Inventor · disambiguated record
Qiliang Ni
Also filed as: NI QILIANG
6 granted patents·3 pending applications·39 citations·filing 2007–2019
73Inventor score
Files withSHANGHAI HUALI MICROELECT CORP7SEMICONDUCTOR MFG INT SHANGHAI1SHANGAI HUALI MICROELECTRONICS CORP1
Top patents by PatentIndex Score
9 records- 0191US8865482B2Method of detecting the circular uniformity of the semiconductor circular contact holesSHANGHAI HUALI MICROELECT CORP·Filed 2013·Granted Oct 21, 2014·37 cites·6 claims
- 0262US9269639B2Method of detecting and measuring contact alignment shift relative to gate structures in a semicondcutor deviceSHANGHAI HUALI MICROELECT CORP·Filed 2013·Granted Feb 23, 2016·2 cites·11 claims
- 0346US11121045B2Method for detecting ultra-small defect on wafer surfaceSHANGHAI HUALI MICROELECT CORP·Filed 2019·Granted Sep 14, 2021·0 cites·11 claims
- 0440US8658438B2Measurement of lateral diffusion of implanted ions in doped well region of semiconductor devicesSHANGHAI HUALI MICROELECT CORP·Filed 2012·Granted Feb 25, 2014·0 cites·8 claims
- 0538US8987013B2Method of inspecting misalignment of polysilicon gateSHANGHAI HUALI MICROELECT CORP·Filed 2013·Granted Mar 24, 2015·0 cites·6 claims
- 0638US2013138239A1Semiconductor yield management systemSHANGHAI HUALI MICROELECT CORP·Filed 2012·Application pending·0 cites
- 0736US2008124891A1Method for Preventing Wafer Edge Peeling in Metal Wiring ProcessSEMICONDUCTOR MFG INT SHANGHAI·Filed 2007·Application pending·0 cites
- 0835US2013137196A1Method for monitoring devices in semiconductor processSHANGHAI HUALI MICROELECT CORP·Filed 2012·Application pending·0 cites
- 0927US9080863B2Method for monitoring alignment between contact holes and polycrystalline silicon gateSHANGAI HUALI MICROELECTRONICS CORP·Filed 2012·Granted Jul 14, 2015·0 cites·6 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →