Inventor · disambiguated record
Wei Fang
Also filed as: FANG WEI · FANG WEI-NAN
6 granted patents·3 pending applications·26 citations·filing 2007–2025
75Inventor score
Files withBORRIES PTE LTD3ASML NETHERLANDS BV2CHEN SHU-CHIN1HERMES MICROVISION INC1HERMES MICROVISION INC TAIWAN1
Top patents by PatentIndex Score
9 records- 0189US7705298B2System and method to determine focus parameters during an electron beam inspectionHERMES MICROVISION INC TAIWAN·Filed 2007·Granted Apr 27, 2010·20 cites·10 claims
- 0288US11664186B1Apparatus of electron beam comprising pinnacle limiting plate and method of reducing electron-electron interactionBORRIES PTE LTD·Filed 2022·Granted May 30, 2023·1 cites·20 claims
- 0381US9330987B2Hot spot identification, inspection, and reviewHERMES MICROVISION INC·Filed 2014·Granted May 3, 2016·5 cites·25 claims
- 0472US2025226175A1Dynamic determination of a sample inspection recipe of charged particle beam inspectionASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0570US11854763B1Backscattered electron detector, apparatus of charged-particle beam such as electron microscope comprising the same, and method thereofBORRIES PTE LTD·Filed 2022·Granted Dec 26, 2023·0 cites·20 claims
- 0662US11854762B1MEMS sample holder, packaged product thereof, and apparatus of charged-particle beam such as electron microscope using the sameBORRIES PTE LTD·Filed 2023·Granted Dec 26, 2023·0 cites·18 claims
- 0754US2015008137A1Method and device of carbon-dioxide decompositionCHEN SHU-CHIN·Filed 2013·Application pending·0 cites
- 0853US2020286710A1Dynamic determination of a sample inspection recipe of charged particle beam inspectionASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 0939US9490141B2Method for planarizing semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2014·Granted Nov 8, 2016·0 cites·20 claims
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