Inventor · disambiguated record
Yassine Kabouzi
Also filed as: KABOUZI YASSINE
14 granted patents·4 pending applications·40 citations·filing 2005–2023
88Inventor score
Top patents by PatentIndex Score
18 records- 0196US10134569B1Method and apparatus for real-time monitoring of plasma chamber wall conditionLAM RES CORP·Filed 2017·Granted Nov 20, 2018·22 cites·21 claims
- 0288US9735069B2Method and apparatus for determining process rateLAM RES CORP·Filed 2015·Granted Aug 15, 2017·5 cites·13 claims
- 0385US10903050B2Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformityLAM RES CORP·Filed 2018·Granted Jan 26, 2021·4 cites·24 claims
- 0483US10302553B2Gas exhaust by-product measurement systemLAM RES CORP·Filed 2017·Granted May 28, 2019·4 cites·16 claims
- 0579US9548189B2Plasma etching systems and methods using empirical mode decompositionLAM RES CORP·Filed 2015·Granted Jan 17, 2017·2 cites·11 claims
- 0676US2024094144A1Integrated wafer bow measurementsLAM RES CORP·Filed 2023·Application pending·0 cites
- 0774US9640371B2System and method for detecting a process point in multi-mode pulse processesLAM RES CORP·Filed 2014·Granted May 2, 2017·2 cites·17 claims
- 0873US12297494B2Methods and systems for sample analysisN6 TEC INC·Filed 2023·Granted May 13, 2025·0 cites·28 claims
- 0971US10242849B2System and method for detecting a process point in multi-mode pulse processesLAM RES CORP·Filed 2017·Granted Mar 26, 2019·1 cites·18 claims
- 1069US12077813B2Methods and systems for sample analysisN6 TEC INC·Filed 2023·Granted Sep 3, 2024·0 cites·20 claims
- 1166US11885750B2Integrated wafer bow measurementsLAM RES CORP·Filed 2020·Granted Jan 30, 2024·0 cites·14 claims
- 1256US10504704B2Plasma etching systems and methods using empirical mode decompositionLAM RES CORP·Filed 2016·Granted Dec 10, 2019·0 cites·15 claims
- 1354US2021142991A1Apparatus with optical cavity for determining process rateLAM RES CORP·Filed 2021·Application pending·0 cites
- 1451US11056322B2Method and apparatus for determining process rateLAM RES CORP·Filed 2017·Granted Jul 6, 2021·0 cites·9 claims
- 1549US10930478B2Apparatus with optical cavity for determining process rateLAM RES CORP·Filed 2018·Granted Feb 23, 2021·0 cites·14 claims
- 1641US10784174B2Method and apparatus for determining etch process parametersLAM RES CORP·Filed 2017·Granted Sep 22, 2020·0 cites·14 claims
- 1737US2008234530A1Atmospheric Pressure Plasma Treatment of Gaseous EffluentsKABOUZI YASSINE·Filed 2005·Application pending·0 cites
- 1833US2017084426A1Apparatus for determining process rateLAM RES CORP·Filed 2015·Application pending·0 cites
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