Inventor · disambiguated record
Sang-Yeob Han
Also filed as: HAN SANG-YEOB
7 granted patents·2 pending applications·49 citations·filing 2007–2011
83Inventor score
Top patents by PatentIndex Score
9 records- 0191US8043970B2Slurry compositions for selectively polishing silicon nitride relative to silicon oxide, methods of polishing a silicon nitride layer and methods of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Oct 25, 2011·15 cites·9 claims
- 0288US8252675B2Methods of forming CMOS transistors with high conductivity gate electrodesLEE JONGWON·Filed 2010·Granted Aug 28, 2012·15 cites·15 claims
- 0381US7678625B2Methods of fabricating semiconductor devices including channel layers having improved defect density and surface roughness characteristicsSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Mar 16, 2010·8 cites·19 claims
- 0478US8338300B2Slurry composition for chemical-mechanical polishing and method of chemical-mechanical polishing with the sameLEE JONG-WON·Filed 2008·Granted Dec 25, 2012·6 cites·7 claims
- 0569US8008172B2Methods of forming semiconductor devices including multistage planarization and crystalization of a semiconductor layerSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Aug 30, 2011·3 cites·14 claims
- 0662US8084344B2Methods of fabricating a semiconductor deviceLEE JONG-WON·Filed 2008·Granted Dec 27, 2011·2 cites·20 claims
- 0750US8048808B2Slurry compositions for polishing metal, methods of polishing a metal object and methods of forming a metal wiring using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Nov 1, 2011·0 cites·11 claims
- 0847US2012007018A1Slurry compositions for selectively polishing silicon nitride relative to silicon oxide, methods of polishing a silicon nitride layer and methods of manufacturing a semiconductor device using the sameLEE JONG-WON·Filed 2011·Application pending·0 cites
- 0943US2008138960A1Method of manufacturing a stack-type semiconductor deviceHAN SANG-YEOB·Filed 2007·Application pending·0 cites
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