Inventor · disambiguated record
Ken-Hsien Hsieh
Also filed as: HSIEH KEN · HSIEH KEN-HSIEN
112 granted patents·18 pending applications·846 citations·filing 2002–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD81TAIWAN SEMICONDUCTOR MFG26MICROSOFT TECHNOLOGY LICENSING LLC5CHEN HUANG-YU4SPEED TECH CORP3
Top patents by PatentIndex Score
130 records- 0199US9153478B2Spacer etching process for integrated circuit designTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 6, 2015·118 cites·20 claims
- 0299US9053279B2Pattern modification with a preferred position functionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 9, 2015·104 cites·20 claims
- 0398US11342193B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 24, 2022·4 cites·20 claims
- 0498US9716032B2Via-free interconnect structure with self-aligned metal line interconnectionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jul 25, 2017·48 cites·15 claims
- 0597US11243472B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 8, 2022·4 cites·20 claims
- 0697US10678142B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 9, 2020·13 cites·20 claims
- 0797US8584052B2Cell layout for multiple patterning technologyCHEN HUANG-YU·Filed 2011·Granted Nov 12, 2013·26 cites·19 claims
- 0896US9213790B2Conflict detection for self-aligned multiple patterning complianceTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·19 cites·20 claims
- 0995US11789370B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 17, 2023·2 cites·20 claims
- 1095US10790155B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 29, 2020·7 cites·20 claims
- 1195US9176373B2System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patternsTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 3, 2015·11 cites·20 claims
- 1295US8943445B2Method of merging color sets of layoutTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 27, 2015·29 cites·20 claims
- 1395US8850366B2Method for making a mask by forming a phase bar in an integrated circuit design layoutLIU RU-GUN·Filed 2012·Granted Sep 30, 2014·79 cites·20 claims
- 1494US8962464B1Self-alignment for using two or more layers and methods of forming sameTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Feb 24, 2015·16 cites·20 claims
- 1593US9026971B1Multi-patterning conflict free integrated circuit designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 5, 2015·26 cites·20 claims
- 1693US8418111B2Method and apparatus for achieving multiple patterning technology compliant design layoutCHEN HUANG-YU·Filed 2010·Granted Apr 9, 2013·29 cites·28 claims
- 1791US10274829B2Multiple patterning decomposition and manufacturing methods for ICTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·5 cites·20 claims
- 1891US9405879B2Cell boundary layoutTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 2, 2016·19 cites·20 claims
- 1990US9852908B2Methods for integrated circuit design and fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 26, 2017·4 cites·20 claims
- 2090US8799834B1Self-aligned multiple patterning layout designTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 5, 2014·15 cites·20 claims
- 2190US8782575B1Conflict detection for self-aligned multiple patterning complianceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 15, 2014·12 cites·20 claims
- 2290US8745556B2Layout method and system for multi-patterning integrated circuitsCHEN HUANG-YU·Filed 2012·Granted Jun 3, 2014·12 cites·22 claims
- 2390US8631379B2Decomposing integrated circuit layoutCHEN PI-TSUNG·Filed 2010·Granted Jan 14, 2014·21 cites·14 claims
- 2489US8907497B2Semiconductor device with self-aligned interconnects and blocking portionsCHANG SHIH-MING·Filed 2012·Granted Dec 9, 2014·11 cites·18 claims
- 2589US8779592B2Via-free interconnect structure with self-aligned metal line interconnectionsTANG YU-PO·Filed 2012·Granted Jul 15, 2014·14 cites·19 claims
- 2689US8683392B2Double patterning methodologyHSIEH KEN-HSIEN·Filed 2011·Granted Mar 25, 2014·11 cites·17 claims
- 2789US8365102B2Method for checking and fixing double-patterning layoutTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Jan 29, 2013·6 cites·21 claims
- 2889US2024379358A1Methods for integrated circuit design and fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2988US9984876B2Lithographic technique for feature cut by line-end shrinkTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 29, 2018·3 cites·20 claims
- 3088US9054159B2Method of patterning a feature of a semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 9, 2015·7 cites·19 claims
- 3188US9029230B2Conductive line routing for multi-patterning technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 12, 2015·8 cites·20 claims
- 3287US8850367B2Method of decomposable checking approach for mask alignment in multiple patterningTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 30, 2014·9 cites·20 claims
- 3386US12266539B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 1, 2025·0 cites·20 claims
- 3486US9684236B1Method of patterning a film layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 20, 2017·4 cites·20 claims
- 3586US9613850B2Lithographic technique for feature cut by line-end shrinkTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 4, 2017·3 cites·20 claims
- 3686US8828885B2Photo resist trimmed line end spaceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 9, 2014·5 cites·20 claims
- 3785US10388523B2Lithographic technique for feature cut by line-end shrinkTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 20, 2019·2 cites·20 claims
- 3885US2025314972A1System and method for selecting photolithography processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3984US10817635B2Multiple patterning method for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 27, 2020·3 cites·20 claims
- 4084US9581900B2Self aligned patterning with multiple resist layersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 28, 2017·3 cites·20 claims
- 4184US6750652B2Integrated quadrature splitter-combiner and balunGE MED SYS GLOBAL TECH CO LLC·Filed 2002·Granted Jun 15, 2004·30 cites·25 claims
- 4284US2025321498A1Tool mismatch reduction using aberration map of the toolsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4383US9390223B2Method of determining whether a layout is colorableTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jul 12, 2016·2 cites·20 claims
- 4483US8172613B1Coaxial cable end connectorCHEN LI-SEN·Filed 2011·Granted May 8, 2012·18 cites·2 claims
- 4582US11079685B2Method of manufacturing photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 3, 2021·2 cites·20 claims
- 4682US10276394B2Hybrid double patterning method for semiconductor manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·2 cites·20 claims
- 4782US9502261B2Spacer etching process for integrated circuit designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 22, 2016·2 cites·20 claims
- 4882US9337083B2Multi-layer metal contactsTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted May 10, 2016·5 cites·20 claims
- 4982US2025201576A1Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 5081US12265334B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 1, 2025·0 cites·20 claims
Showing the top 50 of 130 patent records by PatentIndex Score.
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