Inventor · disambiguated record
Ichiro Honma
Also filed as: HONMA ICHIRO
19 granted patents·1 pending application·221 citations·filing 1982–2011
94Inventor score
Files withNEC CORP10ISHIHARA MINING & CHEMICAL CO4NEC ELECTRONICS CORP2ISHIHARA SANGYO KAISHA1JOBAN ENGINEERING KK1
Top patents by PatentIndex Score
20 records- 0179US5989969AMethod of producing silicon layer having surface controlled to be unevenNEC CORP·Filed 1997·Granted Nov 23, 1999·37 cites·11 claims
- 0273US5910019AMethod of producing silicon layer having surface controlled to be uneven or evenNEC CORP·Filed 1997·Granted Jun 8, 1999·29 cites·2 claims
- 0373US5858837AMethod of manufacturing semiconductor memory deviceNEC CORP·Filed 1997·Granted Jan 12, 1999·35 cites·12 claims
- 0472US5973355ANonvolatile semiconductor memory device and manufacturing method of the sameNEC CORP·Filed 1997·Granted Oct 26, 1999·29 cites·4 claims
- 0556US5730034AAutomatic bolt driving apparatus for driving bolts to secure elongated concrete molding frame segmentsJOBAN ENGINEERING KK·Filed 1996·Granted Mar 24, 1998·14 cites·6 claims
- 0654US4414245AProcess for producing cobalt containing ferromagnetic iron oxidesISHIHARA MINING & CHEMICAL CO·Filed 1982·Granted Nov 8, 1983·9 cites·8 claims
- 0753US7955980B2Method of manufacturing semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2009·Granted Jun 7, 2011·0 cites·7 claims
- 0853US6221730B1Fabrication method of semiconductor device with HSG configurationNEC CORP·Filed 1999·Granted Apr 24, 2001·18 cites·11 claims
- 0950US7601640B2Method of manfacturing semiconductor deviceNEC ELECTRONICS CORP·Filed 2007·Granted Oct 13, 2009·0 cites·9 claims
- 1047US6329268B1Semiconductor cleaning methodNEC CORP·Filed 1998·Granted Dec 11, 2001·13 cites·12 claims
- 1146US5972750ANonvolatile semiconductor memory device and manufacturing method of the sameNEC CORP·Filed 1998·Granted Oct 26, 1999·9 cites·3 claims
- 1243US8329584B2Method of manufacturing semiconductor deviceTAKEWAKI TOSHIYUKI·Filed 2011·Granted Dec 11, 2012·0 cites·14 claims
- 1343US4501774AProcess for the production of cobalt-containing magnetic iron oxide powderISHIHARA MINING & CHEMICAL CO·Filed 1982·Granted Feb 26, 1985·5 cites·12 claims
- 1439US4551327AProcess for producing cobalt-and ferrous iron-containing ferromagnetic iron oxidesISHIHARA SANGYO KAISHA·Filed 1983·Granted Nov 5, 1985·4 cites·12 claims
- 1539US2004245643A1Semiconductor device and method of manufacturing the sameNEC ELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 1637US6568243B1Method of evaluating capacitance value of capacitor on semiconductor substrateNEC CORP·Filed 1999·Granted May 27, 2003·6 cites·16 claims
- 1737US6313004B1Method for manufacturing semiconductor devicesNEC CORP·Filed 1999·Granted Nov 6, 2001·5 cites·23 claims
- 1837US4594267AProcess for producing cobalt-containing magnetic iron oxide powderISHIHARA MINING & CHEMICAL CO·Filed 1985·Granted Jun 10, 1986·4 cites·4 claims
- 1936US4486467AProcess for producing cobalt-containing magnetic iron oxide powderISHIHARA MINING & CHEMICAL CO·Filed 1982·Granted Dec 4, 1984·3 cites·17 claims
- 2031US6342714B1HSG lower electrode structure having a neck supported by a silicon layerNEC CORP·Filed 1999·Granted Jan 29, 2002·1 cites·19 claims
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