Inventor · disambiguated record
Ekmini Anuja De Silva
Also filed as: DE SILVA EKMINI A · DE SILVA EKMINI ANUJA
142 granted patents·9 pending applications·190 citations·filing 2006–2023
99Inventor score
Top patents by PatentIndex Score
151 records- 0197US11923246B2Via CD controllable top via structureIBM·Filed 2021·Granted Mar 5, 2024·4 cites·10 claims
- 0297US10304744B1Inverse tone direct print EUV lithography enabled by selective material depositionIBM·Filed 2018·Granted May 28, 2019·23 cites·14 claims
- 0396US10490447B1Airgap formation in BEOL interconnect structure using sidewall image transferIBM·Filed 2018·Granted Nov 26, 2019·11 cites·13 claims
- 0495US11923311B2Forming self-aligned multi-metal interconnectsIBM·Filed 2022·Granted Mar 5, 2024·2 cites·18 claims
- 0595US10276452B1Low undercut N-P work function metal patterning in nanosheet replacement metal gate processIBM·Filed 2018·Granted Apr 30, 2019·13 cites·14 claims
- 0695US10176997B1Direct gate patterning for vertical transport field effect transistorIBM·Filed 2017·Granted Jan 8, 2019·12 cites·13 claims
- 0793US11810828B2Transistor boundary protection using reversible crosslinking reflowIBM·Filed 2021·Granted Nov 7, 2023·2 cites·19 claims
- 0893US11621326B2Vertical field effect transistor with crosslink fin arrangementIBM·Filed 2020·Granted Apr 4, 2023·2 cites·6 claims
- 0993US10879107B2Method of forming barrier free contact for metal interconnectsIBM·Filed 2018·Granted Dec 29, 2020·14 cites·20 claims
- 1092US10347486B1Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2017·Granted Jul 9, 2019·5 cites·20 claims
- 1190US10622482B2Gate cut using selective deposition to prevent oxide lossIBM·Filed 2019·Granted Apr 14, 2020·4 cites·16 claims
- 1290US10170582B1Uniform bottom spacer for vertical field effect transistorIBM·Filed 2017·Granted Jan 1, 2019·6 cites·17 claims
- 1389US11251182B2Staggered stacked vertical crystalline semiconducting channelsIBM·Filed 2020·Granted Feb 15, 2022·2 cites·25 claims
- 1489US10790372B2Direct gate metal cut using selective deposition to protect the gate end line from metal shortsIBM·Filed 2019·Granted Sep 29, 2020·5 cites·17 claims
- 1589US10734523B2Nanosheet substrate to source/drain isolationIBM·Filed 2018·Granted Aug 4, 2020·6 cites·20 claims
- 1688US10727317B2Bottom contact formation for vertical transistor devicesIBM·Filed 2018·Granted Jul 28, 2020·4 cites·14 claims
- 1787US10374034B1Undercut control in isotropic wet etch processesIBM·Filed 2018·Granted Aug 6, 2019·5 cites·20 claims
- 1887US10254652B2Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterningIBM·Filed 2018·Granted Apr 9, 2019·3 cites·20 claims
- 1986US10998191B2Graded hardmask interlayer for enhanced extreme ultraviolet performanceIBM·Filed 2018·Granted May 4, 2021·3 cites·16 claims
- 2086US10347540B1Gate cut using selective deposition to prevent oxide lossIBM·Filed 2017·Granted Jul 9, 2019·3 cites·20 claims
- 2185US11037786B2Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2019·Granted Jun 15, 2021·2 cites·16 claims
- 2285US10903111B2Semiconductor device with linerless contactsIBM·Filed 2019·Granted Jan 26, 2021·4 cites·11 claims
- 2385US10388510B2Wet strippable OPL using reversible UV crosslinking and de-crosslinkingIBM·Filed 2018·Granted Aug 20, 2019·3 cites·18 claims
- 2485US10082736B2Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterningIBM·Filed 2017·Granted Sep 25, 2018·3 cites·20 claims
- 2584US11508823B2Low capacitance low RC wrap-around-contactIBM·Filed 2020·Granted Nov 22, 2022·1 cites·20 claims
- 2684US10545409B1Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delayIBM·Filed 2019·Granted Jan 28, 2020·3 cites·17 claims
- 2784US10395925B2Patterning material film stack comprising hard mask layer having high metal content interface to resist layerIBM·Filed 2017·Granted Aug 27, 2019·4 cites·20 claims
- 2883US9941142B1Tunable TiOxNy hardmask for multilayer patterningIBM·Filed 2017·Granted Apr 10, 2018·3 cites·14 claims
- 2981US11239077B2Litho-etch-litho-etch with self-aligned blocksIBM·Filed 2019·Granted Feb 1, 2022·2 cites·20 claims
- 3081US10782613B2Polymerizable self-assembled monolayers for use in atomic layer depositionIBM·Filed 2018·Granted Sep 22, 2020·3 cites·19 claims
- 3181US10629495B2Low undercut N-P work function metal patterning in nanosheet replacement metal gate processIBM·Filed 2019·Granted Apr 21, 2020·2 cites·20 claims
- 3280US11307496B2Metal brush layer for EUV patterningIBM·Filed 2019·Granted Apr 19, 2022·2 cites·20 claims
- 3380US10678135B2Surface treatment of titanium containing hardmasksIBM·Filed 2017·Granted Jun 9, 2020·2 cites·17 claims
- 3479US11355442B2Forming self-aligned multi-metal interconnectsIBM·Filed 2019·Granted Jun 7, 2022·2 cites·7 claims
- 3578US11227892B2MRAM integration with BEOL interconnect including top viaIBM·Filed 2019·Granted Jan 18, 2022·2 cites·16 claims
- 3678US10579764B2Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networksIBM·Filed 2018·Granted Mar 3, 2020·3 cites·20 claims
- 3777US12363913B2Fabrication of embedded memory devices utilizing a self assembled monolayerIBM·Filed 2023·Granted Jul 15, 2025·0 cites·8 claims
- 3877US10831102B2Photoactive polymer brush materials and EUV patterning using the sameIBM·Filed 2018·Granted Nov 10, 2020·1 cites·10 claims
- 3977US10658521B2Enabling residue free gap fill between nanosheetsIBM·Filed 2018·Granted May 19, 2020·1 cites·14 claims
- 4077US9799534B1Application of titanium-oxide as a patterning hardmaskIBM·Filed 2017·Granted Oct 24, 2017·2 cites·20 claims
- 4176US12002856B2Vertical field effect transistor with crosslink fin arrangementIBM·Filed 2023·Granted Jun 4, 2024·0 cites·25 claims
- 4276US11131919B2Extreme ultraviolet (EUV) mask stack processingIBM·Filed 2018·Granted Sep 28, 2021·1 cites·15 claims
- 4376US10886169B2Airgap formation in BEOL interconnect structure using sidewall image transferIBM·Filed 2019·Granted Jan 5, 2021·1 cites·12 claims
- 4475US12019376B2Polymer brush adhesion promoter with UV cleavable linkerIBM·Filed 2021·Granted Jun 25, 2024·0 cites·20 claims
- 4575US10741454B2Boundary protection for CMOS multi-threshold voltage devicesIBM·Filed 2018·Granted Aug 11, 2020·2 cites·20 claims
- 4674US11778929B2Selective encapsulation for metal electrodes of embedded memory devicesIBM·Filed 2019·Granted Oct 3, 2023·1 cites·19 claims
- 4774US10249512B2Tunable TiOxNy hardmask for multilayer patterningIBM·Filed 2018·Granted Apr 2, 2019·1 cites·8 claims
- 4873US11744083B2Fabrication of embedded memory devices utilizing a self assembled monolayerIBM·Filed 2019·Granted Aug 29, 2023·1 cites·19 claims
- 4973US10665461B2Semiconductor device with multiple threshold voltagesIBM·Filed 2018·Granted May 26, 2020·1 cites·18 claims
- 5073US10551742B2Tunable adhesion of EUV photoresist on oxide surfaceIBM·Filed 2017·Granted Feb 4, 2020·1 cites·18 claims
Showing the top 50 of 151 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →