Inventor · disambiguated record
Maurits Van Der Schaar
Also filed as: VAN DER SCHAAR MAURITS
125 granted patents·15 pending applications·1,169 citations·filing 2001–2023
99Inventor score
Files withASML NETHERLANDS BV116VAN DER SCHAAR MAURITS7MOS EVERHARDUS CORNELIS4VAN DE KERKHOF MARCUS ADRIANUS3DEN BOEF ARIE JEFFREY2
Top patents by PatentIndex Score
140 records- 0198US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0298US10585357B2Alternative target design for metrology using modulation techniquesASML NETHERLANDS BV·Filed 2016·Granted Mar 10, 2020·12 cites·20 claims
- 0398US8760662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2013·Granted Jun 24, 2014·16 cites·7 claims
- 0498US8724087B2Inspection apparatus for lithographyVAN DE KERKHOF MARCUS ADRIANUS·Filed 2009·Granted May 13, 2014·87 cites·19 claims
- 0598US7791727B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2004·Granted Sep 7, 2010·89 cites·32 claims
- 0698US7791732B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2005·Granted Sep 7, 2010·80 cites·15 claims
- 0798US7486408B2Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurementASML NETHERLANDS BV·Filed 2006·Granted Feb 3, 2009·53 cites·11 claims
- 0897US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 0997US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 1097US8706442B2Alignment system, lithographic system and methodMOS EVERHARDUS CORNELIS·Filed 2009·Granted Apr 22, 2014·89 cites·20 claims
- 1197US8054467B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2010·Granted Nov 8, 2011·15 cites·13 claims
- 1296US12066764B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2023·Granted Aug 20, 2024·2 cites·20 claims
- 1396US10437163B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2017·Granted Oct 8, 2019·7 cites·9 claims
- 1496US7911612B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Mar 22, 2011·35 cites·32 claims
- 1596US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 1695US11125806B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Sep 21, 2021·5 cites·15 claims
- 1795US8786825B2Apparatus and method of measuring a property of a substrateVAN DE KERKHOF MARCUS ADRIANUS·Filed 2009·Granted Jul 22, 2014·30 cites·25 claims
- 1895US8111398B2Method of measurement, an inspection apparatus and a lithographic apparatusVAN DER SCHAAR MAURITS·Filed 2010·Granted Feb 7, 2012·21 cites·21 claims
- 1994US11385553B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2021·Granted Jul 12, 2022·2 cites·20 claims
- 2094US10481506B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Nov 19, 2019·7 cites·24 claims
- 2194US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
- 2294US7683351B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·20 cites·21 claims
- 2394US7564555B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Jul 21, 2009·21 cites·19 claims
- 2493US8553230B2Method and apparatus for angular-resolved spectroscopic lithography characterizationDEN BOEF ARIE JEFFREY MARIA·Filed 2011·Granted Oct 8, 2013·10 cites·8 claims
- 2593US8363220B2Method of determining overlay error and a device manufacturing methodASML NETHERLANDS BV·Filed 2010·Granted Jan 29, 2013·9 cites·20 claims
- 2693US6768539B2Lithographic apparatusASML NETHERLANDS BV·Filed 2002·Granted Jul 27, 2004·66 cites·16 claims
- 2792US10955353B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2019·Granted Mar 23, 2021·2 cites·7 claims
- 2892US9910366B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Mar 6, 2018·9 cites·20 claims
- 2992US8908147B2Method and apparatus for determining an overlay errorDEN BOEF ARIE JEFFREY·Filed 2011·Granted Dec 9, 2014·9 cites·20 claims
- 3092US7898662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Mar 1, 2011·13 cites·15 claims
- 3192US7656518B2Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatusASML NETHERLANDS BV·Filed 2007·Granted Feb 2, 2010·15 cites·11 claims
- 3292US7532305B2Lithographic apparatus and device manufacturing method using overlay measurementASML NETHERLANDS BV·Filed 2006·Granted May 12, 2009·13 cites·11 claims
- 3390US10802409B2Metrology method and apparatus, substrate, lithographic method and associated computer productASML NETHERLANDS BV·Filed 2018·Granted Oct 13, 2020·4 cites·22 claims
- 3490US10241055B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2014·Granted Mar 26, 2019·3 cites·11 claims
- 3590US9255892B2Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Feb 9, 2016·6 cites·17 claims
- 3690US9158194B2Metrology method and apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2012·Granted Oct 13, 2015·9 cites·16 claims
- 3790US8064056B2Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterizationVAN DER SCHAAR MAURITS·Filed 2011·Granted Nov 22, 2011·6 cites·9 claims
- 3890US7599064B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methodsASML NETHERLANDS BV·Filed 2007·Granted Oct 6, 2009·11 cites·20 claims
- 3990US6879868B2Alignment system for lithographic apparatus for measuring a position of an alignment markASML NETHERLANDS BV·Filed 2004·Granted Apr 12, 2005·30 cites·22 claims
- 4089US12276921B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Apr 15, 2025·2 cites·17 claims
- 4189US7573584B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Aug 11, 2009·13 cites·9 claims
- 4288US10859923B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Dec 8, 2020·2 cites·12 claims
- 4388US10802408B2Method for optimization of a lithographic processASML NETHERLANDS BV·Filed 2017·Granted Oct 13, 2020·3 cites·23 claims
- 4488US7330261B2Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatusASML NETHERLANDS BV·Filed 2003·Granted Feb 12, 2008·19 cites·37 claims
- 4587US11221560B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2014·Granted Jan 11, 2022·4 cites·20 claims
- 4687US10061212B2Metrology target, method and apparatus, target design method, computer program and lithographic systemASML NETHERLANDS BV·Filed 2017·Granted Aug 28, 2018·4 cites·15 claims
- 4787US7619737B2Method of measurement, an inspection apparatus and a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 17, 2009·14 cites·16 claims
- 4887US7460231B2Alignment tool for a lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Dec 2, 2008·9 cites·7 claims
- 4986US11392044B2Method of determining a position of a featureASML NETHERLANDS BV·Filed 2020·Granted Jul 19, 2022·2 cites·26 claims
- 5086US10996570B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2019·Granted May 4, 2021·2 cites·25 claims
Showing the top 50 of 140 patent records by PatentIndex Score.
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