Inventor · disambiguated record
Ebo Croffie
Also filed as: CROFFIE EBO · CROFFIE EBO H
14 granted patents·3 pending applications·64 citations·filing 2002–2012
90Inventor score
Top patents by PatentIndex Score
17 records- 0173US7313508B2Process window compliant corrections of design layoutLSI CORP·Filed 2002·Granted Dec 25, 2007·13 cites·25 claims
- 0272US9188848B2Maskless vortex phase shift optical direct write lithographyAVAGO TECHNOLOGIES GENERAL IP·Filed 2012·Granted Nov 17, 2015·1 cites·23 claims
- 0371US7189498B2Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography processLSI LOGIC CORP·Filed 2004·Granted Mar 13, 2007·11 cites·23 claims
- 0467US7494752B2Method and systems for utilizing simplified resist process models to perform optical and process correctionsLSI CORP·Filed 2005·Granted Feb 24, 2009·2 cites·13 claims
- 0566US7372547B2Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithographyLSI CORP·Filed 2004·Granted May 13, 2008·8 cites·41 claims
- 0664US7117475B2Method and system for utilizing an isofocal contour to perform optical and process correctionsLSI LOGIC CORP·Filed 2004·Granted Oct 3, 2006·8 cites·27 claims
- 0763US7325222B2Method and apparatus for verifying the post-optical proximity corrected mask wafer image sensitivity to reticle manufacturing errorsLSI LOGIC CORP·Filed 2004·Granted Jan 29, 2008·7 cites·18 claims
- 0862US7458060B2Yield-limiting design-rules-compliant pattern library generation and layout inspectionLSI LOGIC CORP·Filed 2005·Granted Nov 25, 2008·5 cites·15 claims
- 0957US7264906B2OPC based illumination optimization with mask error constraintsLSI CORP·Filed 2004·Granted Sep 4, 2007·4 cites·9 claims
- 1056US8377633B2Maskless vortex phase shift optical direct write lithographyLSI CORP·Filed 2011·Granted Feb 19, 2013·0 cites·10 claims
- 1155US7270942B2Optimized mirror design for optical direct writeLSI CORP·Filed 2004·Granted Sep 18, 2007·4 cites·4 claims
- 1249US7738078B2Optimized mirror design for optical direct writeLSI CORP·Filed 2007·Granted Jun 15, 2010·0 cites·10 claims
- 1343US8057963B2Maskless vortex phase shift optical direct write lithographyEIB NICHOLAS K·Filed 2004·Granted Nov 15, 2011·1 cites·26 claims
- 1439US7001695B2Multiple alternating phase shift technology for amplifying resolutionLSI LOGIC CORP·Filed 2003·Granted Feb 21, 2006·0 cites·10 claims
- 1539US2005151949A1Process and apparatus for applying apodization to maskless optical direct write lithography processesLSI LOGIC CORP·Filed 2004·Application pending·0 cites
- 1637US2005014075A1Phase edge darkening binary masksFiled 2003·Application pending·0 cites
- 1736US2005019673A1Attenuated film with etched quartz phase shift maskFiled 2003·Application pending·0 cites
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