Inventor · disambiguated record
Pil-Kwon Jun
Also filed as: JUN PIL-KWON
29 granted patents·12 pending applications·210 citations·filing 1996–2014
96Inventor score
Top patents by PatentIndex Score
41 records- 0191US7951653B1Methods of manufacturing a semiconductor device using compositions for etching copperSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted May 31, 2011·15 cites·13 claims
- 0280US6883248B2Apparatus for drying a substrate using an isopropyl alcohol vaporSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 26, 2005·26 cites·36 claims
- 0378US6432622B1Photoresist stripper composition and method for stripping photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 13, 2002·21 cites·12 claims
- 0477US7100306B2Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Sep 5, 2006·4 cites·10 claims
- 0577US6959823B2Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 1, 2005·15 cites·5 claims
- 0674US7985297B2Method of cleaning a quartz partSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Jul 26, 2011·3 cites·19 claims
- 0772US6458518B1Photoresist stripper composition and method for stripping photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Oct 1, 2002·15 cites·12 claims
- 0869US7311857B2Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Dec 25, 2007·13 cites·3 claims
- 0968US7811836B2Methods of manufacturing reference sample substrates for analyzing metal contamination levelsSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 12, 2010·2 cites·19 claims
- 1068US6655042B2System and method for drying semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 2, 2003·12 cites·35 claims
- 1166US7678751B2Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 16, 2010·1 cites·39 claims
- 1265US7879736B2Composition for etching silicon oxide and method of forming a contact hole using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 1, 2011·2 cites·12 claims
- 1363US7687448B2Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Mar 30, 2010·0 cites·14 claims
- 1462US9528949B2Methods of detecting inhomogeneity of a layer and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Dec 27, 2016·1 cites·17 claims
- 1561US8455359B2Semiconductor devices and methods of manufacturing the sameKIM KOOK-JOO·Filed 2011·Granted Jun 4, 2013·3 cites·20 claims
- 1660US5866305AThinner composition for washing a photoresist in a process for preparing semiconductorsSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Feb 2, 1999·28 cites·9 claims
- 1756US7608540B2Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 27, 2009·0 cites·18 claims
- 1855US7223721B2Resist and etching by-product removing composition and resist removing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 29, 2007·1 cites·18 claims
- 1955US7183192B2Composition for removing photoresist and method of forming a bump electrode in a semiconductor device using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 27, 2007·7 cites·14 claims
- 2055US6905570B2Apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 14, 2005·5 cites·19 claims
- 2155US6713440B2Resist and etching by-product removing composition and resist removing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 30, 2004·3 cites·21 claims
- 2251US2006260149A1Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2349US6100203AMethods of employing aqueous cleaning compositions in manufacturing microelectronic devicesSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Aug 8, 2000·19 cites·11 claims
- 2448US7037852B2Composition for stripping photoresist and method of preparing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 2, 2006·2 cites·26 claims
- 2545US6777379B2Cleaning solution and method of cleaning anti-reflective coating composition using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Aug 17, 2004·0 cites·8 claims
- 2644US2012183696A1Plating method using analysis photoresist residue in plating solutionPARK JUNG-DAE·Filed 2011·Application pending·0 cites
- 2743US2006160239A1Method of measuring a level of contamination in a chemical solution and systems thereofLEE SUNG-JAE·Filed 2005·Application pending·0 cites
- 2843US2004226186A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 2941US9638609B2Apparatus for providing sample gas and related methodsSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 2, 2017·0 cites·3 claims
- 3041US2006237033A1Cleaning apparatus and methodSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3141US2004010932A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 3240US2011073801A1Composition for etching silicon oxide and method of forming a contact hole using the sameHWANG DONG-WON·Filed 2010·Application pending·0 cites
- 3339US6207358B1Method of stripping a photoresist from a semiconductor substrate using dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxideSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Mar 27, 2001·8 cites·11 claims
- 3435US6337174B1Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxideSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Jan 8, 2002·4 cites·23 claims
- 3535US2003085198A1Method of detecting etching process end point in semiconductor fabricating equipment and detector thereforYI HUN JUNG·Filed 2002·Application pending·0 cites
- 3635US2005227363A1Methods of monitoring rinsing solutions and related systems and reagentsHWANG DONG-WON·Filed 2004·Application pending·0 cites
- 3734US2006154484A1Method of removing a low-k layer and method of recycling a wafer using the sameHWANG DONG-WON·Filed 2006·Application pending·0 cites
- 3833US2007000523A1Cleaning composition and related methodsKIM SE-YEON·Filed 2006·Application pending·0 cites
- 3933US2004060579A1Cleaning solution and method for cleaning ceramic parts using the sameFiled 2003·Application pending·0 cites
- 4030US7208454B2Cleaning solution for removing anti-reflective coating compositionSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 24, 2007·0 cites·5 claims
- 4128US10048173B2Apparatus for analyte sampling, method of analyte sampling and analyte sampling analysis systemNVISANA CO LTD·Filed 2014·Granted Aug 14, 2018·0 cites·6 claims
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