Inventor · disambiguated record
Lucas Henricus Johannes Stevens
Also filed as: STEVENS LUCAS HENRICUS JOHANNE · STEVENS LUCAS HENRICUS JOHANNES · STEVENS LUCAS HENRICUS JOHNANNES
22 granted patents·4 pending applications·148 citations·filing 2003–2020
94Inventor score
Files withASML NETHERLANDS BV18BANINE VADIM YEVGENYEVICH2DE JAGER PIETER WILLEM HERMAN2BRUINSMA ANASTASIUS JACOBUS ANICETUS1DONDERS SJOERD NICOLAAS LAMBERTUS1
Top patents by PatentIndex Score
26 records- 0197US7405417B2Lithographic apparatus having a monitoring device for detecting contaminationASML NETHERLANDS BV·Filed 2005·Granted Jul 29, 2008·62 cites·36 claims
- 0294US9482960B2Pellicle for reticle and multilayer mirrorASML NETHERLANDS BV·Filed 2014·Granted Nov 1, 2016·14 cites·13 claims
- 0392US9395630B2Lithographic apparatus and methodYAKUNIN ANDREI MIKHAILOVICH·Filed 2011·Granted Jul 19, 2016·13 cites·16 claims
- 0490US9989844B2Pellicle for reticle and multilayer mirrorASML NETHERLANDS BV·Filed 2016·Granted Jun 5, 2018·5 cites·13 claims
- 0587US10481510B2Graphene spectral purity filterASML NETHERLANDS BV·Filed 2018·Granted Nov 19, 2019·3 cites·27 claims
- 0682US8217347B2System and method for detecting at least one contamination species in a lithographic apparatusBANINE VADIM YEVGENYEVICH·Filed 2011·Granted Jul 10, 2012·3 cites·11 claims
- 0780US7897110B2System and method for detecting at least one contamination species in a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Mar 1, 2011·5 cites·14 claims
- 0876US7167232B2Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatusASML NETHERLANDS BV·Filed 2003·Granted Jan 23, 2007·15 cites·19 claims
- 0974US7928412B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Granted Apr 19, 2011·3 cites·7 claims
- 1069US9645502B2Lithographic apparatus, programmable patterning device and lithographic methodDE JAGER PIETER WILLEM HERMAN·Filed 2012·Granted May 9, 2017·1 cites·21 claims
- 1169US8149379B2Lithographic apparatus and device manufacturing methodDONDERS SJOERD NICOLAAS LAMBERTUS·Filed 2008·Granted Apr 3, 2012·2 cites·19 claims
- 1268US11269259B2Lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Mar 8, 2022·0 cites·19 claims
- 1368US7629594B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 8, 2009·2 cites·12 claims
- 1468US7095479B2Lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Aug 22, 2006·9 cites·12 claims
- 1564US10871715B2Lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Dec 22, 2020·0 cites·20 claims
- 1664US9304077B2Inspection apparatus and methodSTEVENS LUCAS HENRICUS JOHANNES·Filed 2011·Granted Apr 5, 2016·1 cites·16 claims
- 1763US7528395B2Radiation source, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted May 5, 2009·10 cites·42 claims
- 1852US8445873B2System and method for detecting at least one contamination species in a lithographic apparatusBANINE VADIM YEVGENYEVICH·Filed 2012·Granted May 21, 2013·0 cites·20 claims
- 1951US2014160452A1Lithographic apparatus, programmable patterning device and lithographic methodDE JAGER PIETER WILLEM HERMAN·Filed 2012·Application pending·0 cites
- 2050US2004227102A1Method and device for measuring contamination of a surface of a component of a lithographic apparatusASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 2149US12242204B2Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrateASML NETHERLANDS BV·Filed 2020·Granted Mar 4, 2025·0 cites·20 claims
- 2248US2009225289A1Lithographic apparatus and methodsASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 2347US2011037960A1Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning deviceASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 2446US11086238B2System, a lithographic apparatus, and a method for reducing oxidation or removing oxide on a substrate supportASML NETHERLANDS BV·Filed 2018·Granted Aug 10, 2021·0 cites·21 claims
- 2539US8547551B2Lithographic apparatus and contamination detection methodBRUINSMA ANASTASIUS JACOBUS ANICETUS·Filed 2009·Granted Oct 1, 2013·0 cites·15 claims
- 2637US7800079B2Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Sep 21, 2010·0 cites·25 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →