Inventor · disambiguated record
Hiroko Kubo
Also filed as: KUBO HIROKO
18 granted patents·4 pending applications·265 citations·filing 1995–2022
94Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD7OMRON TATEISI ELECTRONICS CO6KYOTO DAIICHI KAGAKU KK4PANASONIC CORP4YONEDA KENJI1
Top patents by PatentIndex Score
22 records- 0187US6589827B2Semiconductor device and method for fabricating the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Jul 8, 2003·33 cites·14 claims
- 0286US10486491B2Method for estimating thermal sensation, thermal sensation estimation apparatus, air conditioner, and recording mediumPANASONIC CORP·Filed 2017·Granted Nov 26, 2019·5 cites·29 claims
- 0383US10266033B2Method for estimating thermal sensation, thermal sensation estimation apparatus, air conditioner, and recording mediumPANASONIC CORP·Filed 2017·Granted Apr 23, 2019·4 cites·20 claims
- 0479US6147749AMethod and apparatus for measuring concentration by light projectionKYOTO DAIICHI KAGAKU KK·Filed 1996·Granted Nov 14, 2000·61 cites·14 claims
- 0578US11536480B2Air conditioner, sensor system, and thermal sensation estimation methodPANASONIC CORP·Filed 2016·Granted Dec 27, 2022·2 cites·20 claims
- 0677US5772606AMethod of and apparatus for measuring uric componentsKYOTO DAIICHI KAGAKU KK·Filed 1995·Granted Jun 30, 1998·52 cites·23 claims
- 0772US5696580AMethod of and apparatus for measuring absorbance, component concentration or specific gravity of liquid sampleKYOTO DAIICHI KAGAKU KK·Filed 1995·Granted Dec 9, 1997·40 cites·12 claims
- 0868US10843525B2Method for estimating thermal sensation, thermal sensation estimation apparatus, air conditioner, and recording mediumPANASONIC CORP·Filed 2019·Granted Nov 24, 2020·1 cites·14 claims
- 0966US5615009AMethod of stabilizing spectra in spectrometryKYOTO DAIICHI KAGAKU KK·Filed 1996·Granted Mar 25, 1997·32 cites·4 claims
- 1065US6633047B2Apparatus and method for introducing impurityMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Oct 14, 2003·8 cites·6 claims
- 1157US6710382B2Semiconductor device and method for fabricating the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Mar 23, 2004·5 cites·4 claims
- 1255US12443159B2Support device monitoring function blocks of user program, non-transitory storage medium storing support program thereon, and control systemOMRON TATEISI ELECTRONICS CO·Filed 2022·Granted Oct 14, 2025·0 cites·20 claims
- 1355US6861375B1Method of fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Mar 1, 2005·7 cites·7 claims
- 1454US6969870B2Semiconductor device having an amorphous silicon-germanium gate electrodeMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Nov 29, 2005·4 cites·7 claims
- 1552US10715396B2Support apparatus, non-transitory computer readable recording medium and setting methodOMRON TATEISI ELECTRONICS CO·Filed 2019·Granted Jul 14, 2020·0 cites·20 claims
- 1647US6451674B1Method for introducing impurity into a semiconductor substrate without negative charge buildup phenomenonMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1999·Granted Sep 17, 2002·11 cites·5 claims
- 1741US11917024B2Control system, support apparatus, and program for support apparatusOMRON TATEISI ELECTRONICS CO·Filed 2020·Granted Feb 27, 2024·0 cites·17 claims
- 1840US10528017B2Information processing apparatus, information processing method, and computer readable storage mediumOMRON TATEISI ELECTRONICS CO·Filed 2018·Granted Jan 7, 2020·0 cites·16 claims
- 1940US2005120961A1Rapid thermal processing system, method for manufacuturing the same, and method for adjusting temperatureMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Application pending·0 cites
- 2039US2019306250A1Support apparatus, non-transitory computer-readable recording medium and setting methodOMRON TATEISI ELECTRONICS CO·Filed 2019·Application pending·0 cites
- 2139US2019303319A1Support apparatus, non-transitory computer-readable recording medium and setting methodOMRON TATEISI ELECTRONICS CO·Filed 2019·Application pending·0 cites
- 2236US2011086500A1Impurity implantation method and ion implantation apparatusYONEDA KENJI·Filed 2010·Application pending·0 cites
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