Inventor · disambiguated record
Scott Jessen
Also filed as: JESSEN SCOTT · JESSEN SCOTT W · JESSEN SCOTT WILLIAM
33 granted patents·17 pending applications·267 citations·filing 1999–2024
96Inventor score
Files withTEXAS INSTRUMENTS INC29AGERE SYSTEMS INC6HOUSTON THEODORE W6AGERE SYST GUARDIAN CORP2ATON THOMAS JOHN1
Top patents by PatentIndex Score
50 records- 0189US7512928B2Sub-resolution assist feature to improve symmetry for contact hole lithographyTEXAS INSTRUMENTS INC·Filed 2005·Granted Mar 31, 2009·17 cites·7 claims
- 0289US6893800B2Substrate topography compensation at mask design: 3D OPC topography anchoredAGERE SYSTEMS INC·Filed 2002·Granted May 17, 2005·67 cites·5 claims
- 0387US9054214B1Methodology of forming CMOS gates on the secondary axis using double-patterning techniqueTEXAS INSTRUMENTS INC·Filed 2014·Granted Jun 9, 2015·8 cites·19 claims
- 0484US9305848B2Elongated contacts using litho-freeze-litho-etch processTEXAS INSTRUMENTS INC·Filed 2014·Granted Apr 5, 2016·4 cites·20 claims
- 0581US9620419B2Elongated contacts using litho-freeze-litho-etch processTEXAS INSTRUMENTS INC·Filed 2016·Granted Apr 11, 2017·2 cites·8 claims
- 0680US6879046B2Split barrier layer including nitrogen-containing portion and oxygen-containing portionAGERE SYSTEMS INC·Filed 2002·Granted Apr 12, 2005·22 cites·13 claims
- 0779US11171200B2Integrated circuits having dielectric layers including an anti-reflective coatingTEXAS INSTRUMENTS INC·Filed 2019·Granted Nov 9, 2021·2 cites·21 claims
- 0878US6798043B2Structure and method for isolating porous low-k dielectric filmsAGERE SYSTEMS INC·Filed 2002·Granted Sep 28, 2004·22 cites·18 claims
- 0977US7745067B2Method for performing place-and-route of contacts and vias in technologies with forbidden pitch requirementsTEXAS INSTRUMENTS INC·Filed 2005·Granted Jun 29, 2010·4 cites·32 claims
- 1076US7987436B2Sub-resolution assist feature to improve symmetry for contact hole lithographyTEXAS INSTRUMENTS INC·Filed 2009·Granted Jul 26, 2011·5 cites·7 claims
- 1174US9312170B2Metal on elongated contactsTEXAS INSTRUMENTS INC·Filed 2014·Granted Apr 12, 2016·2 cites·14 claims
- 1274US6258610B1Method analyzing a semiconductor surface using line width metrology with auto-correlation operationAGERE SYST GUARDIAN CORP·Filed 1999·Granted Jul 10, 2001·45 cites·12 claims
- 1374US6225639B1Method of monitoring a patterned transfer process using line width metrologyAGERE SYST GUARDIAN CORP·Filed 1999·Granted May 1, 2001·49 cites·21 claims
- 1473US10043714B2Elongated contacts using litho-freeze-litho-etch processTEXAS INSTRUMENTS INC·Filed 2017·Granted Aug 7, 2018·1 cites·14 claims
- 1570US9024450B2Two-track cross-connect in double-patterned structure using rectangular viaTEXAS INSTRUMENTS INC·Filed 2013·Granted May 5, 2015·2 cites·1 claims
- 1669US10103171B2Metal on elongated contactsTEXAS INSTRUMENTS INC·Filed 2016·Granted Oct 16, 2018·1 cites·11 claims
- 1768US12002846B2Integrated circuits having dielectric layers including an anti-reflective coatingTEXAS INSTRUMENTS INC·Filed 2021·Granted Jun 4, 2024·0 cites·16 claims
- 1866US10756095B2SRAM cell with T-shaped contactTEXAS INSTRUMENTS INC·Filed 2018·Granted Aug 25, 2020·0 cites·20 claims
- 1966US10748913B2SRAM cell with T-shaped contactTEXAS INSTRUMENTS INC·Filed 2018·Granted Aug 18, 2020·0 cites·24 claims
- 2064US7067419B2Mask layer and dual damascene interconnect structure in a semiconductor deviceAGERE SYSTEMS INC·Filed 2003·Granted Jun 27, 2006·12 cites·19 claims
- 2163US9117775B2Alignment to multiple layersATON THOMAS JOHN·Filed 2012·Granted Aug 25, 2015·1 cites·7 claims
- 2262US8580675B2Two-track cross-connect in double-patterned structure using rectangular viaBLATCHFORD JAMES WALTER·Filed 2012·Granted Nov 12, 2013·1 cites·14 claims
- 2362US2025284202A1Photolithographic mask pattern adjustment and devices fabricated therefromTEXAS INSTRUMENTS INC·Filed 2024·Application pending·0 cites
- 2455US2009053624A1Modifying Merged Sub-Resolution Assist Features of a Photolithographic MaskTEXAS INSTRUMENTS INC·Filed 2008·Application pending·0 cites
- 2555US2024113156A1Thin film resistor mismatch improvement using a self-aligned double pattern (sadp) techniqueTEXAS INSTRUMENTS INC·Filed 2022·Application pending·0 cites
- 2655US2025299963A1Photolithographic masks and devices fabricated therefromTEXAS INSTRUMENTS INC·Filed 2024·Application pending·0 cites
- 2754US7425502B2Minimizing resist poisoning in the manufacture of semiconductor devicesTEXAS INSTRUMENTS INC·Filed 2007·Granted Sep 16, 2008·0 cites·8 claims
- 2850US11522043B2IC with matched thin film resistorsTEXAS INSTRUMENTS INC·Filed 2020·Granted Dec 6, 2022·0 cites·22 claims
- 2950US9343332B2Alignment to multiple layersTEXAS INSTRUMENTS INC·Filed 2015·Granted May 17, 2016·0 cites·3 claims
- 3049US11605587B2Methods for etching metal interconnect layersTEXAS INSTRUMENTS INC·Filed 2019·Granted Mar 14, 2023·0 cites·16 claims
- 3149US7461367B2Modifying merged sub-resolution assist features of a photolithographic maskTEXAS INSTRUMENTS INC·Filed 2005·Granted Dec 2, 2008·0 cites·13 claims
- 3249US2012258593A1Sram cell with t-shaped contactHOUSTON THEODORE W·Filed 2012·Application pending·0 cites
- 3349US2012264294A1Sram cell with t-shaped contactHOUSTON THEODORE W·Filed 2012·Application pending·0 cites
- 3449US2012264293A1Sram cell with t-shaped contactHOUSTON THEODORE W·Filed 2012·Application pending·0 cites
- 3548US2012228722A1Sram cell with t-shaped contactHOUSTON THEODORE W·Filed 2012·Application pending·0 cites
- 3647US10199380B2SRAM cell with T-shaped contactHOUSTON THEODORE W·Filed 2011·Granted Feb 5, 2019·0 cites·6 claims
- 3747US2011204452A1Sram cell with t-shaped contactTEXAS INSTRUMENTS INC·Filed 2011·Application pending·0 cites
- 3847US2011156168A1Sram cell with t-shaped contactTEXAS INSTRUMENTS INC·Filed 2011·Application pending·0 cites
- 3944US7262129B2Minimizing resist poisoning in the manufacture of semiconductor devicesTEXAS INSTRUMENTS INC·Filed 2004·Granted Aug 28, 2007·0 cites·8 claims
- 4043US10163911B2SRAM cell with T-shaped contactHOUSTON THEODORE W·Filed 2009·Granted Dec 25, 2018·0 cites·4 claims
- 4143US2008160457A1Apparatus and method for reducing defectsCOLLINS SEAN MICHAEL·Filed 2006·Application pending·0 cites
- 4242US2004171256A1Mask layer and interconnect structure for dual damascene semiconductor manufacturingFiled 2003·Application pending·0 cites
- 4340US2003064582A1Mask layer and interconnect structure for dual damascene semiconductor manufacturingFiled 2001·Application pending·0 cites
- 4439US10566200B2Method of fabricating transistors, including ambient oxidizing after etchings into barrier layers and anti-reflecting coatingsTEXAS INSTRUMENTS INC·Filed 2018·Granted Feb 18, 2020·0 cites·20 claims
- 4539US2007082425A1Using a center pole illumination scheme to improve symmetry for contact hole lithographyTEXAS INSTRUMENTS INC·Filed 2005·Application pending·0 cites
- 4638US6708574B2Abnormal photoresist line/space profile detection through signal processing of metrology waveformAGERE SYSTEMS INC·Filed 2002·Granted Mar 23, 2004·0 cites·11 claims
- 4738US6627885B1Method of focused ion beam pattern transfer using a smart dynamic templateAGERE SYSTEMS INC·Filed 2000·Granted Sep 30, 2003·0 cites·11 claims
- 4835US2003119305A1Mask layer and dual damascene interconnect structure in a semiconductor deviceFiled 2001·Application pending·0 cites
- 4934US2013045591A1Negative tone develop process with photoresist dopingTEXAS INSTRUMENTS INC·Filed 2012·Application pending·0 cites
- 5031US2003218259A1Bond pad support structure for a semiconductor deviceFiled 2002·Application pending·0 cites
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