US7894140B2Compensation techniques for fluid and magnetic bearingsASML HOLDING NV·Filed 2007·Granted Feb 22, 2011·2 cites·30 claims
- 1970US7057711B2Lithography tool having a vacuum reticle library coupled to a vacuum chamberASML HOLDING NV·Filed 2004·Granted Jun 6, 2006·12 cites·13 claims
- 2067US7009359B2Foam core chuck for the scanning stage of a lithography systemASML HOLDING NV·Filed 2003·Granted Mar 7, 2006·8 cites·24 claims
- 2166US7105836B2Method and apparatus for cooling a reticle during lithographic exposureASML HOLDING NV·Filed 2002·Granted Sep 12, 2006·10 cites·8 claims
- 2265US9377700B2Determining position and curvature information directly from a surface of a patterning deviceASML HOLDING NV·Filed 2013·Granted Jun 28, 2016·1 cites·21 claims
- 2364US10267360B2Pneumatic bearing with bonded polymer film wear surface and production method thereofPARIZA DRAGOS·Filed 2011·Granted Apr 23, 2019·1 cites·6 claims
- 2462US6927842B2Wafer handling method for use in lithography patterningASML HOLDING NV·Filed 2004·Granted Aug 9, 2005·5 cites·14 claims
- 2561US8625070B2Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing methodFARNSWORTH WINDY LYNN·Filed 2008·Granted Jan 7, 2014·3 cites·13 claims
- 2661US5088006ALiquid film interface cooling system for semiconductor wafer processingIBM·Filed 1991·Granted Feb 11, 1992·32 cites·12 claims
- 2759US6947125B2Bearing arrangement for reaction mass in a controlled environmentASML HOLDING NV·Filed 2003·Granted Sep 20, 2005·4 cites·41 claims
- 2858US8553207B2Optically compensated unidirectional reticle benderDEL PUERTO SANTIAGO E·Filed 2009·Granted Oct 8, 2013·1 cites·24 claims
- 2953US2024419088A1Method and apparatus for lithographic imagingASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3053US2013010277A1System and Method for Using a Two Part Cover and a Box for Protecting a ReticleASML HOLDING NV·Filed 2012·Application pending·0 cites
- 3152US7298459B2Wafer handling method for use in lithography patterningASML HOLDING NV·Filed 2005·Granted Nov 20, 2007·0 cites·11 claims
- 3252US7009685B2Bearing arrangement for reaction mass in a controlled environmentASML HOLDING NV·Filed 2005·Granted Mar 7, 2006·0 cites·23 claims
- 3351US2008111977A1Compensation techniques for fluid and magnetic bearingsASML HOLDING NV·Filed 2006·Application pending·0 cites
- 3445US9229341B2Reticle support that reduces reticle slippageDEL PUERTO SANTIAGO E·Filed 2009·Granted Jan 5, 2016·0 cites·19 claims
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