Inventor

NAKATANI ALAN

US2 patents

Patents

2 patents

US8257545B2Sep 4, 2012

Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith

LOYACK ADAM38 citations86

US8697217B2Apr 15, 2014

Creep-resistant polishing pad window

LOYACK ADAM0 citations35