Inventor · disambiguated record
Woo-Sung Han
Also filed as: HAN WOO-SUNG
29 granted patents·2 pending applications·456 citations·filing 1990–2017
97Inventor score
Top patents by PatentIndex Score
31 records- 0196US10170386B2Electronic component package and method of manufacturing the sameSAMSUNG ELECTRO MECH·Filed 2017·Granted Jan 1, 2019·40 cites·12 claims
- 0292US5446587AProjection method and projection system and mask thereforSAMSUNG ELECTRONICS CO LTD·Filed 1993·Granted Aug 29, 1995·63 cites·6 claims
- 0390US9842789B2Electronic component package and method of manufacturing the sameSAMSUNG ELECTRO MECH·Filed 2016·Granted Dec 12, 2017·7 cites·12 claims
- 0489US5725973APhoto mask and method for manufacturing sameSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Mar 10, 1998·76 cites·19 claims
- 0587US8338310B2Method of forming line/space patternsJUNG SUNG-GON·Filed 2010·Granted Dec 25, 2012·11 cites·16 claims
- 0679US9119304B2Light emitting device including a light emitting element mounted on a sub-mountKIM YU-SIK·Filed 2012·Granted Aug 25, 2015·3 cites·9 claims
- 0779US5585210AMask pattern of a semiconductor device and a method of manufacturing fine patterns using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1995·Granted Dec 17, 1996·51 cites·20 claims
- 0878US6835507B2Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flareSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 28, 2004·19 cites·21 claims
- 0978US5134058AMethod for forming a fine pattern on a semiconductor having a step thereinSAMSUNG ELECTRONICS CO LTD·Filed 1990·Granted Jul 28, 1992·32 cites·7 claims
- 1077US8238112B2Sub-mount, light emitting device including sub-mount and methods of manufacturing such sub-mount and/or light emitting deviceKIM YU-SIK·Filed 2009·Granted Aug 7, 2012·5 cites·24 claims
- 1173US7309683B2Cleaning composition and method of cleaning a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Dec 18, 2007·4 cites·12 claims
- 1272US5413898AMethod of forming a pattern on a substrate having a step change in heightSAMSUNG ELECTRONICS CO LTD·Filed 1993·Granted May 9, 1995·26 cites·20 claims
- 1368US7375390B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 20, 2008·3 cites·5 claims
- 1464US8341561B2Methods of arranging mask patterns and associated apparatusPARK DONG-WOON·Filed 2010·Granted Dec 25, 2012·1 cites·18 claims
- 1561US7745068B2Binary photomask having a compensation layerSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 29, 2010·1 cites·20 claims
- 1661US7092134B1Method and apparatus for recording a hologram from a mask pattern by the use of total internal reflection holography and hologram manufactured by the methodHAN WOO-SUNG·Filed 2000·Granted Aug 15, 2006·12 cites·39 claims
- 1759US7172974B2Methods for forming fine pattern of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 6, 2007·6 cites·21 claims
- 1856US5547788AMask and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 1994·Granted Aug 20, 1996·26 cites·23 claims
- 1954US7122478B2Method of manufacturing a semiconductor device using a polysilicon etching maskSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Oct 17, 2006·4 cites·4 claims
- 2051US7176512B2Semiconductor memory device having high electrical performance and mask and photolithography friendlinessSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 13, 2007·4 cites·14 claims
- 2150US5978138AProjection exposure systemsSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Nov 2, 1999·8 cites·5 claims
- 2250US5808796AProjection method and projection system and mask thereforSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Sep 15, 1998·8 cites·9 claims
- 2350US5661601AProjection method and projection system and mask thereforSAMSUNG ELECTRONICS CO LTD·Filed 1995·Granted Aug 26, 1997·8 cites·20 claims
- 2449US5501581AMagnetic fluid pump and a method for transporting fluid using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1995·Granted Mar 26, 1996·13 cites·11 claims
- 2547US7393615B2Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flareSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 1, 2008·2 cites·7 claims
- 2647US5608576AProjection method and projection system and mask thereforSAMSUNG ELECTRONICS CO LTD·Filed 1995·Granted Mar 4, 1997·7 cites·3 claims
- 2746US2004242446A1Cleaning agent including a corrosion inhibitor used in a process of forming a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 2842US5726738AAperture for off-axis illumination and projection exposure apparatus employing the sameSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Mar 10, 1998·9 cites·9 claims
- 2938US5155367AGas contamination-measuring apparatus for use with an ultraviolet-emitting laser sourceSAMSUNG ELECTRONICS CO LTD·Filed 1990·Granted Oct 13, 1992·7 cites·7 claims
- 3037US2003224289A1Photosensitive polymers and resist compositions containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 3132US6835529B2Polymer having butadiene sulfone repeating unit and resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Dec 28, 2004·0 cites·54 claims
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