Inventor · disambiguated record
Johann Greschner
Also filed as: GRESCHNER JOHANN
69 granted patents·2,870 citations·filing 1978–2006
99Inventor score
Top patents by PatentIndex Score
69 records- 0198US4502914AMethod of making structures with dimensions in the sub-micrometer rangeIBM·Filed 1983·Granted Mar 5, 1985·428 cites·22 claims
- 0297US5427599ASystem for stamping an optical storage diskIBM·Filed 1994·Granted Jun 27, 1995·104 cites·10 claims
- 0397US4393127AStructure with a silicon body having through openingsIBM·Filed 1981·Granted Jul 12, 1983·113 cites·13 claims
- 0496US4426584AMethod of compensating the proximity effect in electron beam projection systemsIBM·Filed 1981·Granted Jan 17, 1984·70 cites·4 claims
- 0594US8039813B2Charged particle-optical systems, methods and componentsZEISS CARL SMT GMBH·Filed 2006·Granted Oct 18, 2011·32 cites·57 claims
- 0692US5283437APneumatically and electrostatically driven scanning tunneling microscopeIBM·Filed 1993·Granted Feb 1, 1994·81 cites·20 claims
- 0791US4520314AProbe head arrangement for conductor line testing with at least one probe head comprising a plurality of resilient contactsIBM·Filed 1982·Granted May 28, 1985·65 cites·11 claims
- 0891US4169230AMethod of exposure by means of corpuscular beam shadow printingIBM·Filed 1978·Granted Sep 25, 1979·33 cites·2 claims
- 0989US4918033APECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluoridesIBM·Filed 1988·Granted Apr 17, 1990·84 cites·6 claims
- 1088US5213600AMethod of manufacturing an optical storage diskIBM·Filed 1989·Granted May 25, 1993·30 cites·4 claims
- 1188US4806755AMicromechanical atomic force sensor headIBM·Filed 1987·Granted Feb 21, 1989·77 cites·21 claims
- 1287US4589952AMethod of making trenches with substantially vertical sidewalls in silicon through reactive ion etchingIBM·Filed 1984·Granted May 20, 1986·70 cites·8 claims
- 1386US5051379AMethod of producing micromechanical sensors for the AFM/STM profilometry and micromechanical AFM/STM sensor headIBM·Filed 1990·Granted Sep 24, 1991·71 cites·20 claims
- 1486US4642163AMethod of making adhesive metal layers on substrates of synthetic material and device produced therebyIBM·Filed 1983·Granted Feb 10, 1987·37 cites·8 claims
- 1586US4448865AShadow projection mask for ion implantation and ion beam lithographyIBM·Filed 1982·Granted May 15, 1984·63 cites·13 claims
- 1685US5635337AMethod for producing a multi-step structure in a substrateIBM·Filed 1993·Granted Jun 3, 1997·44 cites·4 claims
- 1785US4504558AMethod of compensating the proximity effect in electron beam projection systemsIBM·Filed 1983·Granted Mar 12, 1985·26 cites·5 claims
- 1885US4417946AMethod of making mask for structuring surface areasIBM·Filed 1982·Granted Nov 29, 1983·34 cites·12 claims
- 1984US5116462AMethod of producing micromechanical sensors for the afm/stm profilometryIBM·Filed 1990·Granted May 26, 1992·65 cites·19 claims
- 2083US4843315AContact probe arrangement for electrically connecting a test system to the contact pads of a device to be testedIBM·Filed 1988·Granted Jun 27, 1989·45 cites·10 claims
- 2183US4591540AMethod of transferring a pattern into a radiation-sensitive layerIBM·Filed 1984·Granted May 27, 1986·39 cites·11 claims
- 2282US5814885AVery dense integrated circuit packageIBM·Filed 1997·Granted Sep 29, 1998·64 cites·12 claims
- 2382US5283107AModular multilayer interwiring structureIBM·Filed 1992·Granted Feb 1, 1994·89 cites·16 claims
- 2480US6087199AMethod for fabricating a very dense chip packageIBM·Filed 1998·Granted Jul 11, 2000·58 cites·23 claims
- 2580US5578745ACalibration standards for profilometers and methods of producing themIBM·Filed 1995·Granted Nov 26, 1996·63 cites·11 claims
- 2680US5382795AUltrafine silicon tips for AFM/STM profilometryIBM·Filed 1994·Granted Jan 17, 1995·41 cites·13 claims
- 2779US5242541AMethod of producing ultrafine silicon tips for the afm/stm profilometryIBM·Filed 1990·Granted Sep 7, 1993·39 cites·21 claims
- 2878US5646339AForce microscope and method for measuring atomic forces in multiple directionsIBM·Filed 1996·Granted Jul 8, 1997·57 cites·23 claims
- 2977US4513203AMask and system for mutually aligning objects in ray exposure systemsIBM·Filed 1984·Granted Apr 23, 1985·19 cites·23 claims
- 3076US5770884AVery dense integrated circuit packageIBM·Filed 1995·Granted Jun 23, 1998·33 cites·14 claims
- 3176US5282924AMicromechanical sensor fabrication processIBM·Filed 1993·Granted Feb 1, 1994·35 cites·30 claims
- 3276US4556628AProcess for producing printed circuit boards with metallic conductor structures embedded in the insulating substrateIBM·Filed 1984·Granted Dec 3, 1985·32 cites·8 claims
- 3376US4522893AContact device for releasably connecting electrical componentsIBM·Filed 1982·Granted Jun 11, 1985·41 cites·8 claims
- 3475US4871418AProcess for fabricating arbitrarily shaped through holes in a componentIBM·Filed 1988·Granted Oct 3, 1989·48 cites·19 claims
- 3575US4732646AMethod of forming identically positioned alignment marks on opposite sides of a semiconductor waferIBM·Filed 1987·Granted Mar 22, 1988·45 cites·17 claims
- 3674US5998868AVery dense chip packageIBM·Filed 1998·Granted Dec 7, 1999·45 cites·19 claims
- 3774US4334156AMethod of shadow printing exposureIBM·Filed 1979·Granted Jun 8, 1982·14 cites·11 claims
- 3873US5817201AMethod of fabricating a field emission deviceIBM·Filed 1997·Granted Oct 6, 1998·23 cites·17 claims
- 3973US5658472AMethod for producing deep vertical structures in silicon substratesIBM·Filed 1995·Granted Aug 19, 1997·46 cites·18 claims
- 4072US6028008ACalibration standard for profilometers and manufacturing procedureIBM·Filed 1997·Granted Feb 22, 2000·33 cites·14 claims
- 4171US5960255ACalibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing itIBM·Filed 1997·Granted Sep 28, 1999·29 cites·4 claims
- 4270US5866443AVery dense integrated circuit package and method for forming the sameIBM·Filed 1997·Granted Feb 2, 1999·26 cites·8 claims
- 4370US5534359ACalibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing itIBM·Filed 1994·Granted Jul 9, 1996·21 cites·8 claims
- 4470US4370554AAlignment system for particle beam lithographyIBM·Filed 1980·Granted Jan 25, 1983·33 cites·18 claims
- 4567US5665905ACalibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing itIBM·Filed 1995·Granted Sep 9, 1997·25 cites·10 claims
- 4666US6218264B1Method of producing a calibration standard for 2-D and 3-D profilometry in the sub-nanometer rangeIBM·Filed 1999·Granted Apr 17, 2001·17 cites·7 claims
- 4764US5783905AField emission device with series resistor tip and method of manufacturingIBM·Filed 1996·Granted Jul 21, 1998·16 cites·8 claims
- 4863US6061074AIon generator for ionographic print headsIBM·Filed 1997·Granted May 9, 2000·22 cites·18 claims
- 4963US5162133AProcess for fabricating silicon carbide films with a predetermined stressIBM·Filed 1990·Granted Nov 10, 1992·22 cites·7 claims
- 5061US5817581AProcess for the creation of a thermal SiO2 layer with extremely uniform layer thicknessIBM·Filed 1995·Granted Oct 6, 1998·27 cites·3 claims
Showing the top 50 of 69 patent records by PatentIndex Score.
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