P

Inventor

CHAKRAVARTHI SRINIVASAN

US24 patents
⚠️ This page may combine multiple inventors who share the name “CHAKRAVARTHI SRINIVASAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TEXAS INSTRUMENTS INC

22 patents
US7061058B2Jun 13, 2006

Forming a retrograde well in a transistor to enhance performance of the transistor

TEXAS INSTRUMENTS INC125 citations99
US6852603B2Feb 8, 2005

Fabrication of abrupt ultra-shallow junctions

TEXAS INSTRUMENTS INC101 citations99
US7786518B2Aug 31, 2010

Growth of unfaceted SiGe in MOS transistor fabrication

TEXAS INSTRUMENTS INC30 citations92
US6797593B2Sep 28, 2004

Methods and apparatus for improved mosfet drain extension activation

TEXAS INSTRUMENTS INC33 citations92
US6682980B2Jan 27, 2004

Fabrication of abrupt ultra-shallow junctions using angled PAI and fluorine implant

TEXAS INSTRUMENTS INC48 citations92
US7553717B2Jun 30, 2009

Recess etch for epitaxial SiGe

TEXAS INSTRUMENTS INC44 citations90
US6830980B2Dec 14, 2004

Semiconductor device fabrication methods for inhibiting carbon out-diffusion in wafers having carbon-containing regions

TEXAS INSTRUMENTS INC22 citations90
US7129127B2Oct 31, 2006

Integration scheme to improve NMOS with poly cap while mitigating PMOS degradation

TEXAS INSTRUMENTS INC16 citations84
US6847089B2Jan 25, 2005

Gate edge diode leakage reduction

TEXAS INSTRUMENTS INC12 citations82
US7179696B2Feb 20, 2007

Phosphorus activated NMOS using SiC process

TEXAS INSTRUMENTS INC12 citations79
US7118977B2Oct 10, 2006

System and method for improved dopant profiles in CMOS transistors

TEXAS INSTRUMENTS INC7 citations74
US7112516B2Sep 26, 2006

Fabrication of abrupt ultra-shallow junctions

TEXAS INSTRUMENTS INC8 citations74
US6927137B2Aug 9, 2005

Forming a retrograde well in a transistor to enhance performance of the transistor

TEXAS INSTRUMENTS INC9 citations74
US7902576B2Mar 8, 2011

Phosphorus activated NMOS using SiC process

TEXAS INSTRUMENTS INC6 citations73
US7795122B2Sep 14, 2010

Antimony ion implantation for semiconductor components

TEXAS INSTRUMENTS INC2 citations63
US7670892B2Mar 2, 2010

Nitrogen based implants for defect reduction in strained silicon

TEXAS INSTRUMENTS INC3 citations63
US6849528B2Feb 1, 2005

Fabrication of ultra shallow junctions from a solid source with fluorine implantation

TEXAS INSTRUMENTS INC3 citations63
US7371648B2May 13, 2008

Method for manufacturing a transistor device having an improved breakdown voltage and a method for manufacturing an integrated circuit using the same

TEXAS INSTRUMENTS INC4 citations62
US7208380B2Apr 24, 2007

Interface improvement by stress application during oxide growth through use of backside films

TEXAS INSTRUMENTS INC4 citations62
US7033879B2Apr 25, 2006

Semiconductor device having optimized shallow junction geometries and method for fabrication thereof

TEXAS INSTRUMENTS INC6 citations58
US7994073B2Aug 9, 2011

Low stress sacrificial cap layer

TEXAS INSTRUMENTS INC0 citations52
US7572716B2Aug 11, 2009

Semiconductor doping with improved activation

TEXAS INSTRUMENTS INC0 citations52

CHAKRAVARTHI SRINIVASAN

1 patent

LU JIONG-PING

1 patent