Inventor · disambiguated record
Sean D. Burns
Also filed as: BURNS SEAN · BURNS SEAN D · BURNS SEAN DAVID
75 granted patents·7 pending applications·496 citations·filing 2004–2024
99Inventor score
Top patents by PatentIndex Score
82 records- 0198US9934970B1Self aligned pattern formation post spacer etchback in tight pitch configurationsIBM·Filed 2017·Granted Apr 3, 2018·22 cites·13 claims
- 0297US9991156B2Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogsIBM·Filed 2016·Granted Jun 5, 2018·15 cites·6 claims
- 0397US8298943B1Self aligning via patterningARNOLD JOHN CHRISTOPHER·Filed 2011·Granted Oct 30, 2012·72 cites·9 claims
- 0496US11610780B2Alternating hardmasks for tight-pitch line formationTESSERA LLC·Filed 2021·Granted Mar 21, 2023·2 cites·20 claims
- 0596US9779944B1Method and structure for cut material selectionIBM·Filed 2016·Granted Oct 3, 2017·17 cites·19 claims
- 0696US8298954B1Sidewall image transfer process employing a cap material layer for a metal nitride layerARNOLD JOHN C·Filed 2011·Granted Oct 30, 2012·29 cites·20 claims
- 0796US8119531B1Mask and etch process for pattern assemblyARNOLD JOHN C·Filed 2011·Granted Feb 21, 2012·30 cites·20 claims
- 0896US7862982B2Chemical trim of photoresist lines by means of a tuned overcoat materialIBM·Filed 2008·Granted Jan 4, 2011·21 cites·14 claims
- 0995US8916337B2Dual hard mask lithography processARNOLD JOHN C·Filed 2012·Granted Dec 23, 2014·21 cites·25 claims
- 1094US10539881B1Generation of hotspot-containing physical design layout patternsIBM·Filed 2018·Granted Jan 21, 2020·15 cites·20 claims
- 1193US10529569B2Self aligned pattern formation post spacer etchback in tight pitch configurationsIBM·Filed 2018·Granted Jan 7, 2020·5 cites·11 claims
- 1293US8883649B2Sidewall image transfer processYIN YUNPENG·Filed 2011·Granted Nov 11, 2014·27 cites·21 claims
- 1393US7588879B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2008·Granted Sep 15, 2009·15 cites·24 claims
- 1492US9607886B1Self aligned conductive lines with relaxed overlayIBM·Filed 2016·Granted Mar 28, 2017·6 cites·20 claims
- 1592US8518824B2Self aligning via patterningARNOLD JOHN CHRISTOPHER·Filed 2012·Granted Aug 27, 2013·13 cites·10 claims
- 1692US8470711B2Tone inversion with partial underlayer etch for semiconductor device formationARNOLD JOHN C·Filed 2010·Granted Jun 25, 2013·11 cites·12 claims
- 1791US11301748B2Automatic feature extraction from aerial images for test pattern sampling and pattern coverage inspection for lithographyIBM·Filed 2018·Granted Apr 12, 2022·11 cites·20 claims
- 1891US10410875B2Alternating hardmasks for tight-pitch line formationIBM·Filed 2017·Granted Sep 10, 2019·4 cites·20 claims
- 1991US7320855B2Silicon containing TARC/barrier layerIBM·Filed 2004·Granted Jan 22, 2008·37 cites·13 claims
- 2090US10032632B2Selective gas etching for self-aligned pattern transferIBM·Filed 2016·Granted Jul 24, 2018·4 cites·19 claims
- 2190US8137893B2Chemical trim of photoresist lines by means of a tuned overcoatBURNS SEAN DAVID·Filed 2011·Granted Mar 20, 2012·9 cites·14 claims
- 2289US9786554B1Self aligned conductive linesIBM·Filed 2016·Granted Oct 10, 2017·5 cites·7 claims
- 2389US2025062126A1Self aligned pattern formation post spacer etchback in tight pitch configurationsTESSERA LLC·Filed 2024·Application pending·0 cites
- 2488US11670510B2Self aligned pattern formation post spacer etchback in tight pitch configurationsTESSERA LLC·Filed 2021·Granted Jun 6, 2023·1 cites·18 claims
- 2588US9773700B1Aligning conductive vias with trenchesIBM·Filed 2016·Granted Sep 26, 2017·5 cites·9 claims
- 2687US11031248B2Alternating hardmasks for tight-pitch line formationTESSERA INC·Filed 2019·Granted Jun 8, 2021·2 cites·21 claims
- 2787US10546774B2Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogsIBM·Filed 2018·Granted Jan 28, 2020·3 cites·9 claims
- 2887US10388525B2Multi-angled deposition and masking for custom spacer trim and selected spacer removalIBM·Filed 2017·Granted Aug 20, 2019·3 cites·19 claims
- 2985US12322601B2Alternating hardmasks for tight-pitch line formationADEIA SEMICONDUCTOR SOLUTIONS LLC·Filed 2023·Granted Jun 3, 2025·0 cites·22 claims
- 3085US8137874B2Organic graded spin on BARC compositions for high NA lithographyGOLDFARB DARIO L·Filed 2008·Granted Mar 20, 2012·7 cites·12 claims
- 3185US7816069B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2006·Granted Oct 19, 2010·7 cites·8 claims
- 3284US12106963B2Self aligned pattern formation post spacer etchback in tight pitch configurationsTESSERA LLC·Filed 2023·Granted Oct 1, 2024·0 cites·21 claims
- 3384US10381068B2Ultra dense and stable 4T SRAM cell design having NFETs and PFETsIBM·Filed 2017·Granted Aug 13, 2019·4 cites·20 claims
- 3484US10121661B2Self aligned pattern formation post spacer etchback in tight pitch configurationsIBM·Filed 2017·Granted Nov 6, 2018·2 cites·17 claims
- 3584US8673165B2Sidewall image transfer process with multiple critical dimensionsRAGHUNATHAN SUDHARSHANAN·Filed 2011·Granted Mar 18, 2014·11 cites·20 claims
- 3681US7521172B2Topcoat material and use thereof in immersion lithography processesIBM·Filed 2006·Granted Apr 21, 2009·7 cites·17 claims
- 3781US7326442B2Antireflective composition and process of making a lithographic structureIBM·Filed 2005·Granted Feb 5, 2008·11 cites·24 claims
- 3879US12488986B2Selective gas etching for self-aligned pattern transferADEIA SEMICONDUCTOR SOLUTIONS LLC·Filed 2022·Granted Dec 2, 2025·0 cites·10 claims
- 3979US10056290B2Self-aligned pattern formation for a semiconductor deviceIBM·Filed 2016·Granted Aug 21, 2018·2 cites·12 claims
- 4078US10312103B2Alternating hardmasks for tight-pitch line formationIBM·Filed 2017·Granted Jun 4, 2019·1 cites·15 claims
- 4177US10957583B2Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogsIBM·Filed 2019·Granted Mar 23, 2021·1 cites·19 claims
- 4276US11302533B2Selective gas etching for self-aligned pattern transferTESSERA INC·Filed 2021·Granted Apr 12, 2022·0 cites·20 claims
- 4376US9852946B1Self aligned conductive linesIBM·Filed 2016·Granted Dec 26, 2017·2 cites·20 claims
- 4476US8652762B2Organic graded spin on BARC compositions for high NA lithographyGOLDFARB DARIO L·Filed 2012·Granted Feb 18, 2014·2 cites·10 claims
- 4574US9058997B2Process of multiple exposures with spin castable filmsBURKHARDT MARTIN·Filed 2012·Granted Jun 16, 2015·3 cites·19 claims
- 4673US10614877B14T static random access memory bitcell retentionIBM·Filed 2019·Granted Apr 7, 2020·3 cites·20 claims
- 4773US9911647B2Self aligned conductive linesIBM·Filed 2017·Granted Mar 6, 2018·1 cites·20 claims
- 4873US8293454B2Process of making a lithographic structure using antireflective materialsANGELOPOULOS MARIE·Filed 2008·Granted Oct 23, 2012·2 cites·25 claims
- 4972US8053368B2Method for removing residues from a patterned substrateIBM·Filed 2008·Granted Nov 8, 2011·3 cites·20 claims
- 5071US8084185B2Substrate planarization with imprint materials and processesBURNS SEAN D·Filed 2009·Granted Dec 27, 2011·3 cites·26 claims
Showing the top 50 of 82 patent records by PatentIndex Score.
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