Inventor · disambiguated record
Yoshimasa Koido
Also filed as: KOIDO YOSHIMASA
8 granted patents·8 pending applications·11 citations·filing 2009–2019
78Inventor score
Files withJX NIPPON MINING & METALS CORP11SATOH KAZUYUKI2KOIDO YOSHIMASA1NARITA SATOYASU1TAKAHASHI HIDEYUKI1
Top patents by PatentIndex Score
16 records- 0181US11236416B2Sputtering target and production method thereforJX NIPPON MINING & METALS CORP·Filed 2017·Granted Feb 1, 2022·1 cites·9 claims
- 0276US8236428B2Hybrid silicon wafer and method for manufacturing sameSATOH KAZUYUKI·Filed 2009·Granted Aug 7, 2012·6 cites·16 claims
- 0373US8911600B2Method of storing lanthanum oxide target, and vacuum-sealed lanthanum oxide targetSATOH KAZUYUKI·Filed 2010·Granted Dec 16, 2014·1 cites·11 claims
- 0469US11846015B2Sb—Te-based alloy sintered compact sputtering targetJX NIPPON MINING & METALS CORP·Filed 2019·Granted Dec 19, 2023·0 cites·8 claims
- 0566US9062371B2Sputtering target-backing plate assembly, and its production methodKOIDO YOSHIMASA·Filed 2010·Granted Jun 23, 2015·3 cites·18 claims
- 0659US10519538B2Sputtering target comprising Al—Te—Cu—Zr alloy, and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2015·Granted Dec 31, 2019·0 cites·18 claims
- 0758US2011162322A1Method for Storing Target Comprising Rare Earth Metal or Oxide ThereofJX NIPPON MINING & METALS CORP·Filed 2009·Application pending·0 cites
- 0855US10612128B2Sputtering target comprising Al—Te—Cu—Zr-based alloy and method of manufacturing sameJX NIPPON MINING & METALS CORP·Filed 2015·Granted Apr 7, 2020·0 cites·12 claims
- 0949US2011114482A1Oxide Sintered Compact, Sputtering Target Composed of the Sintered Compact, and Method of Producing the Sintered Compact and the Sintered Compact Sputtering TargetJX NIPPON MINING & METALS CORP·Filed 2009·Application pending·0 cites
- 1049US2012279857A1Sb-Te-Based Alloy Sintered Compact Sputtering TargetTAKAHASHI HIDEYUKI·Filed 2011·Application pending·0 cites
- 1148US10854435B2Sputtering target of sintered Sb—Te-based alloyJX NIPPON MINING & METALS CORP·Filed 2015·Granted Dec 1, 2020·0 cites·4 claims
- 1248US2021010149A1Co Anode, And Co Electroplating Method Using Co AnodeJX NIPPON MINING & METALS CORP·Filed 2018·Application pending·0 cites
- 1347US2021292887A1Al2O3 Sputtering Target and Production Method ThereofJX NIPPON MINING & METALS CORP·Filed 2017·Application pending·0 cites
- 1446US2011114481A1Lanthanum Oxide-based Sintered Compact, Sputtering Target Composed of said Sintered Compact, Method of Producing Lanthanum Oxide-based Sintered Compact, and Method of Producing Sputtering Target based on said Production MethodJX NIPPON MINING & METALS CORP·Filed 2009·Application pending·0 cites
- 1540US2013277214A1Method of Storing Metal Lanthanum Target, Vacuum-sealed Metal Lanthanum Target, and Thin Film Formed by Sputtering the Metal Lanthanum TargetNARITA SATOYASU·Filed 2012·Application pending·0 cites
- 1638US2021098240A1Sputtering Target Member And Method For Producing SameJX NIPPON MINING & METALS CORP·Filed 2018·Application pending·0 cites
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