Inventor · disambiguated record
Ssu-Yu Chen
Also filed as: CHEN SSU-YU
21 granted patents·1 pending application·17 citations·filing 2014–2024
91Inventor score
Top patents by PatentIndex Score
22 records- 0197US11086237B2Extreme ultraviolet lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 10, 2021·4 cites·20 claims
- 0294US12055865B2Extreme ultraviolet lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 6, 2024·2 cites·20 claims
- 0391US10512147B1Extreme ultraviolet radiation source and droplet catcher thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 17, 2019·4 cites·20 claims
- 0483US10955762B2Radiation source apparatus and method for decreasing debris in radiation source apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 23, 2021·1 cites·20 claims
- 0583US10877378B2Vessel for extreme ultraviolet radiation sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·2 cites·20 claims
- 0682US12379675B2Extreme ultraviolet lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Aug 5, 2025·0 cites·20 claims
- 0782US10712676B2Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 14, 2020·1 cites·20 claims
- 0882US10495987B2Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 3, 2019·1 cites·20 claims
- 0981US10791616B1Radiation source apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 29, 2020·2 cites·20 claims
- 1080US12235594B2Method for performing lithography process, light source, and EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 1176US11703769B2Light source, EUV lithography system, and method for performing circuit layout patterning processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 18, 2023·0 cites·20 claims
- 1276US11531278B2EUV lithography system and method for decreasing debris in EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 1373US12130556B2Plasma position control for extreme ultraviolet lithography light sourcesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 1471US11333983B2Light source, EUV lithography system, and method for generating EUV radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 17, 2022·0 cites·20 claims
- 1570US12207381B2Extreme ultraviolet lithography system with heated tin vane bucket having a heated coverTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 21, 2025·0 cites·20 claims
- 1665US12282262B2Method for controlling extreme ultraviolet lightTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 22, 2025·0 cites·20 claims
- 1762US11297710B2Extreme ultraviolet lithography system with heated tin vane bucket having a heated coverTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·0 cites·20 claims
- 1861US11650508B2Plasma position control for extreme ultraviolet lithography light sourcesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 16, 2023·0 cites·20 claims
- 1961US11320744B2Method and apparatus for controlling extreme ultraviolet lightTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 3, 2022·0 cites·20 claims
- 2061US10824083B2Light source, EUV lithography system, and method for generating EUV radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 3, 2020·0 cites·20 claims
- 2147US11360392B2Photolithography device having illuminator and method for adjusting intensity uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 14, 2022·0 cites·20 claims
- 2242US2014284090A1Thin film substrate and method for manufacturing the sameECOCERA OPTRONICS CO LTD·Filed 2014·Application pending·0 cites
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