Inventor · disambiguated record
Bastiaan Theodoor Wolschrijn
Also filed as: WOLSCHRIJN BASTIAAN T · WOLSCHRIJN BASTIAAN THEODOOR
19 granted patents·3 pending applications·198 citations·filing 2004–2013
94Inventor score
Files withASML NETHERLANDS BV13ZEISS CARL SMT GMBH4EHM DIRK HEINRICH2MOORS JOHANNES HUBERTUS JOSEPHINA1WOLSCHRIJN BASTIAAN THEODOOR1
Top patents by PatentIndex Score
22 records- 0198US7462850B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·60 cites·13 claims
- 0297US7405417B2Lithographic apparatus having a monitoring device for detecting contaminationASML NETHERLANDS BV·Filed 2005·Granted Jul 29, 2008·62 cites·36 claims
- 0390US8382301B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2009·Granted Feb 26, 2013·18 cites·34 claims
- 0488US7812330B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2008·Granted Oct 12, 2010·8 cites·10 claims
- 0587US8585224B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2013·Granted Nov 19, 2013·11 cites·34 claims
- 0681US7671347B2Cleaning method, apparatus and cleaning systemASML NETHERLANDS BV·Filed 2006·Granted Mar 2, 2010·6 cites·25 claims
- 0779US8419862B2Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement thereforEHM DIRK HEINRICH·Filed 2010·Granted Apr 16, 2013·4 cites·8 claims
- 0877US8279397B2Method for removing contamination on optical surfaces and optical arrangementEHM DIRK HEINRICH·Filed 2009·Granted Oct 2, 2012·5 cites·22 claims
- 0974US8553200B2Optical element with at least one electrically conductive region, and illumination system with the optical elementWOLSCHRIJN BASTIAAN THEODOOR·Filed 2010·Granted Oct 8, 2013·3 cites·40 claims
- 1074US7928412B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Granted Apr 19, 2011·3 cites·7 claims
- 1168US7684012B2Lithographic device, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·2 cites·21 claims
- 1268US7629594B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 8, 2009·2 cites·12 claims
- 1367US7279690B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 9, 2007·2 cites·37 claims
- 1466US8928855B2Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensorMOORS JOHANNES HUBERTUS JOSEPHINA·Filed 2009·Granted Jan 6, 2015·4 cites·13 claims
- 1566US7491951B2Lithographic apparatus, system and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 17, 2009·2 cites·47 claims
- 1665US7959310B2Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical elementZEISS CARL SMT GMBH·Filed 2007·Granted Jun 14, 2011·3 cites·28 claims
- 1765US7935218B2Optical apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted May 3, 2011·2 cites·16 claims
- 1863US7763870B2Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elementsZEISS CARL SMT AG·Filed 2007·Granted Jul 27, 2010·1 cites·18 claims
- 1960US8980009B2Method for removing a contamination layer from an optical surface and arrangement thereforZEISS CARL SMT GMBH·Filed 2013·Granted Mar 17, 2015·0 cites·12 claims
- 2050US2004227102A1Method and device for measuring contamination of a surface of a component of a lithographic apparatusASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 2142US2008151201A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 2241US2007085984A1Lithographic projection apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
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