Inventor · disambiguated record
Yasuhisa Inao
Also filed as: INAO YASUHISA
34 granted patents·15 pending applications·326 citations·filing 2001–2020
97Inventor score
Top patents by PatentIndex Score
49 records- 0193US6628392B2Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereofCANON KK·Filed 2001·Granted Sep 30, 2003·54 cites·35 claims
- 0291US7733491B2Sensor device and testing method utilizing localized plasmon resonanceCANON KK·Filed 2008·Granted Jun 8, 2010·14 cites·6 claims
- 0391US7399445B2Chemical sensorCANON KK·Filed 2003·Granted Jul 15, 2008·39 cites·16 claims
- 0491US7144685B2Method for making a pattern using near-field light exposure through a photomaskCANON KK·Filed 2006·Granted Dec 5, 2006·11 cites·2 claims
- 0590US6720115B2Exposure method and exposure apparatus using near-field light and exposure maskCANON KK·Filed 2001·Granted Apr 13, 2004·35 cites·17 claims
- 0689US8749903B2Optical filterYAMADA TOMOHIRO·Filed 2011·Granted Jun 10, 2014·10 cites·21 claims
- 0786US6849391B2Photoresist, photolithography method using the same, and method for producing photoresistCANON KK·Filed 2002·Granted Feb 1, 2005·20 cites·2 claims
- 0885US8094394B2Optical filterYAMADA TOMOHIRO·Filed 2008·Granted Jan 10, 2012·13 cites·16 claims
- 0984US7863061B2Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser arrayCANON KK·Filed 2009·Granted Jan 4, 2011·6 cites·15 claims
- 1083US7050144B2Photomask for near-field exposure and exposure apparatus including the photomask for making a patternCANON KK·Filed 2003·Granted May 23, 2006·18 cites·10 claims
- 1181US8068529B2Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser arrayIKUTA MITSUHIRO·Filed 2010·Granted Nov 29, 2011·4 cites·10 claims
- 1281US6785445B2Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probeCANON KK·Filed 2002·Granted Aug 31, 2004·31 cites·11 claims
- 1380US7001696B2Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing deviceCANON KK·Filed 2003·Granted Feb 21, 2006·17 cites·20 claims
- 1479US7547503B2Photosensitive silane coupling agent, method of forming pattern, and method of fabricating deviceCANON KK·Filed 2007·Granted Jun 16, 2009·5 cites·14 claims
- 1576US7740992B2Exposure apparatus, exposure method, and exposure maskCANON KK·Filed 2005·Granted Jun 22, 2010·4 cites·1 claims
- 1676US7262851B2Method and apparatus for detecting relative positional deviation between two objectsCANON KK·Filed 2005·Granted Aug 28, 2007·4 cites·10 claims
- 1775US10660514B2Image processing apparatus and image processing method with generating motion contrast image using items of three-dimensional tomographic dataCANON KK·Filed 2018·Granted May 26, 2020·2 cites·51 claims
- 1871US7144682B2Near-field exposure methodCANON KK·Filed 2003·Granted Dec 5, 2006·9 cites·1 claims
- 1971US6721040B2Exposure method and apparatus using near field lightCANON KK·Filed 2002·Granted Apr 13, 2004·10 cites·34 claims
- 2069US7871744B2Near-field exposure apparatus and near-field exposure methodCANON KK·Filed 2007·Granted Jan 18, 2011·2 cites·10 claims
- 2168US7777864B2Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the sameCANON KK·Filed 2005·Granted Aug 17, 2010·4 cites·10 claims
- 2268US7732121B2Near-field exposure methodCANON KK·Filed 2007·Granted Jun 8, 2010·2 cites·6 claims
- 2366US10335026B2Image processing apparatus that generates a tomographic image using an estimation value of pixel values, and related optical coherence tomography apparatus, image processing method, and computer-readable storage mediumCANON KK·Filed 2018·Granted Jul 2, 2019·1 cites·28 claims
- 2464US8377727B2Surface-emitting laser and surface-emitting laser array, method of manufacturing a surface-emitting laser and method of manufacturing a surface-emitting laser array, and optical apparatus including a surface-emitting laser arrayCANON KK·Filed 2011·Granted Feb 19, 2013·1 cites·14 claims
- 2562US7691540B2Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing methodCANON KK·Filed 2004·Granted Apr 6, 2010·6 cites·2 claims
- 2655US7553608B2Resist pattern forming method including uniform intensity near field exposureCANON KK·Filed 2008·Granted Jun 30, 2009·0 cites·4 claims
- 2754US7303859B2Photoresist, photolithography method using the same, and method for producing photoresistCANON KK·Filed 2006·Granted Dec 4, 2007·0 cites·3 claims
- 2854US2014227007A1Surface-emitting laser and image forming apparatus using the sameCANON KK·Filed 2014·Application pending·0 cites
- 2953US9059566B2Surface emitting laserCANON KK·Filed 2013·Granted Jun 16, 2015·0 cites·20 claims
- 3053US7317197B2Method of detecting tightly adhering state, tight adhesion control method and method of and apparatus for near field exposureCANON KK·Filed 2004·Granted Jan 8, 2008·3 cites·9 claims
- 3152US2007065734A1Exposure method, exposure mask, and exposure apparatusCANON KK·Filed 2006·Application pending·0 cites
- 3252US2013044780A1Surface-emitting laser and surface-emitting laser array, method of manufacturing a surface-emitting laser and method of manufacturing a surface-emitting laser array, and optical apparatus including a surface-emitting laser arrayCANON KK·Filed 2012·Application pending·0 cites
- 3349US11074694B2Image processing apparatus, optical coherence tomography apparatus, image processing method, and computer-readable mediumCANON KK·Filed 2018·Granted Jul 27, 2021·0 cites·24 claims
- 3449US2011293331A1Surface-emitting laser and image forming apparatus using the sameINAO YASUHISA·Filed 2011·Application pending·0 cites
- 3548US7704672B2Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating deviceCANON KK·Filed 2007·Granted Apr 27, 2010·0 cites·7 claims
- 3648US7374844B2Photomask for uniform intensity exposure to an optical near-fieldCANON KK·Filed 2004·Granted May 20, 2008·1 cites·6 claims
- 3746US2012327422A1Semiconductor optical integrated device and optical coherence tomographic imaging apparatus provided with the semiconductor optical integrated deviceINAO YASUHISA·Filed 2012·Application pending·0 cites
- 3845US2005053859A1Photoresist, photolithography method using the same, and method for producing photoresistCANON KK·Filed 2004·Application pending·0 cites
- 3945US2008107998A1Near-field exposure method and device manufacturing method using the sameCANON KK·Filed 2007·Application pending·0 cites
- 4044US2006044500A1Organic thin film, method of producing the same, and field effect transistor using the sameCANON KK·Filed 2005·Application pending·0 cites
- 4144US2020281462A1Ophthalmic imaging apparatus, control method for ophthalmic imaging apparatus, and computer-readable mediumCANON KK·Filed 2020·Application pending·0 cites
- 4244US2016164254A1Surface emitting laser and optical coherence tomography apparatusCANON KK·Filed 2014·Application pending·0 cites
- 4343US10349829B2Ophthalmic imaging apparatusCANON KK·Filed 2017·Granted Jul 16, 2019·0 cites·29 claims
- 4442US2014055790A1Variable wavelength surface emitting laserCANON KK·Filed 2013·Application pending·0 cites
- 4541US2006003236A1Photomask and near-field exposure methodCANON KK·Filed 2005·Application pending·0 cites
- 4640US2005064301A1Mask manufacturing methodCANON KK·Filed 2004·Application pending·0 cites
- 4739US10537242B2Imaging apparatusCANON KK·Filed 2016·Granted Jan 21, 2020·0 cites·32 claims
- 4839US2005057752A1Method of detecting attracting force between substrates, and near-field exposure method and apparatusCANON KK·Filed 2004·Application pending·0 cites
- 4938US2004137338A1Mask, exposure apparatus, and exposure methodCANON KK·Filed 2003·Application pending·0 cites
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