Inventor · disambiguated record
Wei-Fan Liao
Also filed as: LIAO WEI-FAN
6 granted patents·2 pending applications·12 citations·filing 2013–2025
77Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD8
Top patents by PatentIndex Score
8 records- 0194US10269569B2Semiconductor device and methods of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 23, 2019·9 cites·20 claims
- 0283US10504734B2Semiconductor device and methods of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 10, 2019·2 cites·20 claims
- 0380US2025201564A1Method of manufacturing a semiconductor device with a work-function layer having a concentration of fluorineTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0477US12272556B2Method of manufacturing a semiconductor device with a work-function layer having a concentration of fluorineTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 8, 2025·0 cites·20 claims
- 0571US11380549B2Semiconductor device with a work function layer having a concentration of fluorineTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 5, 2022·0 cites·20 claims
- 0666US10727066B2Semiconductor device and methods of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 28, 2020·0 cites·20 claims
- 0760US9048268B2Method and equipment for removing photoresist residue after dry etchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jun 2, 2015·1 cites·18 claims
- 0839US2015249024A1Method and equipment for removing photoresist residue afer dry etchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →