Inventor · disambiguated record
Sergey Maximenko
Also filed as: MAXIMENKO SERGEY · MAXIMENKO SERGEY I
1 granted patent·2 pending applications·0 citations·filing 2012–2024
12Inventor score
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3 records- 0144US2025329535A1Method including an ion beam implant and stressed film for separating a substrate film region from a bulk substrate regionMICROCHIP TECH INC·Filed 2024·Application pending·0 cites
- 0243US2025329543A1Method including under-etching an ion-induced damage layer to facilitate separation of a substrate film layer from an underlying substrate bulk regionMICROCHIP TECH INC·Filed 2024·Application pending·0 cites
- 0332US8685273B2Etching agent for type II InAs/GaInSb superlattice epitaxial materialsAIFER EDWARD H·Filed 2012·Granted Apr 1, 2014·0 cites·14 claims
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