Inventor · disambiguated record
Johannes Wangler
Also filed as: WANGLER JOHANNES
83 granted patents·22 pending applications·2,266 citations·filing 1990–2018
99Inventor score
Files withZEISS CARL SMT AG53ZEISS CARL SMT GMBH16ZEISS STIFTUNG15WANGLER JOHANNES3ZEISS CARL SEMICONDUCTOR MFG3
Top patents by PatentIndex Score
105 records- 0198US6438199B1Illumination system particularly for microlithographyZEISS STIFTUNG·Filed 2000·Granted Aug 20, 2002·199 cites·65 claims
- 0298US6198793B1Illumination system particularly for EUV lithographyZEISS STIFTUNG·Filed 1999·Granted Mar 6, 2001·236 cites·54 claims
- 0397US5675401AIlluminating arrangement including a zoom objective incorporating two axiconsZEISS STIFTUNG·Filed 1995·Granted Oct 7, 1997·197 cites·19 claims
- 0496US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0596US6859515B2Illumination system, particularly for EUV lithographyCARL ZEISS STIFTUNG TRADING·Filed 2002·Granted Feb 22, 2005·236 cites·28 claims
- 0695US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0795US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0895US6583937B1Illuminating system of a microlithographic projection exposure arrangementZEISS STIFTUNG·Filed 2001·Granted Jun 24, 2003·104 cites·35 claims
- 0995US6400794B1Illumination system, particularly for EUV lithographyZEISS STIFTUNG·Filed 2000·Granted Jun 4, 2002·63 cites·31 claims
- 1095US6285443B1Illuminating arrangement for a projection microlithographic apparatusZEISS STIFTUNG·Filed 1999·Granted Sep 4, 2001·195 cites·29 claims
- 1194US7977651B2Illumination system particularly for microlithographyZEISS CARL SMT GMBH·Filed 2009·Granted Jul 12, 2011·15 cites·20 claims
- 1294US5343489AArrangement for shaping a laser beam and for reducing the coherence thereofZEISS STIFTUNG·Filed 1992·Granted Aug 30, 1994·95 cites·10 claims
- 1393US7473907B2Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illuminationZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·26 cites·29 claims
- 1492US7321126B2Collector with fastening devices for fastening mirror shellsZEISS CARL SMT AG·Filed 2006·Granted Jan 22, 2008·26 cites·10 claims
- 1592US7244954B2Collector having unused region for illumination systems using a wavelength ≦193 nmZEISS CARL SMT AG·Filed 2005·Granted Jul 17, 2007·14 cites·27 claims
- 1691US7714983B2Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2004·Granted May 11, 2010·38 cites·35 claims
- 1791US7015489B2Collector having unused region for illumination systems using a wavelength less than or equal to 193 nmZEISS CARL SMT AG·Filed 2003·Granted Mar 21, 2006·36 cites·21 claims
- 1889US8294877B2Illumination optical unit for projection lithographyWANGLER JOHANNES·Filed 2012·Granted Oct 23, 2012·7 cites·15 claims
- 1988US7605386B2Optical device with raster elements, and illumination system with the optical deviceZEISS CARL SMT AG·Filed 2006·Granted Oct 20, 2009·21 cites·19 claims
- 2088US6859328B2Illumination system particularly for microlithographyCARL ZEISS SEMICONDUCTOR·Filed 2002·Granted Feb 22, 2005·58 cites·24 claims
- 2187US8724086B2Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisationLAYH MICHAEL·Filed 2010·Granted May 13, 2014·4 cites·24 claims
- 2286US10018917B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Jul 10, 2018·3 cites·19 claims
- 2386US7460212B2Collector configured of mirror shellsZEISS CARL SMT AG·Filed 2007·Granted Dec 2, 2008·11 cites·14 claims
- 2486US6964485B2Collector for an illumination system with a wavelength of less than or equal to 193 nmZEISS CARL SMT AG·Filed 2002·Granted Nov 15, 2005·24 cites·47 claims
- 2585US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 2685US7348565B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2007·Granted Mar 25, 2008·10 cites·27 claims
- 2784US7186983B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·21 cites·21 claims
- 2884US6243206B1Illuminating system for vacuum ultraviolet microlithographyZEISS STIFTUNG·Filed 1999·Granted Jun 5, 2001·60 cites·18 claims
- 2984US5646715AIlluminating arrangement for an optical system having a reticle masking unitZEISS STIFTUNG·Filed 1994·Granted Jul 8, 1997·35 cites·21 claims
- 3082US8004656B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2006·Granted Aug 23, 2011·5 cites·18 claims
- 3180US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 3279US7006595B2Illumination system particularly for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Feb 28, 2006·15 cites·22 claims
- 3379US6840640B2Multi mirror system for an illumination systemZEISS CARL SMT AG·Filed 2002·Granted Jan 11, 2005·18 cites·9 claims
- 3478US8891057B2Microlithographic projection exposure apparatusLAYH MICHAEL·Filed 2010·Granted Nov 18, 2014·2 cites·21 claims
- 3578US7583433B2Multi mirror system for an illumination systemZEISS CARL SMT AG·Filed 2004·Granted Sep 1, 2009·13 cites·25 claims
- 3678US7456408B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Nov 25, 2008·6 cites·14 claims
- 3777US7880969B2Optical integrator for an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Feb 1, 2011·4 cites·20 claims
- 3876US5572287AIlluminating arrangement for a projection microlithographic exposure apparatusZEISS STIFTUNG·Filed 1994·Granted Nov 5, 1996·28 cites·13 claims
- 3975US6864960B2Zoom system for an illumination deviceZEISS CARL SMT AG·Filed 2002·Granted Mar 8, 2005·14 cites·65 claims
- 4075US6445442B2Projection-microlithographic deviceZEISS STIFTUNG·Filed 2001·Granted Sep 3, 2002·14 cites·25 claims
- 4174US6947124B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2001·Granted Sep 20, 2005·13 cites·17 claims
- 4274US6836530B2Illumination system with a plurality of individual gratingsZEISS CARL SMT AG·Filed 2002·Granted Dec 28, 2004·16 cites·46 claims
- 4374US6366410B1Reticular objective for microlithography-projection exposure installationsZEISS STIFTUNG·Filed 1997·Granted Apr 2, 2002·33 cites·29 claims
- 4474US5982558AREMA objective for microlithographic projection exposure systemsZEISS STIFTUNG·Filed 1996·Granted Nov 9, 1999·45 cites·13 claims
- 4573US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 4673US6680803B2Partial objective in an illuminating systemsZEISS CARL SMT AG·Filed 2001·Granted Jan 20, 2004·15 cites·39 claims
- 4771US7592598B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Sep 22, 2009·2 cites·19 claims
- 4870US7443948B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2006·Granted Oct 28, 2008·2 cites·31 claims
- 4970US6733165B2Optical integrator for an illumination deviceZEISS CARL SEMICONDUCTOR MFG·Filed 2001·Granted May 11, 2004·13 cites·42 claims
- 5069US9217930B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 22, 2015·1 cites·25 claims
Showing the top 50 of 105 patent records by PatentIndex Score.
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