Inventor · disambiguated record
Hirokazu Sakakibara
Also filed as: SAKAKIBARA HIROKAZU
27 granted patents·13 pending applications·52 citations·filing 2005–2021
94Inventor score
Top patents by PatentIndex Score
40 records- 0195US7781142B2Copolymer and top coating compositionJSR CORP·Filed 2005·Granted Aug 24, 2010·26 cites·9 claims
- 0284US8815493B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Aug 26, 2014·4 cites·5 claims
- 0383US8993223B2Resist pattern-forming methodJSR CORP·Filed 2014·Granted Mar 31, 2015·2 cites·13 claims
- 0479US8980539B2DeveloperJSR CORP·Filed 2014·Granted Mar 17, 2015·2 cites·9 claims
- 0578US8669042B2Resist pattern-forming methodANNO YUSUKE·Filed 2012·Granted Mar 11, 2014·2 cites·9 claims
- 0677US9170488B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2014·Granted Oct 27, 2015·2 cites·10 claims
- 0775US9335630B2Pattern-forming method, and radiation-sensitive compositionJSR CORP·Filed 2015·Granted May 10, 2016·1 cites·18 claims
- 0872US8968980B2Radiation-sensitive resin composition and compoundMARUYAMA KEN·Filed 2011·Granted Mar 3, 2015·2 cites·7 claims
- 0972US8580482B2Copolymer and top coating compositionCHIBA TAKASHI·Filed 2011·Granted Nov 12, 2013·2 cites·15 claims
- 1070US8703401B2Method for forming pattern and developerFURUKAWA TAIICHI·Filed 2011·Granted Apr 22, 2014·2 cites·9 claims
- 1170US8697331B2Compound, polymer, and radiation-sensitive compositionSAKAKIBARA HIROKAZU·Filed 2010·Granted Apr 15, 2014·2 cites·7 claims
- 1269US8795954B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Aug 5, 2014·1 cites·6 claims
- 1367US9417522B2Photosensitive resin composition and method for producing resist patternJSR CORP·Filed 2014·Granted Aug 16, 2016·2 cites·13 claims
- 1467US8530146B2Method for forming resist patternSAKAKIBARA HIROKAZU·Filed 2012·Granted Sep 10, 2013·1 cites·6 claims
- 1562US10025188B2Resist pattern-forming methodJSR CORP·Filed 2017·Granted Jul 17, 2018·0 cites·17 claims
- 1660US2016320705A1Resist pattern-forming methodJSR CORP·Filed 2016·Application pending·0 cites
- 1759US8715901B2Resin composition for forming fine pattern and method for forming fine patternSAKAKIBARA HIROKAZU·Filed 2005·Granted May 6, 2014·1 cites·17 claims
- 1858US2016097978A1Resist pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
- 1957US9034559B2Pattern-forming method, and radiation-sensitive compositionJSR CORP·Filed 2013·Granted May 19, 2015·0 cites·16 claims
- 2056US9229323B2Pattern-forming methodJSR CORP·Filed 2014·Granted Jan 5, 2016·0 cites·16 claims
- 2156US2015160556A1Resist pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
- 2255US8822140B2Resist pattern-forming methodJSR CORP·Filed 2013·Granted Sep 2, 2014·0 cites·12 claims
- 2354US2013316287A1Photoresist compositionJSR CORP·Filed 2013·Application pending·0 cites
- 2452US11249398B2Method for producing plated shaped structure and photosensitive resin composition for production of plated shaped structuresJSR CORP·Filed 2019·Granted Feb 15, 2022·0 cites·10 claims
- 2552US2010266953A1Copolymer and top coating compositionJSR CORP·Filed 2010·Application pending·0 cites
- 2650US2022026802A1Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed productJSR CORP·Filed 2021·Application pending·0 cites
- 2747US8722306B2Radiation-sensitive resin compositionSAKAKIBARA HIROKAZU·Filed 2008·Granted May 13, 2014·0 cites·7 claims
- 2847US2010255420A1Radiation sensitive resin composition and polymerJSR CORP·Filed 2008·Application pending·0 cites
- 2946US12158700B2Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatusJSR CORP·Filed 2019·Granted Dec 3, 2024·0 cites·17 claims
- 3045US9223207B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Dec 29, 2015·0 cites·22 claims
- 3143US9164387B2Pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Oct 20, 2015·0 cites·12 claims
- 3243US2007042292A1Radiation sensitive resin compositionYONEDA EIJI·Filed 2006·Application pending·0 cites
- 3343US2013337385A1Negative pattern-forming method and photoresist compositionJSR CORP·Filed 2013·Application pending·0 cites
- 3441US2021311391A1Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated formed body, and semiconductor deviceJSR CORP·Filed 2019·Application pending·0 cites
- 3539US10095110B2Photosensitive resin composition, method for forming resist pattern, and method for producing metallic patternJSR CORP·Filed 2016·Granted Oct 9, 2018·0 cites·5 claims
- 3638US2012070783A1Radiation-sensitive resin composition, polymer, and method for forming resist patternSAKAKIBARA HIROKAZU·Filed 2011·Application pending·0 cites
- 3737US8530692B2Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compoundMATSUMURA NOBUJI·Filed 2011·Granted Sep 10, 2013·0 cites·11 claims
- 3837US2011151378A1Radiation-sensitive resin composition for liquid immersion lithography, polymer, and resist pattern-forming methodJSR CORP·Filed 2010·Application pending·0 cites
- 3936US2011014569A1Radiation-sensitive resin composition and polymerJSR CORP·Filed 2010·Application pending·0 cites
- 4031US8921027B2Radiation-sensitive resin compositionSERIZAWA RYUICHI·Filed 2011·Granted Dec 30, 2014·0 cites·4 claims
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